JPH0149931B2 - - Google Patents

Info

Publication number
JPH0149931B2
JPH0149931B2 JP14707281A JP14707281A JPH0149931B2 JP H0149931 B2 JPH0149931 B2 JP H0149931B2 JP 14707281 A JP14707281 A JP 14707281A JP 14707281 A JP14707281 A JP 14707281A JP H0149931 B2 JPH0149931 B2 JP H0149931B2
Authority
JP
Japan
Prior art keywords
group
formula
integer
compound
silicone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14707281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5848045A (ja
Inventor
Yoshihiro Kubota
Toshio Shiobara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin-Etsu Chemical Co Ltd
Original Assignee
Shin-Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin-Etsu Chemical Co Ltd filed Critical Shin-Etsu Chemical Co Ltd
Priority to JP14707281A priority Critical patent/JPS5848045A/ja
Publication of JPS5848045A publication Critical patent/JPS5848045A/ja
Publication of JPH0149931B2 publication Critical patent/JPH0149931B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP14707281A 1981-09-18 1981-09-18 感光性組成物 Granted JPS5848045A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14707281A JPS5848045A (ja) 1981-09-18 1981-09-18 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14707281A JPS5848045A (ja) 1981-09-18 1981-09-18 感光性組成物

Publications (2)

Publication Number Publication Date
JPS5848045A JPS5848045A (ja) 1983-03-19
JPH0149931B2 true JPH0149931B2 (enExample) 1989-10-26

Family

ID=15421830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14707281A Granted JPS5848045A (ja) 1981-09-18 1981-09-18 感光性組成物

Country Status (1)

Country Link
JP (1) JPS5848045A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3473359D1 (de) * 1983-06-29 1988-09-15 Fuji Photo Film Co Ltd Photosolubilizable composition
US4603195A (en) * 1983-12-30 1986-07-29 International Business Machines Corporation Organosilicon compound and use thereof in photolithography
JPS61144639A (ja) * 1984-12-19 1986-07-02 Hitachi Ltd 放射線感応性組成物及びそれを用いたパタ−ン形成法
JP2597163B2 (ja) * 1988-09-22 1997-04-02 富士写真フイルム株式会社 感光性組成物
US5238773A (en) * 1988-10-28 1993-08-24 International Business Machines Corporation Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups
US5215861A (en) * 1992-03-17 1993-06-01 International Business Machines Corporation Thermographic reversible photoresist
DE69300616T2 (de) * 1992-04-30 1996-05-30 Ibm Silikon enthaltendes positives Photoresistmaterial und dessen Verwendung in Dünnfilm-Verpackung-Technologie.
JP2547944B2 (ja) * 1992-09-30 1996-10-30 インターナショナル・ビジネス・マシーンズ・コーポレイション 二層レジスト組成物を使用する光学リソグラフによりサブ−ハーフミクロンパターンを形成する方法
JP2008122916A (ja) * 2006-10-16 2008-05-29 Hitachi Chem Co Ltd 感光性樹脂組成物、シリカ系被膜の形成方法、及びシリカ系被膜を備える装置及び部材
JP6003855B2 (ja) * 2013-09-13 2016-10-05 信越化学工業株式会社 ポジ型レジスト材料及びパターン形成方法

Also Published As

Publication number Publication date
JPS5848045A (ja) 1983-03-19

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