JPH0237691B2 - - Google Patents
Info
- Publication number
- JPH0237691B2 JPH0237691B2 JP59022313A JP2231384A JPH0237691B2 JP H0237691 B2 JPH0237691 B2 JP H0237691B2 JP 59022313 A JP59022313 A JP 59022313A JP 2231384 A JP2231384 A JP 2231384A JP H0237691 B2 JPH0237691 B2 JP H0237691B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- heater
- molybdenum block
- thin film
- molecular beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2231384A JPS60165713A (ja) | 1984-02-08 | 1984-02-08 | 分子線エピタキシヤル装置のウエハ装着構造 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2231384A JPS60165713A (ja) | 1984-02-08 | 1984-02-08 | 分子線エピタキシヤル装置のウエハ装着構造 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60165713A JPS60165713A (ja) | 1985-08-28 |
| JPH0237691B2 true JPH0237691B2 (enrdf_load_html_response) | 1990-08-27 |
Family
ID=12079240
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2231384A Granted JPS60165713A (ja) | 1984-02-08 | 1984-02-08 | 分子線エピタキシヤル装置のウエハ装着構造 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60165713A (enrdf_load_html_response) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012142408A2 (en) * | 2011-04-14 | 2012-10-18 | Veeco Instruments Inc. | Substrate holders and methods of substrate mounting |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5730320A (en) * | 1980-07-29 | 1982-02-18 | Fujitsu Ltd | Substrate holder for molecular beam epitaxy |
| JPS58190897A (ja) * | 1982-04-30 | 1983-11-07 | Fujitsu Ltd | 分子線結晶成長方法 |
-
1984
- 1984-02-08 JP JP2231384A patent/JPS60165713A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60165713A (ja) | 1985-08-28 |
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