JPH0225252B2 - - Google Patents
Info
- Publication number
- JPH0225252B2 JPH0225252B2 JP57037625A JP3762582A JPH0225252B2 JP H0225252 B2 JPH0225252 B2 JP H0225252B2 JP 57037625 A JP57037625 A JP 57037625A JP 3762582 A JP3762582 A JP 3762582A JP H0225252 B2 JPH0225252 B2 JP H0225252B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- insulating film
- element isolation
- base
- isolation insulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Bipolar Transistors (AREA)
- Element Separation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57037625A JPS58154265A (ja) | 1982-03-10 | 1982-03-10 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57037625A JPS58154265A (ja) | 1982-03-10 | 1982-03-10 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58154265A JPS58154265A (ja) | 1983-09-13 |
| JPH0225252B2 true JPH0225252B2 (enrdf_load_stackoverflow) | 1990-06-01 |
Family
ID=12502810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57037625A Granted JPS58154265A (ja) | 1982-03-10 | 1982-03-10 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58154265A (enrdf_load_stackoverflow) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4111720A (en) * | 1977-03-31 | 1978-09-05 | International Business Machines Corporation | Method for forming a non-epitaxial bipolar integrated circuit |
-
1982
- 1982-03-10 JP JP57037625A patent/JPS58154265A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58154265A (ja) | 1983-09-13 |
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