JPH02159029A - 薬液処理方法およびその装置 - Google Patents

薬液処理方法およびその装置

Info

Publication number
JPH02159029A
JPH02159029A JP63314033A JP31403388A JPH02159029A JP H02159029 A JPH02159029 A JP H02159029A JP 63314033 A JP63314033 A JP 63314033A JP 31403388 A JP31403388 A JP 31403388A JP H02159029 A JPH02159029 A JP H02159029A
Authority
JP
Japan
Prior art keywords
liquid
chemical
concentration
amount
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63314033A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0524660B2 (enExample
Inventor
Yuichi Hirofuji
裕一 広藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP63314033A priority Critical patent/JPH02159029A/ja
Publication of JPH02159029A publication Critical patent/JPH02159029A/ja
Publication of JPH0524660B2 publication Critical patent/JPH0524660B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP63314033A 1988-12-13 1988-12-13 薬液処理方法およびその装置 Granted JPH02159029A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63314033A JPH02159029A (ja) 1988-12-13 1988-12-13 薬液処理方法およびその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63314033A JPH02159029A (ja) 1988-12-13 1988-12-13 薬液処理方法およびその装置

Publications (2)

Publication Number Publication Date
JPH02159029A true JPH02159029A (ja) 1990-06-19
JPH0524660B2 JPH0524660B2 (enExample) 1993-04-08

Family

ID=18048407

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63314033A Granted JPH02159029A (ja) 1988-12-13 1988-12-13 薬液処理方法およびその装置

Country Status (1)

Country Link
JP (1) JPH02159029A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5275184A (en) * 1990-10-19 1994-01-04 Dainippon Screen Mfg. Co., Ltd. Apparatus and system for treating surface of a wafer by dipping the same in a treatment solution and a gate device for chemical agent used in the apparatus and the system
KR20000050397A (ko) * 1999-01-08 2000-08-05 윤종용 반도체 세정액 농도 제어장치 및 방법
US6214126B1 (en) 1993-11-15 2001-04-10 Matsushita Electric Industrial Co., Ltd. Method for cleaning a silicon substrate
WO2006030816A1 (ja) * 2004-09-17 2006-03-23 Kurita Water Industries Ltd. 硫酸リサイクル型洗浄システムおよび硫酸リサイクル型過硫酸供給装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6316901A (ja) * 1986-07-10 1988-01-23 Miyano:Kk 材料支持具

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6316901A (ja) * 1986-07-10 1988-01-23 Miyano:Kk 材料支持具

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5275184A (en) * 1990-10-19 1994-01-04 Dainippon Screen Mfg. Co., Ltd. Apparatus and system for treating surface of a wafer by dipping the same in a treatment solution and a gate device for chemical agent used in the apparatus and the system
US6214126B1 (en) 1993-11-15 2001-04-10 Matsushita Electric Industrial Co., Ltd. Method for cleaning a silicon substrate
KR20000050397A (ko) * 1999-01-08 2000-08-05 윤종용 반도체 세정액 농도 제어장치 및 방법
WO2006030816A1 (ja) * 2004-09-17 2006-03-23 Kurita Water Industries Ltd. 硫酸リサイクル型洗浄システムおよび硫酸リサイクル型過硫酸供給装置
US9593424B2 (en) 2004-09-17 2017-03-14 Kurita Water Industries, Ltd. Sulfuric acid recycling type cleaning system and a sulfuric acid recycling type persulfuric acid supply apparatus

Also Published As

Publication number Publication date
JPH0524660B2 (enExample) 1993-04-08

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