JPH0142628B2 - - Google Patents
Info
- Publication number
- JPH0142628B2 JPH0142628B2 JP18803583A JP18803583A JPH0142628B2 JP H0142628 B2 JPH0142628 B2 JP H0142628B2 JP 18803583 A JP18803583 A JP 18803583A JP 18803583 A JP18803583 A JP 18803583A JP H0142628 B2 JPH0142628 B2 JP H0142628B2
- Authority
- JP
- Japan
- Prior art keywords
- surface treatment
- level
- plate
- target level
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 42
- 238000004381 surface treatment Methods 0.000 claims description 33
- 238000001514 detection method Methods 0.000 claims description 29
- 238000005530 etching Methods 0.000 claims description 25
- 238000011161 development Methods 0.000 claims description 3
- 238000012545 processing Methods 0.000 description 21
- 239000000758 substrate Substances 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000010408 film Substances 0.000 description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 8
- 239000002184 metal Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000000835 fiber Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000013307 optical fiber Substances 0.000 description 3
- 238000012935 Averaging Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000002250 progressing effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58188035A JPS6079728A (ja) | 1983-10-06 | 1983-10-06 | 表面処理方法 |
| US06/611,420 US4569717A (en) | 1983-05-24 | 1984-05-17 | Method of surface treatment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58188035A JPS6079728A (ja) | 1983-10-06 | 1983-10-06 | 表面処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6079728A JPS6079728A (ja) | 1985-05-07 |
| JPH0142628B2 true JPH0142628B2 (enExample) | 1989-09-13 |
Family
ID=16216524
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58188035A Granted JPS6079728A (ja) | 1983-05-24 | 1983-10-06 | 表面処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6079728A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2598508B1 (fr) * | 1986-05-09 | 1989-05-12 | Guillaume Michel | Procede et appareil de determination de fin d'attaque d'une surface gravee |
| JP4952123B2 (ja) * | 2005-12-13 | 2012-06-13 | パナソニック株式会社 | コンデンサユニット |
-
1983
- 1983-10-06 JP JP58188035A patent/JPS6079728A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6079728A (ja) | 1985-05-07 |
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