JPH01287299A - 全面メッキ装置 - Google Patents

全面メッキ装置

Info

Publication number
JPH01287299A
JPH01287299A JP11783788A JP11783788A JPH01287299A JP H01287299 A JPH01287299 A JP H01287299A JP 11783788 A JP11783788 A JP 11783788A JP 11783788 A JP11783788 A JP 11783788A JP H01287299 A JPH01287299 A JP H01287299A
Authority
JP
Japan
Prior art keywords
plating
plated
anode
sides
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11783788A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0413439B2 (en, 2012
Inventor
Tetsuya Hojo
徹也 北城
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP11783788A priority Critical patent/JPH01287299A/ja
Publication of JPH01287299A publication Critical patent/JPH01287299A/ja
Publication of JPH0413439B2 publication Critical patent/JPH0413439B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06Suspending or supporting devices for articles to be coated
    • C25D17/08Supporting racks, i.e. not for suspending

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
JP11783788A 1988-05-13 1988-05-13 全面メッキ装置 Granted JPH01287299A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11783788A JPH01287299A (ja) 1988-05-13 1988-05-13 全面メッキ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11783788A JPH01287299A (ja) 1988-05-13 1988-05-13 全面メッキ装置

Publications (2)

Publication Number Publication Date
JPH01287299A true JPH01287299A (ja) 1989-11-17
JPH0413439B2 JPH0413439B2 (en, 2012) 1992-03-09

Family

ID=14721483

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11783788A Granted JPH01287299A (ja) 1988-05-13 1988-05-13 全面メッキ装置

Country Status (1)

Country Link
JP (1) JPH01287299A (en, 2012)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03277796A (ja) * 1990-03-27 1991-12-09 Fuji Plant Kogyo Kk 短尺板状被メッキ物への全面メッキ方法、装置および保持治具
JP2007107063A (ja) * 2005-10-14 2007-04-26 Taiyo Manufacturing Co Ltd 表面処理装置及び表面処理方法
KR100956685B1 (ko) * 2007-11-14 2010-05-10 삼성전기주식회사 도금장치
KR101357034B1 (ko) * 2010-08-25 2014-02-03 아루멕쿠스 피이 가부시키가이샤 표면처리장치

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03277796A (ja) * 1990-03-27 1991-12-09 Fuji Plant Kogyo Kk 短尺板状被メッキ物への全面メッキ方法、装置および保持治具
JP2007107063A (ja) * 2005-10-14 2007-04-26 Taiyo Manufacturing Co Ltd 表面処理装置及び表面処理方法
KR100956685B1 (ko) * 2007-11-14 2010-05-10 삼성전기주식회사 도금장치
KR101357034B1 (ko) * 2010-08-25 2014-02-03 아루멕쿠스 피이 가부시키가이샤 표면처리장치

Also Published As

Publication number Publication date
JPH0413439B2 (en, 2012) 1992-03-09

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