JPH0217496B2 - - Google Patents

Info

Publication number
JPH0217496B2
JPH0217496B2 JP2616585A JP2616585A JPH0217496B2 JP H0217496 B2 JPH0217496 B2 JP H0217496B2 JP 2616585 A JP2616585 A JP 2616585A JP 2616585 A JP2616585 A JP 2616585A JP H0217496 B2 JPH0217496 B2 JP H0217496B2
Authority
JP
Japan
Prior art keywords
film
glass substrate
sncl
temperature
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2616585A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61186478A (ja
Inventor
Jiro Abe
Hisato Shoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP2616585A priority Critical patent/JPS61186478A/ja
Publication of JPS61186478A publication Critical patent/JPS61186478A/ja
Publication of JPH0217496B2 publication Critical patent/JPH0217496B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229Composition of the substrate
    • C23C18/1245Inorganic substrates other than metallic
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208Oxides, e.g. ceramics
    • C23C18/1216Metal oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemically Coating (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
JP2616585A 1985-02-15 1985-02-15 導電被膜の形成方法 Granted JPS61186478A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2616585A JPS61186478A (ja) 1985-02-15 1985-02-15 導電被膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2616585A JPS61186478A (ja) 1985-02-15 1985-02-15 導電被膜の形成方法

Publications (2)

Publication Number Publication Date
JPS61186478A JPS61186478A (ja) 1986-08-20
JPH0217496B2 true JPH0217496B2 (no) 1990-04-20

Family

ID=12185936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2616585A Granted JPS61186478A (ja) 1985-02-15 1985-02-15 導電被膜の形成方法

Country Status (1)

Country Link
JP (1) JPS61186478A (no)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2568079B2 (ja) * 1987-03-31 1996-12-25 旭硝子株式会社 酸化錫透明導電膜の形成方法
JPH01116081A (ja) * 1987-10-29 1989-05-09 Koroido Res:Kk 機能性セラミックス薄膜の製造方法
JPH07105166B2 (ja) * 1988-09-22 1995-11-13 旭硝子株式会社 フッ素ドープ酸化錫膜及びその低抵抗化方法
JPH03177337A (ja) * 1989-12-05 1991-08-01 Nippon Sheet Glass Co Ltd 赤外線反射ガラス
JP3376420B2 (ja) * 2000-09-06 2003-02-10 独立行政法人物質・材料研究機構 酸化亜鉛基化合物パターン化膜の製造方法
JP2007153701A (ja) * 2005-12-07 2007-06-21 Fujikura Ltd 熱線反射ガラス、成膜装置及び成膜方法
JP2007242340A (ja) * 2006-03-07 2007-09-20 Fujikura Ltd 透明導電性基板及びその製造方法並びにその製造装置

Also Published As

Publication number Publication date
JPS61186478A (ja) 1986-08-20

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