JPH01295215A - 照明装置 - Google Patents

照明装置

Info

Publication number
JPH01295215A
JPH01295215A JP1087787A JP8778789A JPH01295215A JP H01295215 A JPH01295215 A JP H01295215A JP 1087787 A JP1087787 A JP 1087787A JP 8778789 A JP8778789 A JP 8778789A JP H01295215 A JPH01295215 A JP H01295215A
Authority
JP
Japan
Prior art keywords
light source
reflecting member
light
incident
images
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1087787A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0375846B2 (OSRAM
Inventor
Masato Shibuya
眞人 渋谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP1087787A priority Critical patent/JPH01295215A/ja
Publication of JPH01295215A publication Critical patent/JPH01295215A/ja
Publication of JPH0375846B2 publication Critical patent/JPH0375846B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Projection-Type Copiers In General (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Lenses (AREA)
JP1087787A 1989-04-06 1989-04-06 照明装置 Granted JPH01295215A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1087787A JPH01295215A (ja) 1989-04-06 1989-04-06 照明装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1087787A JPH01295215A (ja) 1989-04-06 1989-04-06 照明装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP58100689A Division JPS59226317A (ja) 1983-06-06 1983-06-06 照明装置

Publications (2)

Publication Number Publication Date
JPH01295215A true JPH01295215A (ja) 1989-11-28
JPH0375846B2 JPH0375846B2 (OSRAM) 1991-12-03

Family

ID=13924697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1087787A Granted JPH01295215A (ja) 1989-04-06 1989-04-06 照明装置

Country Status (1)

Country Link
JP (1) JPH01295215A (OSRAM)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6285855B1 (en) 1997-03-24 2001-09-04 Canon Kabushiki Kaisha Illumination system and exposure apparatus having the same
US6377336B1 (en) 1991-09-11 2002-04-23 Nikon Corporation Projection exposure apparatus
US6392742B1 (en) 1999-06-01 2002-05-21 Canon Kabushiki Kaisha Illumination system and projection exposure apparatus
US6636293B1 (en) 1990-08-21 2003-10-21 Nikon Corporation Exposure method and apparatus having a decreased light intensity distribution
US6665050B2 (en) 1990-11-15 2003-12-16 Nikon Corporation Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis
US6710855B2 (en) 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US6885433B2 (en) 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
US6897942B2 (en) 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method
US7649676B2 (en) 2006-06-14 2010-01-19 Asml Netherlands B.V. System and method to form unpolarized light
US7656504B1 (en) 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US7728954B2 (en) 2006-06-06 2010-06-01 Asml Netherlands B.V. Reflective loop system producing incoherent radiation
US7948606B2 (en) 2006-04-13 2011-05-24 Asml Netherlands B.V. Moving beam with respect to diffractive optics in order to reduce interference patterns

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3693515A (en) * 1971-04-30 1972-09-26 Vari Typer Corp Optical reflector system
JPS56160040A (en) * 1980-05-14 1981-12-09 Canon Inc Printing device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3693515A (en) * 1971-04-30 1972-09-26 Vari Typer Corp Optical reflector system
JPS56160040A (en) * 1980-05-14 1981-12-09 Canon Inc Printing device

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6636293B1 (en) 1990-08-21 2003-10-21 Nikon Corporation Exposure method and apparatus having a decreased light intensity distribution
US7656504B1 (en) 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US6710855B2 (en) 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method
US6897942B2 (en) 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6665050B2 (en) 1990-11-15 2003-12-16 Nikon Corporation Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis
US6704092B2 (en) 1990-11-15 2004-03-09 Nikon Corporation Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane
US6885433B2 (en) 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
US6864959B2 (en) 1991-09-11 2005-03-08 Nikon Corporation Projection exposure apparatus
US6710854B2 (en) 1991-09-11 2004-03-23 Nikon Corporation Projection exposure apparatus
US6392740B1 (en) 1991-09-11 2002-05-21 Nikon Corporation Projection exposure apparatus
US6377336B1 (en) 1991-09-11 2002-04-23 Nikon Corporation Projection exposure apparatus
US6285855B1 (en) 1997-03-24 2001-09-04 Canon Kabushiki Kaisha Illumination system and exposure apparatus having the same
US6392742B1 (en) 1999-06-01 2002-05-21 Canon Kabushiki Kaisha Illumination system and projection exposure apparatus
US7948606B2 (en) 2006-04-13 2011-05-24 Asml Netherlands B.V. Moving beam with respect to diffractive optics in order to reduce interference patterns
US7728954B2 (en) 2006-06-06 2010-06-01 Asml Netherlands B.V. Reflective loop system producing incoherent radiation
US7649676B2 (en) 2006-06-14 2010-01-19 Asml Netherlands B.V. System and method to form unpolarized light

Also Published As

Publication number Publication date
JPH0375846B2 (OSRAM) 1991-12-03

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