JPH0214358U - - Google Patents
Info
- Publication number
- JPH0214358U JPH0214358U JP9261288U JP9261288U JPH0214358U JP H0214358 U JPH0214358 U JP H0214358U JP 9261288 U JP9261288 U JP 9261288U JP 9261288 U JP9261288 U JP 9261288U JP H0214358 U JPH0214358 U JP H0214358U
- Authority
- JP
- Japan
- Prior art keywords
- disk
- electrons
- primary
- electron emission
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9261288U JPH0214358U (en:Method) | 1988-07-12 | 1988-07-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9261288U JPH0214358U (en:Method) | 1988-07-12 | 1988-07-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0214358U true JPH0214358U (en:Method) | 1990-01-29 |
Family
ID=31317046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9261288U Pending JPH0214358U (en:Method) | 1988-07-12 | 1988-07-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0214358U (en:Method) |
-
1988
- 1988-07-12 JP JP9261288U patent/JPH0214358U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS58110956U (ja) | 荷電粒子照射装置 | |
| JPH0214358U (en:Method) | ||
| JPH0216556U (en:Method) | ||
| JPH03104948U (en:Method) | ||
| JPS63109438U (en:Method) | ||
| JPH02131258U (en:Method) | ||
| JPS59107473U (ja) | イオンビ−ム照射装置 | |
| JPH0310461U (en:Method) | ||
| JPH0424255U (en:Method) | ||
| JPH034648U (en:Method) | ||
| JPH01154489U (en:Method) | ||
| JPS6348930Y2 (en:Method) | ||
| JPS6119774U (ja) | 走査電子顕微鏡を用いた電位測定装置 | |
| JP2555359Y2 (ja) | 半導体装置の製造装置 | |
| JPH03103550U (en:Method) | ||
| JPS6419664A (en) | Ion beam device | |
| JPS623046U (en:Method) | ||
| JPH025349A (ja) | ディスク電流の異常検知装置 | |
| JPS62188145U (en:Method) | ||
| JP2702987B2 (ja) | イオンビーム加工装置 | |
| JPH01112554U (en:Method) | ||
| JPS59148064U (ja) | イオンビ−ムスパツタリング装置 | |
| JPS61199860U (en:Method) | ||
| JPH04357657A (ja) | イオン処理装置 | |
| JPS62149157U (en:Method) |