JPH02142180A - Semiconductor integrated circuit - Google Patents

Semiconductor integrated circuit

Info

Publication number
JPH02142180A
JPH02142180A JP29665288A JP29665288A JPH02142180A JP H02142180 A JPH02142180 A JP H02142180A JP 29665288 A JP29665288 A JP 29665288A JP 29665288 A JP29665288 A JP 29665288A JP H02142180 A JPH02142180 A JP H02142180A
Authority
JP
Japan
Prior art keywords
gate
current
wiring
cells
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29665288A
Other languages
Japanese (ja)
Inventor
Tetsuo Kazami
風見 哲夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP29665288A priority Critical patent/JPH02142180A/en
Publication of JPH02142180A publication Critical patent/JPH02142180A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • H01L27/118Masterslice integrated circuits

Abstract

PURPOSE:To decrease a wiring delay time by using a long wiring without impairing the performance of a basic gate and layout property by arranging low-current gate cells and high-current gate cells on a gate array substrate, and using the high-current gates when the long wiring is formed. CONSTITUTION:Many gate cells are arranged on a gate part 14 of a chip 11 in a matrix pattern. Cells 15 indicated by shaded parts are high-current gate cells exclusive for long wirings. Other cells 16 are low-current gate cells. The high-current gate 15 has a constitution wherein a current flowing through a switching transistor and an emitter follower transistor is twice a current flowing through a transistor for the low-current gate. Therefore, when the high-current gate is used when the wiring is long, a wiring delay time can be made quicker than the time when the low current cell is used. Thus, the wiring delay time can be decreased by using the high-current gate 15 when a long wiring 17 is formed. For a wiring 18 with a short distance between the gates, the low-current gates 16 are used.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ゲートアレイ方式の半導体集積回路において
、特にその基本ゲートセルの構造に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a gate array type semiconductor integrated circuit, and particularly to the basic gate cell structure thereof.

〔従来の技術〕[Conventional technology]

従来、この種のゲートアレイ方式の半導体集積回路は、
1タイプのAND/NANDの基本ゲートを構成する基
本セルをアレイ状に配置していた。
Conventionally, this type of gate array type semiconductor integrated circuit,
Basic cells forming one type of AND/NAND basic gate were arranged in an array.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述した従来のゲートアレイ方式の半導体集積回路では
、配線遅延時間を速くするため、基本ゲート内に電流調
整用の素子を配置していた。すなわち、長い配線の時に
は基本ゲート内に置かれた電流調整用の素子を使用して
、ゲートを駆動する電流を増やして、配線遅延時間を速
くしていた。
In the conventional gate array type semiconductor integrated circuit described above, a current adjustment element is disposed within the basic gate in order to speed up the wiring delay time. That is, when wiring is long, a current adjustment element placed in the basic gate is used to increase the current driving the gate, thereby speeding up the wiring delay time.

短い配線の時には、ゲート内に置かれた電流調整用の素
子を使用せずにゲートを構成していた。このように、基
本ゲート内に電流調整用の余分な素子を置いておかなけ
ればならないために、基本ゲートのレイアウト性が悪く
なり、素子使用率も低下するという欠点がある。
When the wiring was short, the gate was constructed without using a current adjustment element placed inside the gate. As described above, since an extra element for current adjustment must be placed in the basic gate, there is a disadvantage that the layout of the basic gate becomes poor and the element usage rate also decreases.

〔課題を解決するための手段〕[Means to solve the problem]

本発明のゲートアレイ方式の半導体集積回路は、固定位
置に複数の低電流のゲートセルと、複数の高電流のゲー
トセルとを有している。
The gate array type semiconductor integrated circuit of the present invention has a plurality of low current gate cells and a plurality of high current gate cells at fixed positions.

〔実施例〕〔Example〕

次に、本発明を図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.

第3図Aは、CML回路によるバイポーラゲートアレイ
の、2人力AND/NAND低電流ゲートセルの回路図
である。基本セル内には、3個のスイッチングトランジ
スタ301〜303、エミッタフォロワ用トランジスタ
305,306、定電流源用トランジシタ304、コレ
クタ抵抗311.312、エミッタ抵抗313、及びエ
ミッタフォロワ用抵抗314,315を配置している。
FIG. 3A is a circuit diagram of a two-way AND/NAND low current gate cell of a bipolar gate array using a CML circuit. Inside the basic cell, three switching transistors 301 to 303, emitter follower transistors 305, 306, constant current source transistor 304, collector resistor 311, 312, emitter resistor 313, and emitter follower resistor 314, 315 are arranged. are doing.

第3図Bは、駆動電流を低電流ゲートセルの2倍にした
高電流ゲートセルの回路図である。高電流ゲートの基本
セル内には、低電流ゲートの2倍の電流を流せるエミッ
タサイズのトランジスタ321〜323と、基本ゲート
のそれぞれ2倍の数のエミッタフォロワ用トランジシタ
326〜329、定電流源用トランジシタ324,32
5、コレクタ抵抗331〜334、エミッタ抵抗335
゜336、エミッタフォロワ用抵抗337〜340を配
置して、2倍の電流でゲートを駆動する。
FIG. 3B is a circuit diagram of a high current gate cell in which the drive current is twice that of the low current gate cell. In the basic cell of the high current gate, there are transistors 321 to 323 of emitter size that can flow twice the current of the low current gate, transistors 326 to 329 for emitter followers each having twice the number of the basic gate, and transistors 326 to 329 for a constant current source. transistors 324, 32
5. Collector resistance 331-334, emitter resistance 335
336, emitter follower resistors 337 to 340 are arranged, and the gate is driven with twice the current.

第1図は、本発明の一実施例の平面図である。FIG. 1 is a plan view of an embodiment of the present invention.

チップ11のゲート部14に多数のゲートセルがマトリ
クス状に配置されているが、斜線で示したセル15の長
い配線専用の高電流ゲートセルであり、その他のセル1
6は低電流ゲートセルである。
A large number of gate cells are arranged in a matrix in the gate section 14 of the chip 11, and the hatched cell 15 is a high current gate cell dedicated to long wiring;
6 is a low current gate cell.

高電流ゲート15は、第3図Bのように、スイッチング
トランジスタ及びエミッタフオロワトランジシタに流れ
る電流が、第3図Aの低電流ゲートのトランジスタを流
れる電流の2倍という構成となっているので、配線が長
い時に高電流ゲートを使用すれば、低電流ゲートセルを
使用するよりも、配線遅延時間を速くてきる。したがっ
て、図示のように、長い配線17を行う時は、高電流ゲ
ート15を使用することによって、配線遅延時間を低減
することができる。また、短いゲート間の配線18の場
合は、低電流ケート16を使用して行う。
As shown in FIG. 3B, the high current gate 15 has a configuration in which the current flowing through the switching transistor and emitter follower transistor is twice the current flowing through the low current gate transistor in FIG. 3A. , if a high current gate is used when the wiring is long, the wiring delay time will be faster than if a low current gate cell is used. Therefore, as shown in the figure, when a long wiring 17 is formed, the wiring delay time can be reduced by using the high current gate 15. Furthermore, in the case of a short wiring 18 between gates, a low current gate 16 is used.

なお、第1図で、12は入出力回路部、13は周辺回路
部を示す。
In FIG. 1, 12 indicates an input/output circuit section, and 13 indicates a peripheral circuit section.

第2図は、本発明の他の実施例の平面図である。FIG. 2 is a plan view of another embodiment of the invention.

チップ21のゲート部24で作られた必要な信号を、チ
ップ21の外部へ出力するために、チップ内の周囲に設
けた出力バッファ27を使用するが、ゲート部24から
出力バッファ27までの配線28は、ゲート部24にお
けるゲート間配線よりも長くなり、配線遅延時間が悪く
なる。そこで、ゲート部24の外周に沿って長い配線専
用の高電流ゲートセル25を配置している。ゲート部2
4から出力バッファ27へ配線する時には、高電流ゲー
ト25を用いて長い配線の配線遅延時間を低減するとい
う利点がある。高電流ゲートセル群25の内側には多数
の低電流ゲートセル26がマトリクス状に配置されてい
る。
In order to output the necessary signals generated by the gate section 24 of the chip 21 to the outside of the chip 21, an output buffer 27 provided around the inside of the chip is used, but the wiring from the gate section 24 to the output buffer 27 is 28 is longer than the inter-gate wiring in the gate portion 24, and the wiring delay time becomes worse. Therefore, a high current gate cell 25 dedicated to long wiring is arranged along the outer periphery of the gate portion 24. Gate part 2
4 to the output buffer 27, there is an advantage that the high current gate 25 is used to reduce the wiring delay time of a long wiring. Inside the high current gate cell group 25, a large number of low current gate cells 26 are arranged in a matrix.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は、ゲートアレイ下地に低電
流ゲートセルと、高電流ゲートセルを配置して、長い配
線が生じたら高電流ゲートを使用することにより、基本
ゲートの性能、レイアウト性を損うことなく、長い配線
を配線遅延時間を低減できる効果がある。
As explained above, the present invention arranges low-current gate cells and high-current gate cells on the base of the gate array, and uses high-current gates when long wiring occurs, thereby impairing the performance and layout of the basic gate. This has the effect of reducing wiring delay time for long wiring without causing problems.

電流ゲートの回路図、第3図Bは高電流ゲートの回路図
である。
Circuit diagram of a current gate. FIG. 3B is a circuit diagram of a high current gate.

11.21・・・・・チップ、12.22・・・・・・
入出力回路部、13.23・・・・・定電圧発生回路等
の周辺回路部、14.24・・・・・・低電流ゲートセ
ル、高電流ゲートセルを並べたゲート部、15.25・
・・・高電流ゲートセル、16.26・・・・・・低電
流ゲートセル、17・・・・・長いゲート間配線、27
・・・・・・入出力回路内の出力バッファ、28・・・
・・・ゲート部、出力バッファ間の配線、18・・・・
・・短いゲート間配線、31・・・・・入力端子、32
・・・・・・リファレンス電源端子、33・・・・・・
基準電圧供給端子、34・・・・・・出力端子、35・
・・・・・出力端子、36・・・・・・高位側電源、3
7・・・・・・低位側電源。
11.21... Chip, 12.22...
Input/output circuit section, 13.23... Peripheral circuit section such as constant voltage generation circuit, 14.24... Gate section in which low current gate cells and high current gate cells are arranged, 15.25.
...High current gate cell, 16.26...Low current gate cell, 17...Long inter-gate wiring, 27
...Output buffer in the input/output circuit, 28...
...Wiring between gate section and output buffer, 18...
...Short inter-gate wiring, 31...Input terminal, 32
...Reference power supply terminal, 33...
Reference voltage supply terminal, 34...Output terminal, 35.
...Output terminal, 36...High-side power supply, 3
7...Low side power supply.

代理人 弁理士  内 原   晋Agent Patent Attorney Susumu Uchihara

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明の一実施例の平面図、第2図は、本発
明の他の実施例の平面図、第3図Aは低1B かい 第 図
Fig. 1 is a plan view of one embodiment of the present invention, Fig. 2 is a plan view of another embodiment of the invention, and Fig. 3 A is a low 1B paddle diagram.

Claims (1)

【特許請求の範囲】[Claims] 複数の低電流のゲートセルと複数の高電流のゲートセル
とが所定の配列で形成されていることを特徴とするゲー
トアレイ方式の半導体集積回路。
A gate array type semiconductor integrated circuit characterized in that a plurality of low current gate cells and a plurality of high current gate cells are formed in a predetermined arrangement.
JP29665288A 1988-11-22 1988-11-22 Semiconductor integrated circuit Pending JPH02142180A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29665288A JPH02142180A (en) 1988-11-22 1988-11-22 Semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29665288A JPH02142180A (en) 1988-11-22 1988-11-22 Semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPH02142180A true JPH02142180A (en) 1990-05-31

Family

ID=17836318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29665288A Pending JPH02142180A (en) 1988-11-22 1988-11-22 Semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPH02142180A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6065546A (en) * 1983-09-20 1985-04-15 Fujitsu Ltd Gate array type integrated circuit
JPS62150844A (en) * 1985-12-25 1987-07-04 Hitachi Ltd Logic integrated circuit device
JPS6358942A (en) * 1986-08-29 1988-03-14 Fujitsu Ltd Semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6065546A (en) * 1983-09-20 1985-04-15 Fujitsu Ltd Gate array type integrated circuit
JPS62150844A (en) * 1985-12-25 1987-07-04 Hitachi Ltd Logic integrated circuit device
JPS6358942A (en) * 1986-08-29 1988-03-14 Fujitsu Ltd Semiconductor device

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