JPH01321166A - Dressing device - Google Patents
Dressing deviceInfo
- Publication number
- JPH01321166A JPH01321166A JP15048988A JP15048988A JPH01321166A JP H01321166 A JPH01321166 A JP H01321166A JP 15048988 A JP15048988 A JP 15048988A JP 15048988 A JP15048988 A JP 15048988A JP H01321166 A JPH01321166 A JP H01321166A
- Authority
- JP
- Japan
- Prior art keywords
- dressing
- grind
- stone
- grinding wheel
- grindstone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000008151 electrolyte solution Substances 0.000 claims abstract description 22
- 239000011159 matrix material Substances 0.000 claims abstract description 15
- 230000005684 electric field Effects 0.000 claims abstract description 6
- 238000005260 corrosion Methods 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 230000007797 corrosion Effects 0.000 claims description 4
- 239000000243 solution Substances 0.000 claims description 4
- 239000004575 stone Substances 0.000 abstract 10
- 230000001276 controlling effect Effects 0.000 abstract 1
- 238000005868 electrolysis reaction Methods 0.000 abstract 1
- 239000003792 electrolyte Substances 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 9
- 229910003460 diamond Inorganic materials 0.000 description 8
- 239000010432 diamond Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 238000003754 machining Methods 0.000 description 4
- 239000006061 abrasive grain Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 238000009760 electrical discharge machining Methods 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000006056 electrooxidation reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/001—Devices or means for dressing or conditioning abrasive surfaces involving the use of electric current
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
この発明は、研削加工に用いられる砥石のドレッシング
（目立て）に間するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to the dressing of a grindstone used for grinding.
［従来の技術］
第２図は例えば精密工学会ＣＰ分科会編、ファインセラ
ミックス材料、部品の精密加工技術第１編に示されてい
るダイヤモンドドレッサによる砥石のドレッシング方法
を示す説明図であり、図において、（１）は砥石部（マ
トリックス）、（２）は砥石部（１）に保持さ゛れてい
る微粒、（３）はダイヤモンド部で、ダイヤモンドドレ
ッサ（４）に保持されており、ダイヤモンド部（３）で
砥石部（１）をひっかき、砥粒（２）を表面に露出させ
る。また第３図は例えば、第２図と同じ資料から出典し
た放電加工（ＥＤＭ）により砥石のドレッシングを行う
方法を示す説明図で、放電現象による砥石マトリックス
の除去方法を示している０図において、（５）は放電電
極、（６）は放電加工用電源である。[Prior Art] Fig. 2 is an explanatory diagram showing a method of dressing a grinding wheel using a diamond dresser, as shown in, for example, Precision Processing Technology for Fine Ceramic Materials and Parts, Volume 1, edited by the CP Subcommittee of the Japan Society for Precision Engineering. , (1) is the grinding wheel part (matrix), (2) is the fine grain held in the grinding wheel part (1), and (3) is the diamond part, which is held in the diamond dresser (4), and the diamond part ( 3) scratch the grindstone part (1) to expose the abrasive grains (2) on the surface. For example, Fig. 3 is an explanatory diagram showing a method of dressing a grinding wheel by electric discharge machining (EDM) taken from the same material as Fig. 2. (5) is a discharge electrode, and (6) is a power source for electric discharge machining.
次に動作について説明する。第２図に示す方法では、ダ
イヤモンドドレッサ（４）の先端のダイヤモンド部（３
）が砥石部（１）に強制的に押しつけられ、その時の物
理的力の作用により砥石のマトリクス（１）を破壊し砥
石の砥粒（２）を砥石表面に露出させる。Next, the operation will be explained. In the method shown in Fig. 2, the diamond part (3) at the tip of the diamond dresser (4)
) is forcibly pressed against the grinding wheel part (1), and the physical force at that time destroys the matrix (1) of the grinding wheel and exposes the abrasive grains (2) of the grinding wheel on the surface of the grinding wheel.
第３図の場合は、放電エネルギーにより砥石のマトリッ
クス（１）を破壊し、砥粒（２）を砥石の表面に露出さ
せる。In the case of FIG. 3, the matrix (1) of the grindstone is destroyed by discharge energy, and the abrasive grains (2) are exposed on the surface of the grindstone.
［発明が解決しようとする課題］
第２図に示した従来法におけるダイヤモンドドレッサに
よる砥石のドレッシングでは、強制切込みによる砥石マ
トリックス（１）の破壊を行うため、砥石部（１）の表
面に加工変質層を残し、砥石部（１）の表面の強度が劣
化する。またシングルポイント（点）で加工が行われる
ので能率が悪いという問題点がある。[Problems to be Solved by the Invention] In the conventional method of dressing a grindstone using a diamond dresser shown in Fig. 2, the grindstone matrix (1) is destroyed by forced cutting, which causes processing alteration on the surface of the grindstone part (1). A layer remains and the strength of the surface of the grinding wheel (1) deteriorates. Furthermore, since processing is performed at a single point, there is a problem that efficiency is low.
また第３図に示した従来法における放電加工による砥石
のドレッシング方法では第２図における方法の場合のよ
うな砥石表面の劣化などの問題点は解決されているが、
装置が非常に大がかりなものとなる。また放電加工液と
して研削液を流用する為、その比抵抗の不安定さに起因
する放電条件の決定の困難さが問題となる。Furthermore, although the conventional grindstone dressing method using electric discharge machining shown in Fig. 3 solves problems such as deterioration of the grindstone surface as in the case of the method shown in Fig. 2,
The device becomes very large-scale. Furthermore, since the grinding fluid is used as the electrical discharge machining fluid, there is a problem in that it is difficult to determine the electrical discharge conditions due to the instability of the specific resistance.
さらに第２図および第３図に示した従来の方法では、両
者とも三次元形状を有する総形砥石のドレッシングには
、点で加工することから不向きであるという問題点があ
った。Furthermore, the conventional methods shown in FIGS. 2 and 3 have the problem that they are unsuitable for dressing a full-form grindstone having a three-dimensional shape because they are processed at points.
この発明は上記のような問題点を解決するためになされ
たもので、砥石部の形状にかかわらず、砥石部全体にわ
たり均一にドレッシングできるとともに、ドレッシング
量および速度の制御、さらにはドレッシング状態をも制
御できるドレッシング装置を得ることを目的とする。This invention was made to solve the above-mentioned problems, and it is possible to uniformly dress the entire grinding wheel regardless of the shape of the grinding wheel, control the amount and speed of dressing, and even control the dressing state. The purpose is to obtain a dressing device that can be controlled.
［課題を解決するための手段］
この発明のドレッシング装置は、導電性を有する砥石の
マトリックスを選択的に化学反応により腐食し得る電解
質溶液を貯めた電解質溶液槽、この溶液槽に浸漬した上
記砥石に電界を印加して上記砥石のマトリックスを選択
的に電解により腐食除去してドレッシングする電源を備
え、上記電解質溶液の選択及び上記電源の出力調整によ
り、上記砥石のドレッシング量、ドレッシング速度及び
ドレッシング状態を制御するようにしたものである。[Means for Solving the Problems] The dressing device of the present invention includes an electrolyte solution tank storing an electrolyte solution that can selectively corrode the matrix of a conductive grindstone by a chemical reaction, and the above-mentioned grindstone immersed in the solution tank. A power source is provided for selectively electrolytically removing and dressing the matrix of the grinding wheel by applying an electric field to the area, and by selecting the electrolyte solution and adjusting the output of the power source, the amount of dressing, dressing speed, and dressing state of the grinding wheel can be adjusted. It is designed to control.
［作用］
この発明におけるドレッシング装置は、電気エネルギと
化学反応エネルギにより材料の除去作用（エツチング）
が行われる。[Function] The dressing device of the present invention performs a material removal action (etching) using electrical energy and chemical reaction energy.
will be held.
［実施例］
以下、この発明の一実施例を図について説明する。第１
図はこの発明の一実施例のドレッシング装置を示す構成
図で、図において、（７）は直流電源であり、陽極（８
）および陰極（９）に電圧をかけるとともに 電流値を
制御する。（ｌＯ）は導電性を、有する砥石、（１１）
は砥石のマトリックスを選択的に腐食するのに適した電
解質溶液（腐食液）であり、（１２）は電解質溶液（１
１）を貯めた電解質溶液槽（腐食液槽）、（１３）は砥
石（１０）の砥石軸、（１４）は砥石（ｌＯ）の砥石部
である。[Example] Hereinafter, an example of the present invention will be described with reference to the drawings. 1st
The figure is a configuration diagram showing a dressing device according to an embodiment of the present invention. In the figure, (7) is a DC power supply, and the anode (8
) and the cathode (9) and control the current value. (lO) is a grindstone with conductivity, (11)
is an electrolyte solution (corrosion liquid) suitable for selectively corroding the matrix of the grinding wheel, and (12) is an electrolyte solution (12) suitable for selectively corroding the matrix of the grinding wheel.
1) is the electrolyte solution bath (corrosive liquid bath), (13) is the grinding wheel shaft of the grinding wheel (10), and (14) is the grinding wheel part of the grinding wheel (10).
この構成のドレッシング装置における砥石のドレッシン
グ方法は、導電性を有する砥石（１０）に対して電気化
学的腐食法を適用するものである。まず、砥石（１０）
を陽極（８）に接続し、電解質溶液槽（１２）に予め選
択、貯えられた、砥石マトリックスを選択的に腐食する
適当な電解質溶液＜ｒｔｘ食液）（１１）に砥石部（１
４）全体を浸漬し、砥石（１０）に電界を印加するとと
もに回転させながらドレッシングをする。The dressing method of the grindstone in the dressing device having this configuration is to apply an electrochemical corrosion method to the grindstone (10) having conductivity. First, the whetstone (10)
is connected to the anode (8), and a suitable electrolyte solution (RTX food solution) (11) that selectively corrodes the grinding wheel matrix, selected and stored in advance in the electrolyte solution tank (12), is applied to the grinding wheel part (1).
4) The whole is immersed, an electric field is applied to the grindstone (10), and the grindstone (10) is rotated for dressing.
なお、砥石軸（１３）の腐食を防ぐために、砥石軸（１
３）に耐腐食剤コーティング等を施しておくと良い。ま
た、腐食後、砥石部（１４）及び砥石軸（１３）に付着
した腐食液を中和しておけば、砥石（１０）を使用する
工作機械への悪影響を防ぐことができる。In addition, in order to prevent corrosion of the grinding wheel shaft (13),
It is a good idea to apply an anti-corrosion coating to 3). Moreover, if the corrosive liquid adhering to the grindstone portion (14) and the grindstone shaft (13) is neutralized after corrosion, an adverse effect on the machine tool using the grindstone (10) can be prevented.
この発明のドレッシング装置によれば、砥石全体を電解
質溶液に浸漬し、例えば砥石を回転しながら電解エツチ
ングを行うため、砥石全体にわたり均一なドレッシング
が可能となる。また、いわゆる総形砥石と呼ばれる複雑
な形状を有する砥石のドレッシングに有効である。According to the dressing device of the present invention, the entire grindstone is immersed in an electrolyte solution and, for example, electrolytic etching is performed while rotating the grindstone, so that uniform dressing can be performed over the entire grindstone. Further, it is effective for dressing a so-called full-form grindstone, which has a complex shape.
また、導電性を有する砥石であれば、電解質溶液の適当
な選択により、はとんどの砥石のドレッシングに有効で
ある。Furthermore, if the grindstone is electrically conductive, it is effective for dressing most grindstones by appropriately selecting an electrolyte solution.
さらに、電流値の調整、電解質溶液の適当な選択によっ
て、多様な形態のエツチングが可能である。即ち、ドレ
ッシング量及びドレッシング速度の制御、またドレッシ
ング状態の制御が可能である。Furthermore, various types of etching are possible by adjusting the current value and selecting an appropriate electrolyte solution. That is, it is possible to control the dressing amount and dressing speed, as well as the dressing state.
さらにまた、物理的（＋１械的）な力を砥石に加えるこ
となくドレッシングができるので、砥石表層部の加工変
質等による砥石の強度劣化等がなくなる。Furthermore, since dressing can be performed without applying physical (+1 mechanical) force to the grindstone, deterioration in the strength of the grindstone due to processing deterioration of the surface layer of the grindstone, etc. is eliminated.
［発明の効果］
以とのように、この発明によれば、導電性を有する砥石
のマトリックスを選択的に化学反応により腐食し得る電
解質溶液を貯めた電解質溶液槽、この溶液槽に浸漬した
上記砥石に電界を印加して１記砥石のマトリックスを選
択的に電解により腐食除去してドレッシングする電源を
備え、上記電解質溶液の選択及び上記電源の出力調整に
より、上記砥石のドレッシング量、ドレッシング速度及
びドレッシング状態を制御するようにしたので、砥石部
の形状にかかわらず、砥石部全体にわたり均一にドレッ
シングできるとともに、ドレッシング量および速度の制
御、さらにはドレッシング状態をも制御できるドレッシ
ング装置が得られる効果がある。[Effects of the Invention] As described below, according to the present invention, there is provided an electrolyte solution bath containing an electrolyte solution that can selectively corrode the matrix of a conductive grindstone by a chemical reaction, and an electrolyte solution bath that is immersed in the solution bath. It is equipped with a power source that applies an electric field to the grindstone to selectively electrolytically remove and dress the matrix of the grindstone, and by selecting the electrolyte solution and adjusting the output of the power source, the dressing amount, dressing speed, and Since the dressing state is controlled, it is possible to uniformly dress the entire grinding wheel regardless of the shape of the grinding wheel, and the dressing device can also control the amount and speed of dressing as well as the dressing state. be.
第１図はこの発明の一実施例によるドレッシング装置を
示す構成図、第２図は従来のダイヤモンドドレッサによ
る砥石のドレッシング方法を示す説明図、第３図は従来
の放電加工によるドレッシング方法を示す説明図である
。
図において、（７）は電源、（１０）は導電性を有する
砥石、（１１）は電解質溶液、（１２）は電解質溶液槽
である。
なお、各図中、同一符号は同一または相当部分を示す。FIG. 1 is a configuration diagram showing a dressing device according to an embodiment of the present invention, FIG. 2 is an explanatory diagram showing a dressing method of a grindstone using a conventional diamond dresser, and FIG. 3 is an explanatory diagram showing a dressing method using a conventional electric discharge machining. It is a diagram. In the figure, (7) is a power source, (10) is a conductive grindstone, (11) is an electrolyte solution, and (12) is an electrolyte solution tank. In each figure, the same reference numerals indicate the same or corresponding parts.
Claims (1)
により腐食し得る電解質溶液を貯めた電解質溶液槽、こ
の溶液槽に浸漬した上記砥石に電界を印加して上記砥石
のマトリックスを選択的に電解により腐食除去してドレ
ッシングする電源を備え、上記電解質溶液の選択及び上
記電源の出力調整により、上記砥石のドレッシング量、
ドレッシング速度及びドレッシング状態を制御するよう
にしたドレッシング装置。An electrolyte solution tank containing an electrolyte solution that can selectively corrode the matrix of the grinding wheel with conductivity through a chemical reaction, and applying an electric field to the grinding wheel immersed in this solution tank to selectively electrolytically corrode the matrix of the grinding wheel. Equipped with a power source for removing corrosion and dressing, the amount of dressing of the grinding wheel can be adjusted by selecting the electrolyte solution and adjusting the output of the power source.
A dressing device that controls dressing speed and dressing status.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15048988A JPH01321166A (en) | 1988-06-17 | 1988-06-17 | Dressing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15048988A JPH01321166A (en) | 1988-06-17 | 1988-06-17 | Dressing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01321166A true JPH01321166A (en) | 1989-12-27 |
Family
ID=15497989
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15048988A Pending JPH01321166A (en) | 1988-06-17 | 1988-06-17 | Dressing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01321166A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004114172A (en) * | 2002-09-24 | 2004-04-15 | Matsushita Electric Ind Co Ltd | Method and apparatus of electric discharge truing |
-
1988
- 1988-06-17 JP JP15048988A patent/JPH01321166A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004114172A (en) * | 2002-09-24 | 2004-04-15 | Matsushita Electric Ind Co Ltd | Method and apparatus of electric discharge truing |
| JP4613471B2 (en) * | 2002-09-24 | 2011-01-19 | パナソニック株式会社 | Discharge truing method |
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