JPH0145613B2 - - Google Patents

Info

Publication number
JPH0145613B2
JPH0145613B2 JP56006708A JP670881A JPH0145613B2 JP H0145613 B2 JPH0145613 B2 JP H0145613B2 JP 56006708 A JP56006708 A JP 56006708A JP 670881 A JP670881 A JP 670881A JP H0145613 B2 JPH0145613 B2 JP H0145613B2
Authority
JP
Japan
Prior art keywords
copolymer
polymerization
compound
composition
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56006708A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57120931A (en
Inventor
Yukihiro Hosaka
Yoichi Kamoshita
Yoshuki Harita
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP670881A priority Critical patent/JPS57120931A/ja
Publication of JPS57120931A publication Critical patent/JPS57120931A/ja
Publication of JPH0145613B2 publication Critical patent/JPH0145613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP670881A 1981-01-20 1981-01-20 Positive type photosensitive resin composition Granted JPS57120931A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP670881A JPS57120931A (en) 1981-01-20 1981-01-20 Positive type photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP670881A JPS57120931A (en) 1981-01-20 1981-01-20 Positive type photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS57120931A JPS57120931A (en) 1982-07-28
JPH0145613B2 true JPH0145613B2 (OSRAM) 1989-10-04

Family

ID=11645790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP670881A Granted JPS57120931A (en) 1981-01-20 1981-01-20 Positive type photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS57120931A (OSRAM)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57151939A (en) * 1981-03-16 1982-09-20 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
DE3344202A1 (de) * 1983-12-07 1985-06-20 Merck Patent Gmbh, 6100 Darmstadt Positiv-fotoresistzusammensetzungen
US4564575A (en) * 1984-01-30 1986-01-14 International Business Machines Corporation Tailoring of novolak and diazoquinone positive resists by acylation of novolak
KR101191687B1 (ko) * 2004-04-30 2012-10-16 마루젠 세끼유가가꾸 가부시키가이샤 반도체 리소그래피용 공중합체와 그 제조 방법, 및 조성물
JP2006096925A (ja) * 2004-09-30 2006-04-13 Sumitomo Bakelite Co Ltd 樹脂組成物、樹脂層、樹脂層付きキャリア材料および回路基板
JP5631550B2 (ja) * 2009-02-27 2014-11-26 丸善石油化学株式会社 フォトレジスト用共重合体の製造方法
JP5811848B2 (ja) 2010-10-18 2015-11-11 三菱レイヨン株式会社 リソグラフィー用重合体の製造方法、レジスト組成物の製造方法、パターンが形成された基板の製造方法
DE102014213657A1 (de) * 2014-07-14 2016-01-14 Wacker Chemie Ag Fettsäurevinylester-Copolymere mit Wachseigenschaften

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition

Also Published As

Publication number Publication date
JPS57120931A (en) 1982-07-28

Similar Documents

Publication Publication Date Title
US4384037A (en) Positive type photosensitive resin composition
KR101312603B1 (ko) 포지티브형 감광성 수지 조성물
EP0855620B1 (en) Positive photoresist composition
JP3987491B2 (ja) フォトレジスト用感光性樹脂組成物
TWI403836B (zh) 感光性樹脂組成物
TWI516872B (zh) 適於與上塗光阻倂用之塗覆組成物
JPH0145613B2 (OSRAM)
CN115097694B (zh) 一种树脂组合物以及使用其的光刻胶图形化的方法
KR20080070573A (ko) 노볼락 수지 블렌드를 포함하는 포토레지스트
JP2006111802A (ja) 重合体、フォトレジスト、エポキシ硬化剤および塗料
CN115167078A (zh) 正型光刻胶组合物和固化膜及其合成方法
JP4692219B2 (ja) ポジ型感光性絶縁樹脂組成物およびその硬化物
JP4906356B2 (ja) 感光性樹脂組成物、ｌｃｄ基板及びそのパターン形成方法
JP5753074B2 (ja) 感光性樹脂組成物、感光性ドライフィルムおよびパターン形成方法
JPS5875149A (ja) ポジ型感光性樹脂組成物
WO2014010473A1 (ja) 感光性樹脂組成物、感光性ドライフィルム、パターン形成方法、プリント配線板およびその製造方法
JPH05107757A (ja) 感光性樹脂組成物
JPH0145614B2 (OSRAM)
JP2002182380A (ja) 有機ｅｌ表示素子の絶縁膜形成用感放射線性樹脂組成物、それから形成された絶縁膜、および有機ｅｌ表示素子
JPH11307907A (ja) 電極の製造方法および転写フィルム
CN115873176B (zh) 一种duv光刻用底部抗反射涂层及其制备方法和应用
US12158700B2 (en) Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated molded article, and semiconductor apparatus
JP7451270B2 (ja) 感放射線性組成物の処理方法
JPS5843451A (ja) ポジ型感光性樹脂組成物
TW200538880A (en) Positive photoresist composition