JPS6140029A - 自動マスク・ウェーハ目合せ焼付方法 - Google Patents

自動マスク・ウェーハ目合せ焼付方法

Info

Publication number
JPS6140029A
JPS6140029A JP16268984A JP16268984A JPS6140029A JP S6140029 A JPS6140029 A JP S6140029A JP 16268984 A JP16268984 A JP 16268984A JP 16268984 A JP16268984 A JP 16268984A JP S6140029 A JPS6140029 A JP S6140029A
Authority
JP
Japan
Prior art keywords
wafer
mask
cassette
point
parallel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16268984A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0141250B2 (enrdf_load_stackoverflow
Inventor
Motonori Yokoyama
横山　元宣
Yutaka Nakamura
豊 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SOKUEISHIYA KK
Yutaka Giken Co Ltd
Original Assignee
SOKUEISHIYA KK
Yutaka Giken Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SOKUEISHIYA KK, Yutaka Giken Co Ltd filed Critical SOKUEISHIYA KK
Priority to JP16268984A priority Critical patent/JPS6140029A/ja
Publication of JPS6140029A publication Critical patent/JPS6140029A/ja
Publication of JPH0141250B2 publication Critical patent/JPH0141250B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP16268984A 1984-07-31 1984-07-31 自動マスク・ウェーハ目合せ焼付方法 Granted JPS6140029A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16268984A JPS6140029A (ja) 1984-07-31 1984-07-31 自動マスク・ウェーハ目合せ焼付方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16268984A JPS6140029A (ja) 1984-07-31 1984-07-31 自動マスク・ウェーハ目合せ焼付方法

Publications (2)

Publication Number Publication Date
JPS6140029A true JPS6140029A (ja) 1986-02-26
JPH0141250B2 JPH0141250B2 (enrdf_load_stackoverflow) 1989-09-04

Family

ID=15759424

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16268984A Granted JPS6140029A (ja) 1984-07-31 1984-07-31 自動マスク・ウェーハ目合せ焼付方法

Country Status (1)

Country Link
JP (1) JPS6140029A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61177726A (ja) * 1985-02-01 1986-08-09 Hitachi Ltd 半導体用露光装置
JPS62273727A (ja) * 1986-04-15 1987-11-27 ハンプシヤ−　インスツルメンツ，インコ−ポレ−テツド Ｘ線リソグラフイ装置及び処理方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50152670A (enrdf_load_stackoverflow) * 1974-05-28 1975-12-08
JPS5147026A (ja) * 1974-08-21 1976-04-22 Ciba Geigy Biizukeijonoganryososeibutsunoseizoho

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50152670A (enrdf_load_stackoverflow) * 1974-05-28 1975-12-08
JPS5147026A (ja) * 1974-08-21 1976-04-22 Ciba Geigy Biizukeijonoganryososeibutsunoseizoho

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61177726A (ja) * 1985-02-01 1986-08-09 Hitachi Ltd 半導体用露光装置
JPS62273727A (ja) * 1986-04-15 1987-11-27 ハンプシヤ−　インスツルメンツ，インコ−ポレ−テツド Ｘ線リソグラフイ装置及び処理方法

Also Published As

Publication number Publication date
JPH0141250B2 (enrdf_load_stackoverflow) 1989-09-04

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