JPS50152670A - - Google Patents
Info
- Publication number
- JPS50152670A JPS50152670A JP49059922A JP5992274A JPS50152670A JP S50152670 A JPS50152670 A JP S50152670A JP 49059922 A JP49059922 A JP 49059922A JP 5992274 A JP5992274 A JP 5992274A JP S50152670 A JPS50152670 A JP S50152670A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49059922A JPS50152670A (enrdf_load_stackoverflow) | 1974-05-28 | 1974-05-28 | |
NL7506294A NL7506294A (nl) | 1974-05-28 | 1975-05-28 | Werkwijze voor het opstellen van een velachtig materiaal tegenover een standaardvlak met een voorafbepaalde ruimte ertussen. |
DE19752523790 DE2523790C2 (de) | 1974-05-28 | 1975-05-28 | Vorrichtung zur Anordnung eines Scheibchens parallel und mit bestimmtem Abstand zu einer Maske |
GB2326075A GB1515696A (en) | 1974-05-28 | 1975-05-28 | Sheet positioning apparatus |
US05/769,900 US4179110A (en) | 1974-05-28 | 1977-02-18 | Method for opposing a sheet-like material to a standard plane with predetermined space therebetween |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP49059922A JPS50152670A (enrdf_load_stackoverflow) | 1974-05-28 | 1974-05-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS50152670A true JPS50152670A (enrdf_load_stackoverflow) | 1975-12-08 |
Family
ID=13127098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP49059922A Pending JPS50152670A (enrdf_load_stackoverflow) | 1974-05-28 | 1974-05-28 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS50152670A (enrdf_load_stackoverflow) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5375775A (en) * | 1976-12-16 | 1978-07-05 | Canon Inc | Alignment unit |
JPS5453968A (en) * | 1977-10-07 | 1979-04-27 | Canon Inc | Alignment unit |
JPS5565433A (en) * | 1978-11-13 | 1980-05-16 | Nippon Telegr & Teleph Corp <Ntt> | Setting device for mask/wafer clearance |
JPS5571025A (en) * | 1978-11-24 | 1980-05-28 | Hitachi Ltd | Providing fine gap |
JPS56130738A (en) * | 1980-03-19 | 1981-10-13 | Hitachi Ltd | Method and device for exposure |
JPS6140029A (ja) * | 1984-07-31 | 1986-02-26 | Sokueishiya Kk | 自動マスク・ウェーハ目合せ焼付方法 |
-
1974
- 1974-05-28 JP JP49059922A patent/JPS50152670A/ja active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5375775A (en) * | 1976-12-16 | 1978-07-05 | Canon Inc | Alignment unit |
JPS5453968A (en) * | 1977-10-07 | 1979-04-27 | Canon Inc | Alignment unit |
JPS5565433A (en) * | 1978-11-13 | 1980-05-16 | Nippon Telegr & Teleph Corp <Ntt> | Setting device for mask/wafer clearance |
JPS5571025A (en) * | 1978-11-24 | 1980-05-28 | Hitachi Ltd | Providing fine gap |
JPS56130738A (en) * | 1980-03-19 | 1981-10-13 | Hitachi Ltd | Method and device for exposure |
JPS6140029A (ja) * | 1984-07-31 | 1986-02-26 | Sokueishiya Kk | 自動マスク・ウェーハ目合せ焼付方法 |