JPH0222536B2 - - Google Patents

Info

Publication number
JPH0222536B2
JPH0222536B2 JP59161530A JP16153084A JPH0222536B2 JP H0222536 B2 JPH0222536 B2 JP H0222536B2 JP 59161530 A JP59161530 A JP 59161530A JP 16153084 A JP16153084 A JP 16153084A JP H0222536 B2 JPH0222536 B2 JP H0222536B2
Authority
JP
Japan
Prior art keywords
groove pattern
ion beam
peak positions
substrate
semiconductor layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59161530A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6142127A (ja
Inventor
Akira Takamori
Eizo Myauchi
Tetsuo Morita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP16153084A priority Critical patent/JPS6142127A/ja
Publication of JPS6142127A publication Critical patent/JPS6142127A/ja
Publication of JPH0222536B2 publication Critical patent/JPH0222536B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P34/00—Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices

Landscapes

  • Electron Beam Exposure (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
JP16153084A 1984-08-02 1984-08-02 イオンビ−ムの照射方法 Granted JPS6142127A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16153084A JPS6142127A (ja) 1984-08-02 1984-08-02 イオンビ−ムの照射方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16153084A JPS6142127A (ja) 1984-08-02 1984-08-02 イオンビ−ムの照射方法

Publications (2)

Publication Number Publication Date
JPS6142127A JPS6142127A (ja) 1986-02-28
JPH0222536B2 true JPH0222536B2 (https=) 1990-05-18

Family

ID=15736838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16153084A Granted JPS6142127A (ja) 1984-08-02 1984-08-02 イオンビ−ムの照射方法

Country Status (1)

Country Link
JP (1) JPS6142127A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201105455D0 (en) 2011-03-31 2011-05-18 British American Tobacco Co Blends of a polylactic acid and a water soluble polymer

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58184726A (ja) * 1982-04-22 1983-10-28 Sanyo Electric Co Ltd 電子ビ−ム露光における位置合せ方法

Also Published As

Publication number Publication date
JPS6142127A (ja) 1986-02-28

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term