JPH0158267B2 - - Google Patents
Info
- Publication number
- JPH0158267B2 JPH0158267B2 JP62250298A JP25029887A JPH0158267B2 JP H0158267 B2 JPH0158267 B2 JP H0158267B2 JP 62250298 A JP62250298 A JP 62250298A JP 25029887 A JP25029887 A JP 25029887A JP H0158267 B2 JPH0158267 B2 JP H0158267B2
- Authority
- JP
- Japan
- Prior art keywords
- oxide
- cerium oxide
- sputtering
- cerium
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 21
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 9
- 239000008188 pellet Substances 0.000 claims description 9
- 238000004544 sputter deposition Methods 0.000 claims description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 7
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 7
- 238000001771 vacuum deposition Methods 0.000 claims description 7
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 6
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 6
- 229910000416 bismuth oxide Inorganic materials 0.000 claims description 5
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 5
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 5
- 229910000410 antimony oxide Inorganic materials 0.000 claims description 4
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 4
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 claims description 4
- 238000005245 sintering Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 10
- 238000000151 deposition Methods 0.000 description 8
- 230000008021 deposition Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 238000007740 vapor deposition Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000000975 co-precipitation Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25029887A JPH0192365A (ja) | 1987-10-02 | 1987-10-02 | 真空蒸着又はスパッタ用酸化セリウム組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25029887A JPH0192365A (ja) | 1987-10-02 | 1987-10-02 | 真空蒸着又はスパッタ用酸化セリウム組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0192365A JPH0192365A (ja) | 1989-04-11 |
| JPH0158267B2 true JPH0158267B2 (zh) | 1989-12-11 |
Family
ID=17205824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25029887A Granted JPH0192365A (ja) | 1987-10-02 | 1987-10-02 | 真空蒸着又はスパッタ用酸化セリウム組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0192365A (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0339467A (ja) * | 1989-07-06 | 1991-02-20 | Matsushita Electric Ind Co Ltd | スパッタ用ターゲットの製造方法 |
| TWI249164B (en) | 2001-11-22 | 2006-02-11 | Tdk Corp | Optical recording medium |
-
1987
- 1987-10-02 JP JP25029887A patent/JPH0192365A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0192365A (ja) | 1989-04-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3836163B2 (ja) | 高屈折率膜の形成方法 | |
| Randhawa et al. | SnO2 films prepared by activated reactive evaporation | |
| US4187340A (en) | Method of forming patterned transparent electro-conductive film on the substrate of liquid crystal display | |
| KR19990014682A (ko) | 혼합 산화물 고굴절률 광학 코팅 재료 및 방법 | |
| KR20060054000A (ko) | 고 굴절률의 층을 제조하기 위한 기상-증착 재료 | |
| JP2005256175A (ja) | ターゲットおよび該ターゲットによる高屈折率膜の製造方法 | |
| US2964427A (en) | Ultra-violet filter | |
| US5415946A (en) | Vapor-deposition material for the production of optical coatings of medium refractive index | |
| US5776847A (en) | Stabilized vapour-deposition materials based on titanium oxide | |
| JP2011084819A (ja) | 高屈折率光学層を製造するための蒸着材料 | |
| JPH0158267B2 (zh) | ||
| WO1997047564A1 (fr) | Corps antireflets photo-absorbant et procede de production correspondant | |
| JP2006519305A (ja) | 高屈折率の光学的層を製造するための蒸着材料 | |
| JP5008807B2 (ja) | 高屈折率光学層製造用蒸着材料および蒸着材料の製造方法 | |
| JP2008057045A (ja) | 酸化物焼結体スパッタリングターゲット | |
| JPS6128027B2 (zh) | ||
| JPH08277462A (ja) | 中屈折率の光学被膜 | |
| JP3160309B2 (ja) | 薄膜形成方法 | |
| JPS59148002A (ja) | 蒸着およびスパツタ用酸化ジルコニウム組成物およびそれを用いる光学用薄膜の製造方法 | |
| JP3472169B2 (ja) | 中間屈折率の光学薄膜用蒸着材料および該蒸着材料を用いた光学薄膜 | |
| JPS6151281B2 (zh) | ||
| JP2565936B2 (ja) | クラッド容器 | |
| JPH0726371A (ja) | スパッタリング用ターゲットおよび低屈折膜 | |
| JP2743707B2 (ja) | 混合被膜付きガラス及びその製造方法 | |
| JPH0667001A (ja) | 蒸着用材料 |