JPS6062121A - フオトレジスト吐出装置 - Google Patents

フオトレジスト吐出装置

Info

Publication number
JPS6062121A
JPS6062121A JP58170771A JP17077183A JPS6062121A JP S6062121 A JPS6062121 A JP S6062121A JP 58170771 A JP58170771 A JP 58170771A JP 17077183 A JP17077183 A JP 17077183A JP S6062121 A JPS6062121 A JP S6062121A
Authority
JP
Japan
Prior art keywords
photoresist
resist
photo
valve
discharge port
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58170771A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0145974B2 (ref
Inventor
Hidemi Amai
秀美 天井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP58170771A priority Critical patent/JPS6062121A/ja
Publication of JPS6062121A publication Critical patent/JPS6062121A/ja
Publication of JPH0145974B2 publication Critical patent/JPH0145974B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58170771A 1983-09-16 1983-09-16 フオトレジスト吐出装置 Granted JPS6062121A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58170771A JPS6062121A (ja) 1983-09-16 1983-09-16 フオトレジスト吐出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58170771A JPS6062121A (ja) 1983-09-16 1983-09-16 フオトレジスト吐出装置

Publications (2)

Publication Number Publication Date
JPS6062121A true JPS6062121A (ja) 1985-04-10
JPH0145974B2 JPH0145974B2 (ref) 1989-10-05

Family

ID=15911067

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58170771A Granted JPS6062121A (ja) 1983-09-16 1983-09-16 フオトレジスト吐出装置

Country Status (1)

Country Link
JP (1) JPS6062121A (ref)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1988002281A1 (fr) * 1986-10-03 1988-04-07 Nordson Corporation Procede et appareil permettant de distribuer avec precision de petites quantites de liquide

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4935435A (ref) * 1972-08-09 1974-04-02
JPS5898641U (ja) * 1981-12-25 1983-07-05 凸版印刷株式会社 レジスト供給装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4935435A (ref) * 1972-08-09 1974-04-02
JPS5898641U (ja) * 1981-12-25 1983-07-05 凸版印刷株式会社 レジスト供給装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1988002281A1 (fr) * 1986-10-03 1988-04-07 Nordson Corporation Procede et appareil permettant de distribuer avec precision de petites quantites de liquide

Also Published As

Publication number Publication date
JPH0145974B2 (ref) 1989-10-05

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