JPH0149930B2 - - Google Patents

Info

Publication number
JPH0149930B2
JPH0149930B2 JP9649481A JP9649481A JPH0149930B2 JP H0149930 B2 JPH0149930 B2 JP H0149930B2 JP 9649481 A JP9649481 A JP 9649481A JP 9649481 A JP9649481 A JP 9649481A JP H0149930 B2 JPH0149930 B2 JP H0149930B2
Authority
JP
Japan
Prior art keywords
group
formula
photosensitive
polymer
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9649481A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57212433A (en
Inventor
Mitsumasa Kojima
Fumio Kataoka
Fusaji Shoji
Isao Obara
Ataru Yokono
Tokio Isogai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP9649481A priority Critical patent/JPS57212433A/ja
Priority to GB8137851A priority patent/GB2092164B/en
Priority to FR8123637A priority patent/FR2496111B1/fr
Priority to US06/331,875 priority patent/US4451551A/en
Priority to DE3150054A priority patent/DE3150054C2/de
Publication of JPS57212433A publication Critical patent/JPS57212433A/ja
Publication of JPH0149930B2 publication Critical patent/JPH0149930B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0041—Optical brightening agents, organic pigments

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP9649481A 1980-12-17 1981-06-24 Photosensitive polymer composition Granted JPS57212433A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP9649481A JPS57212433A (en) 1981-06-24 1981-06-24 Photosensitive polymer composition
GB8137851A GB2092164B (en) 1980-12-17 1981-12-16 Loght or radiation-sensitive polymer composition
FR8123637A FR2496111B1 (fr) 1980-12-17 1981-12-17 Composition polymere sensible a la lumiere ou aux radiations, son utilisation pour former des dessins en relief, et composes entrant dans cette composition
US06/331,875 US4451551A (en) 1980-12-17 1981-12-17 Radiation-sensitive poly(amic acid) polymer composition
DE3150054A DE3150054C2 (de) 1980-12-17 1981-12-17 Licht- oder strahlungsempfindliche Polymerzusammensetzungen und ihre Verwendung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9649481A JPS57212433A (en) 1981-06-24 1981-06-24 Photosensitive polymer composition

Publications (2)

Publication Number Publication Date
JPS57212433A JPS57212433A (en) 1982-12-27
JPH0149930B2 true JPH0149930B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-10-26

Family

ID=14166633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9649481A Granted JPS57212433A (en) 1980-12-17 1981-06-24 Photosensitive polymer composition

Country Status (1)

Country Link
JP (1) JPS57212433A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Also Published As

Publication number Publication date
JPS57212433A (en) 1982-12-27

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