JPH0216571B2 - - Google Patents
Info
- Publication number
- JPH0216571B2 JPH0216571B2 JP12380081A JP12380081A JPH0216571B2 JP H0216571 B2 JPH0216571 B2 JP H0216571B2 JP 12380081 A JP12380081 A JP 12380081A JP 12380081 A JP12380081 A JP 12380081A JP H0216571 B2 JPH0216571 B2 JP H0216571B2
- Authority
- JP
- Japan
- Prior art keywords
- resist film
- electron beam
- overlay mark
- overlay
- mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 4
- 230000035945 sensitivity Effects 0.000 claims description 4
- 230000007261 regionalization Effects 0.000 claims description 3
- 238000004321 preservation Methods 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 description 11
- 239000004065 semiconductor Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000001514 detection method Methods 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12380081A JPS5825233A (ja) | 1981-08-06 | 1981-08-06 | 電子ビ−ム直接描画に於ける重ね合せマ−ク保存法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12380081A JPS5825233A (ja) | 1981-08-06 | 1981-08-06 | 電子ビ−ム直接描画に於ける重ね合せマ−ク保存法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5825233A JPS5825233A (ja) | 1983-02-15 |
JPH0216571B2 true JPH0216571B2 (fr) | 1990-04-17 |
Family
ID=14869622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12380081A Granted JPS5825233A (ja) | 1981-08-06 | 1981-08-06 | 電子ビ−ム直接描画に於ける重ね合せマ−ク保存法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5825233A (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4855722A (en) * | 1986-08-01 | 1989-08-08 | Intersil, Inc. | Alternating current power loss detector |
-
1981
- 1981-08-06 JP JP12380081A patent/JPS5825233A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5825233A (ja) | 1983-02-15 |
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