JPH0230440Y2 - - Google Patents

Info

Publication number
JPH0230440Y2
JPH0230440Y2 JP2313386U JP2313386U JPH0230440Y2 JP H0230440 Y2 JPH0230440 Y2 JP H0230440Y2 JP 2313386 U JP2313386 U JP 2313386U JP 2313386 U JP2313386 U JP 2313386U JP H0230440 Y2 JPH0230440 Y2 JP H0230440Y2
Authority
JP
Japan
Prior art keywords
heater
shield
substrate
heat
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2313386U
Other languages
English (en)
Japanese (ja)
Other versions
JPS62136565U (xx
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2313386U priority Critical patent/JPH0230440Y2/ja
Publication of JPS62136565U publication Critical patent/JPS62136565U/ja
Application granted granted Critical
Publication of JPH0230440Y2 publication Critical patent/JPH0230440Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP2313386U 1986-02-19 1986-02-19 Expired JPH0230440Y2 (xx)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2313386U JPH0230440Y2 (xx) 1986-02-19 1986-02-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2313386U JPH0230440Y2 (xx) 1986-02-19 1986-02-19

Publications (2)

Publication Number Publication Date
JPS62136565U JPS62136565U (xx) 1987-08-28
JPH0230440Y2 true JPH0230440Y2 (xx) 1990-08-16

Family

ID=30821171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2313386U Expired JPH0230440Y2 (xx) 1986-02-19 1986-02-19

Country Status (1)

Country Link
JP (1) JPH0230440Y2 (xx)

Also Published As

Publication number Publication date
JPS62136565U (xx) 1987-08-28

Similar Documents

Publication Publication Date Title
US4778559A (en) Semiconductor substrate heater and reactor process and apparatus
JP2927857B2 (ja) 基板加熱装置
US5645646A (en) Susceptor for deposition apparatus
DE59005103D1 (de) Gasdichte Randdichtung und Verfahren zu deren Herstellung.
US4891335A (en) Semiconductor substrate heater and reactor process and apparatus
JPH0230440Y2 (xx)
JPH03183778A (ja) 堆積膜形成方法及びその装置
GB1136881A (en) Vapour growth of silicon crystals and apparatus for producing the same
SE8402530L (sv) Sett for framstellning av belagt plant glas
GB1118056A (en) Cladding of carbonaceous substrates
JPS61251021A (ja) 成膜装置
GB1338337A (en) Cadmium sulphide thin film sustained conductivity device and method for making same
DE3873028D1 (de) Verfahren zum selektiven abscheiden eines silicids eines hochschmelzenden metalls auf freiliegenden siliciumzonen.
JPS5821025B2 (ja) 気相化学蒸着装置
US4956046A (en) Semiconductor substrate treating method
JPH07194965A (ja) 成膜方法及び成膜装置
JPS62262422A (ja) TiSi2膜の形成方法
JP2535552B2 (ja) インライン形連続常圧cvd装置のサセプタ
JPH0529232A (ja) 常圧気相成長装置
JPH0941142A (ja) 真空中で被覆したい基板を交互に位置決めする装置
JPS56115522A (en) Vapor growth device
JPS6388788A (ja) 薄膜形成法
JPS55121649A (en) Cvd device
JPH06216045A (ja) 気相成長装置
JPH04152515A (ja) 半導体装置の製造方法