JPH0176027U - - Google Patents

Info

Publication number
JPH0176027U
JPH0176027U JP1987170549U JP17054987U JPH0176027U JP H0176027 U JPH0176027 U JP H0176027U JP 1987170549 U JP1987170549 U JP 1987170549U JP 17054987 U JP17054987 U JP 17054987U JP H0176027 U JPH0176027 U JP H0176027U
Authority
JP
Japan
Prior art keywords
sample chamber
chamber
plasma
ecr
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1987170549U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987170549U priority Critical patent/JPH0176027U/ja
Publication of JPH0176027U publication Critical patent/JPH0176027U/ja
Pending legal-status Critical Current

Links

JP1987170549U 1987-11-08 1987-11-08 Pending JPH0176027U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987170549U JPH0176027U (enrdf_load_stackoverflow) 1987-11-08 1987-11-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987170549U JPH0176027U (enrdf_load_stackoverflow) 1987-11-08 1987-11-08

Publications (1)

Publication Number Publication Date
JPH0176027U true JPH0176027U (enrdf_load_stackoverflow) 1989-05-23

Family

ID=31461595

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987170549U Pending JPH0176027U (enrdf_load_stackoverflow) 1987-11-08 1987-11-08

Country Status (1)

Country Link
JP (1) JPH0176027U (enrdf_load_stackoverflow)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59100516A (ja) * 1982-11-12 1984-06-09 エナ−ジ−・コンバ−シヨン・デバイセス・インコ−ポレ−テツド 光電池素子の製造装置及びアセンブリ
JPS62131513A (ja) * 1985-12-04 1987-06-13 Hitachi Ltd 多室分離型プラズマｃｖｄ装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59100516A (ja) * 1982-11-12 1984-06-09 エナ−ジ−・コンバ−シヨン・デバイセス・インコ−ポレ−テツド 光電池素子の製造装置及びアセンブリ
JPS62131513A (ja) * 1985-12-04 1987-06-13 Hitachi Ltd 多室分離型プラズマｃｖｄ装置

Similar Documents

Publication Publication Date Title
US5016564A (en) Plasma apparatus
US7862694B2 (en) Composite coating device and method of forming overcoat on magnetic head using the same
JPS61179872A (ja) マグネトロンエンハンスプラズマ補助式化学蒸着のための装置ならびに方法
JPH07226378A (ja) 成膜方法およびこれに用いるプラズマ装置
US5366586A (en) Plasma formation using electron cyclotron resonance and method for processing substrate by using the same
JPH0176027U (enrdf_load_stackoverflow)
JP3944946B2 (ja) 薄膜形成装置
WO2000019501A1 (fr) Procede et appareil de traitement au plasma
JP2808922B2 (ja) ダイヤモンド状カーボン膜形成方法
JP2936790B2 (ja) 薄膜形成装置
JP2913736B2 (ja) Ｃｖｄ装置
JP2784407B2 (ja) プラズマ処理装置
JP2743386B2 (ja) 薄膜形成方法
JP2995705B2 (ja) 硬質カーボン膜形成方法
JP2576139B2 (ja) プラズマ装置
JP2720906B2 (ja) 薄膜形成装置
JP2570805B2 (ja) プラズマ付着装置
JPH0633270A (ja) 真空処理装置
JPH028132U (enrdf_load_stackoverflow)
JP2808741B2 (ja) 硬質カーボン膜製造方法
JPH01205534A (ja) プラズマ処理装置
JPS63301497A (ja) プラズマ制御方法
JPH0640542B2 (ja) マイクロ波プラズマ処理装置
JPH06275564A (ja) マイクロ波プラズマエッチング装置
JPS63240013A (ja) 反応装置