JPH0193149A - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JPH0193149A JPH0193149A JP62250351A JP25035187A JPH0193149A JP H0193149 A JPH0193149 A JP H0193149A JP 62250351 A JP62250351 A JP 62250351A JP 25035187 A JP25035187 A JP 25035187A JP H0193149 A JPH0193149 A JP H0193149A
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- layer
- film
- bump electrode
- bump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H10W20/4405—
-
- H10W70/60—
-
- H10W72/012—
-
- H10W72/01255—
-
- H10W72/20—
-
- H10W72/234—
-
- H10W72/242—
-
- H10W72/244—
-
- H10W72/251—
-
- H10W72/29—
-
- H10W72/923—
-
- H10W72/942—
-
- H10W72/983—
-
- H10W90/724—
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62250351A JPH0193149A (ja) | 1987-10-02 | 1987-10-02 | 半導体装置 |
| DE3830131A DE3830131A1 (de) | 1987-10-02 | 1988-09-05 | Flip-chip-halbleitereinrichtung |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62250351A JPH0193149A (ja) | 1987-10-02 | 1987-10-02 | 半導体装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0193149A true JPH0193149A (ja) | 1989-04-12 |
Family
ID=17206624
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62250351A Pending JPH0193149A (ja) | 1987-10-02 | 1987-10-02 | 半導体装置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPH0193149A (cg-RX-API-DMAC10.html) |
| DE (1) | DE3830131A1 (cg-RX-API-DMAC10.html) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005322834A (ja) * | 2004-05-11 | 2005-11-17 | Ricoh Co Ltd | パターン形状体及びその製造方法 |
| JP2007110012A (ja) * | 2005-10-17 | 2007-04-26 | Ngk Insulators Ltd | 誘電体デバイスの製造方法、及び誘電体デバイス |
| JP2008114795A (ja) * | 2006-11-07 | 2008-05-22 | Mazda Motor Corp | カーテンエアバッグ装置を備えた車両構造 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2598328B2 (ja) * | 1989-10-17 | 1997-04-09 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
| US5268072A (en) * | 1992-08-31 | 1993-12-07 | International Business Machines Corporation | Etching processes for avoiding edge stress in semiconductor chip solder bumps |
| IL106892A0 (en) * | 1993-09-02 | 1993-12-28 | Pierre Badehi | Methods and apparatus for producing integrated circuit devices |
| IL108359A (en) * | 1994-01-17 | 2001-04-30 | Shellcase Ltd | Method and apparatus for producing integrated circuit devices |
| IL110261A0 (en) * | 1994-07-10 | 1994-10-21 | Schellcase Ltd | Packaged integrated circuit |
| KR20220147617A (ko) * | 2020-03-02 | 2022-11-03 | 인프리아 코포레이션 | 무기 레지스트 패터닝을 위한 공정 환경 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5688359A (en) * | 1979-12-21 | 1981-07-17 | Toshiba Corp | Semiconductor device and manufacture thereof |
| JPS6288342A (ja) * | 1985-10-15 | 1987-04-22 | Fujitsu Ltd | 積層強化型配線層の構造とその形成方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4017890A (en) * | 1975-10-24 | 1977-04-12 | International Business Machines Corporation | Intermetallic compound layer in thin films for improved electromigration resistance |
| US4502207A (en) * | 1982-12-21 | 1985-03-05 | Toshiba Shibaura Denki Kabushiki Kaisha | Wiring material for semiconductor device and method for forming wiring pattern therewith |
-
1987
- 1987-10-02 JP JP62250351A patent/JPH0193149A/ja active Pending
-
1988
- 1988-09-05 DE DE3830131A patent/DE3830131A1/de active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5688359A (en) * | 1979-12-21 | 1981-07-17 | Toshiba Corp | Semiconductor device and manufacture thereof |
| JPS6288342A (ja) * | 1985-10-15 | 1987-04-22 | Fujitsu Ltd | 積層強化型配線層の構造とその形成方法 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005322834A (ja) * | 2004-05-11 | 2005-11-17 | Ricoh Co Ltd | パターン形状体及びその製造方法 |
| JP2007110012A (ja) * | 2005-10-17 | 2007-04-26 | Ngk Insulators Ltd | 誘電体デバイスの製造方法、及び誘電体デバイス |
| JP2008114795A (ja) * | 2006-11-07 | 2008-05-22 | Mazda Motor Corp | カーテンエアバッグ装置を備えた車両構造 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3830131C2 (cg-RX-API-DMAC10.html) | 1993-08-12 |
| DE3830131A1 (de) | 1989-04-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5709958A (en) | Electronic parts | |
| US5173449A (en) | Metallization process | |
| US4166279A (en) | Electromigration resistance in gold thin film conductors | |
| US6001461A (en) | Electronic parts and manufacturing method thereof | |
| US3879746A (en) | Gate metallization structure | |
| US4283439A (en) | Method of manufacturing a semiconductor device by forming a tungsten silicide or molybdenum silicide electrode | |
| US6203926B1 (en) | Corrosion-free multi-layer conductor | |
| EP0725439B1 (en) | Electronic parts with metal wiring and manufacturing method thereof | |
| US5876861A (en) | Sputter-deposited nickel layer | |
| US7799677B2 (en) | Device comprising multi-layered thin film having excellent adhesive strength and method for fabricating the same | |
| JPH0193149A (ja) | 半導体装置 | |
| JPS5846631A (ja) | 半導体装置及びその製造方法 | |
| EP0323554A1 (en) | Ohmic contacts for semiconductor devices and method for forming ohmic contacts | |
| EP0402061B1 (en) | Metallization process | |
| JP2789332B2 (ja) | 金属配線の構造及びその形成方法 | |
| US3798145A (en) | Technique for reducing interdiffusion rates and inhibiting metallic compound formation between titanium and platinum | |
| JP3315211B2 (ja) | 電子部品 | |
| US4726983A (en) | Homogeneous fine grained metal film on substrate and manufacturing method thereof | |
| US3746944A (en) | Contact members for silicon semiconductor devices | |
| US4923526A (en) | Homogeneous fine grained metal film on substrate and manufacturing method thereof | |
| EP0033358B1 (en) | Process for fabricating thin metal superconducting films of improved thermal cyclability and device | |
| JPH03142883A (ja) | 半導体装置及びその製造方法 | |
| JP2742686B2 (ja) | 半導体装置 | |
| JPH06140401A (ja) | 集積回路装置 | |
| JP2707305B2 (ja) | 薄膜形成法とそれによって得られた半導体装置及びその製造方法 |