JPH0223021B2 - - Google Patents

Info

Publication number
JPH0223021B2
JPH0223021B2 JP58070233A JP7023383A JPH0223021B2 JP H0223021 B2 JPH0223021 B2 JP H0223021B2 JP 58070233 A JP58070233 A JP 58070233A JP 7023383 A JP7023383 A JP 7023383A JP H0223021 B2 JPH0223021 B2 JP H0223021B2
Authority
JP
Japan
Prior art keywords
ions
gas chamber
target material
energy
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58070233A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59196600A (ja
Inventor
Keizo Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP58070233A priority Critical patent/JPS59196600A/ja
Publication of JPS59196600A publication Critical patent/JPS59196600A/ja
Publication of JPH0223021B2 publication Critical patent/JPH0223021B2/ja
Granted legal-status Critical Current

Links

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  • Plasma Technology (AREA)
JP58070233A 1983-04-21 1983-04-21 中性粒子注入法およびその装置 Granted JPS59196600A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58070233A JPS59196600A (ja) 1983-04-21 1983-04-21 中性粒子注入法およびその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58070233A JPS59196600A (ja) 1983-04-21 1983-04-21 中性粒子注入法およびその装置

Publications (2)

Publication Number Publication Date
JPS59196600A JPS59196600A (ja) 1984-11-07
JPH0223021B2 true JPH0223021B2 (enrdf_load_stackoverflow) 1990-05-22

Family

ID=13425637

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58070233A Granted JPS59196600A (ja) 1983-04-21 1983-04-21 中性粒子注入法およびその装置

Country Status (1)

Country Link
JP (1) JPS59196600A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63126220A (ja) * 1986-11-14 1988-05-30 Mitsubishi Electric Corp 不純物添加方法
JPS63166221A (ja) * 1986-12-27 1988-07-09 Mitsubishi Electric Corp 半導体装置の製造方法
JPH02102654U (enrdf_load_stackoverflow) * 1989-02-02 1990-08-15
FR2966305B1 (fr) * 2010-10-15 2013-07-12 Commissariat Energie Atomique Structure acoustique heterogene formee a partir d'un materiau homogene

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4135097A (en) * 1977-05-05 1979-01-16 International Business Machines Corporation Ion implantation apparatus for controlling the surface potential of a target surface
FR2490873A1 (fr) * 1980-09-24 1982-03-26 Varian Associates Procede et dispositif destines a produire une neutralisation amelioree d'un faisceau d'ions positifs

Also Published As

Publication number Publication date
JPS59196600A (ja) 1984-11-07

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