JPH0145974B2 - - Google Patents

Info

Publication number
JPH0145974B2
JPH0145974B2 JP58170771A JP17077183A JPH0145974B2 JP H0145974 B2 JPH0145974 B2 JP H0145974B2 JP 58170771 A JP58170771 A JP 58170771A JP 17077183 A JP17077183 A JP 17077183A JP H0145974 B2 JPH0145974 B2 JP H0145974B2
Authority
JP
Japan
Prior art keywords
photoresist
valve
pull
main discharge
output side
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58170771A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6062121A (ja
Inventor
Hidemi Amai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP58170771A priority Critical patent/JPS6062121A/ja
Publication of JPS6062121A publication Critical patent/JPS6062121A/ja
Publication of JPH0145974B2 publication Critical patent/JPH0145974B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58170771A 1983-09-16 1983-09-16 フオトレジスト吐出装置 Granted JPS6062121A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58170771A JPS6062121A (ja) 1983-09-16 1983-09-16 フオトレジスト吐出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58170771A JPS6062121A (ja) 1983-09-16 1983-09-16 フオトレジスト吐出装置

Publications (2)

Publication Number Publication Date
JPS6062121A JPS6062121A (ja) 1985-04-10
JPH0145974B2 true JPH0145974B2 (ref) 1989-10-05

Family

ID=15911067

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58170771A Granted JPS6062121A (ja) 1983-09-16 1983-09-16 フオトレジスト吐出装置

Country Status (1)

Country Link
JP (1) JPS6062121A (ref)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0811207B2 (ja) * 1986-10-03 1996-02-07 ノードソン株式会社 液体の微量精密吐出調整方法とその装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4935435A (ref) * 1972-08-09 1974-04-02
JPS5898641U (ja) * 1981-12-25 1983-07-05 凸版印刷株式会社 レジスト供給装置

Also Published As

Publication number Publication date
JPS6062121A (ja) 1985-04-10

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