JPH0141250B2 - - Google Patents

Info

Publication number
JPH0141250B2
JPH0141250B2 JP59162689A JP16268984A JPH0141250B2 JP H0141250 B2 JPH0141250 B2 JP H0141250B2 JP 59162689 A JP59162689 A JP 59162689A JP 16268984 A JP16268984 A JP 16268984A JP H0141250 B2 JPH0141250 B2 JP H0141250B2
Authority
JP
Japan
Prior art keywords
wafer
mask
cassette
unexposed
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59162689A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6140029A (ja
Inventor
Motonori Yokoyama
Yutaka Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yutaka Giken Co Ltd
Original Assignee
Yutaka Giken Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yutaka Giken Co Ltd filed Critical Yutaka Giken Co Ltd
Priority to JP16268984A priority Critical patent/JPS6140029A/ja
Publication of JPS6140029A publication Critical patent/JPS6140029A/ja
Publication of JPH0141250B2 publication Critical patent/JPH0141250B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP16268984A 1984-07-31 1984-07-31 自動マスク・ウェーハ目合せ焼付方法 Granted JPS6140029A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16268984A JPS6140029A (ja) 1984-07-31 1984-07-31 自動マスク・ウェーハ目合せ焼付方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16268984A JPS6140029A (ja) 1984-07-31 1984-07-31 自動マスク・ウェーハ目合せ焼付方法

Publications (2)

Publication Number Publication Date
JPS6140029A JPS6140029A (ja) 1986-02-26
JPH0141250B2 true JPH0141250B2 (enrdf_load_stackoverflow) 1989-09-04

Family

ID=15759424

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16268984A Granted JPS6140029A (ja) 1984-07-31 1984-07-31 自動マスク・ウェーハ目合せ焼付方法

Country Status (1)

Country Link
JP (1) JPS6140029A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0638389B2 (ja) * 1985-02-01 1994-05-18 株式会社日立製作所 半導体用露光装置
KR940000696B1 (ko) * 1986-04-15 1994-01-27 햄프셔 인스트루 먼트스 인코포레이티드 엑스레이 석판인쇄 장치

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50152670A (enrdf_load_stackoverflow) * 1974-05-28 1975-12-08
GB1477150A (en) * 1974-08-21 1977-06-22 Ciba Geigy Ag Pigment compositions

Also Published As

Publication number Publication date
JPS6140029A (ja) 1986-02-26

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