JPH0215629B2 - - Google Patents

Info

Publication number
JPH0215629B2
JPH0215629B2 JP58235569A JP23556983A JPH0215629B2 JP H0215629 B2 JPH0215629 B2 JP H0215629B2 JP 58235569 A JP58235569 A JP 58235569A JP 23556983 A JP23556983 A JP 23556983A JP H0215629 B2 JPH0215629 B2 JP H0215629B2
Authority
JP
Japan
Prior art keywords
electrode
clusters
thin film
substrate
electron extraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58235569A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60124919A (ja
Inventor
Kenichiro Yamanishi
Akira Shuhara
Yoshifumi Minowa
Tateo Motoyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP58235569A priority Critical patent/JPS60124919A/ja
Publication of JPS60124919A publication Critical patent/JPS60124919A/ja
Publication of JPH0215629B2 publication Critical patent/JPH0215629B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/22—

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP58235569A 1983-12-12 1983-12-12 薄膜蒸着装置 Granted JPS60124919A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58235569A JPS60124919A (ja) 1983-12-12 1983-12-12 薄膜蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58235569A JPS60124919A (ja) 1983-12-12 1983-12-12 薄膜蒸着装置

Publications (2)

Publication Number Publication Date
JPS60124919A JPS60124919A (ja) 1985-07-04
JPH0215629B2 true JPH0215629B2 (member.php) 1990-04-12

Family

ID=16987929

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58235569A Granted JPS60124919A (ja) 1983-12-12 1983-12-12 薄膜蒸着装置

Country Status (1)

Country Link
JP (1) JPS60124919A (member.php)

Also Published As

Publication number Publication date
JPS60124919A (ja) 1985-07-04

Similar Documents

Publication Publication Date Title
US4812326A (en) Evaporation source with a shaped nozzle
JPS581186B2 (ja) イオンプレ−テイング装置
JP2501828B2 (ja) 薄膜蒸着装置
JPH0543784B2 (member.php)
JPH0215629B2 (member.php)
JPS63472A (ja) 真空成膜装置
JPS60124915A (ja) 薄膜蒸着装置
JPH0215630B2 (member.php)
JPH0351087B2 (member.php)
JPS60125368A (ja) 薄膜蒸着装置
JPH0719746B2 (ja) 薄膜蒸着装置
JPS60124931A (ja) 薄膜蒸着装置
JPH01119663A (ja) 薄膜形成装置
JPS60124923A (ja) 薄膜蒸着装置
JPS6329925A (ja) 化合物薄膜形成装置
JPS60124916A (ja) 薄膜蒸着装置
JPS60124930A (ja) 薄膜蒸着装置
JPS6274070A (ja) 薄膜蒸着装置
JPS62260053A (ja) 化合物薄膜蒸着装置
JPH0443411B2 (member.php)
JPS6215815A (ja) 薄膜蒸着装置
JPH0352533B2 (member.php)
JPS6218019A (ja) 薄膜蒸着装置
JPS6212120A (ja) 蒸発源加熱用フイラメント
JPS61247036A (ja) 絶縁性薄膜形成装置およびその方法