JPH0235449B2 - - Google Patents

Info

Publication number
JPH0235449B2
JPH0235449B2 JP59259537A JP25953784A JPH0235449B2 JP H0235449 B2 JPH0235449 B2 JP H0235449B2 JP 59259537 A JP59259537 A JP 59259537A JP 25953784 A JP25953784 A JP 25953784A JP H0235449 B2 JPH0235449 B2 JP H0235449B2
Authority
JP
Japan
Prior art keywords
pattern
organic resin
ultraviolet light
pmma
resin material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59259537A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61137324A (ja
Inventor
Yoshihiro Todokoro
Yasuhiro Takasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP59259537A priority Critical patent/JPS61137324A/ja
Publication of JPS61137324A publication Critical patent/JPS61137324A/ja
Publication of JPH0235449B2 publication Critical patent/JPH0235449B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • H10P95/00—

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59259537A 1984-12-07 1984-12-07 パタ−ン形成方法 Granted JPS61137324A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59259537A JPS61137324A (ja) 1984-12-07 1984-12-07 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59259537A JPS61137324A (ja) 1984-12-07 1984-12-07 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS61137324A JPS61137324A (ja) 1986-06-25
JPH0235449B2 true JPH0235449B2 (enExample) 1990-08-10

Family

ID=17335483

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59259537A Granted JPS61137324A (ja) 1984-12-07 1984-12-07 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS61137324A (enExample)

Also Published As

Publication number Publication date
JPS61137324A (ja) 1986-06-25

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