JPH0128686Y2 - - Google Patents
Info
- Publication number
- JPH0128686Y2 JPH0128686Y2 JP13917083U JP13917083U JPH0128686Y2 JP H0128686 Y2 JPH0128686 Y2 JP H0128686Y2 JP 13917083 U JP13917083 U JP 13917083U JP 13917083 U JP13917083 U JP 13917083U JP H0128686 Y2 JPH0128686 Y2 JP H0128686Y2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- attached
- sample
- bellows
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
Landscapes
- Vibration Prevention Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13917083U JPS6048233U (ja) | 1983-09-09 | 1983-09-09 | 真空容器用移動台 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13917083U JPS6048233U (ja) | 1983-09-09 | 1983-09-09 | 真空容器用移動台 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6048233U JPS6048233U (ja) | 1985-04-04 |
JPH0128686Y2 true JPH0128686Y2 (enrdf_load_stackoverflow) | 1989-08-31 |
Family
ID=30312021
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13917083U Granted JPS6048233U (ja) | 1983-09-09 | 1983-09-09 | 真空容器用移動台 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6048233U (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004160882A (ja) * | 2002-11-14 | 2004-06-10 | Takara Seisakusho:Kk | 樹脂封止装置 |
JP4879833B2 (ja) * | 2007-07-30 | 2012-02-22 | 株式会社ダイヘン | 搬送装置 |
JP5649211B2 (ja) * | 2010-10-19 | 2015-01-07 | 独立行政法人産業技術総合研究所 | 成膜装置 |
JP7228612B2 (ja) | 2020-03-27 | 2023-02-24 | 株式会社Kokusai Electric | 基板処理装置、半導体装置の製造方法、基板処理方法及びプログラム |
-
1983
- 1983-09-09 JP JP13917083U patent/JPS6048233U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6048233U (ja) | 1985-04-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5953105A (en) | Positioning device with a reference frame for a measuring system, and a lithographic device provided with such a positioning device | |
JP3524107B2 (ja) | 力が補償されるマシンフレームを有する光リソグラフ装置 | |
US6388733B1 (en) | Exposure apparatus with an anti-vibration structure | |
JPH0737771A (ja) | 支持装置 | |
JPH0128686Y2 (enrdf_load_stackoverflow) | ||
US6529260B2 (en) | Lifting support assembly for an exposure apparatus | |
JPH11150062A (ja) | 除振装置及び露光装置並びに除振台の除振方法 | |
US20080013058A1 (en) | Pneumatic Spring Apparatus, Vibration-Proof Apparatus, Stage Apparatus and Exposure Apparatus | |
KR100986165B1 (ko) | 노광 장치 및 디바이스 제조방법 | |
JP2003318080A (ja) | 電子ビーム描画装置 | |
JP2001523843A (ja) | マイクロリソグラフィにおける基板を平坦に保持する装置および方法 | |
JPS62120026A (ja) | X線露光装置 | |
JP4123558B2 (ja) | 露光装置 | |
JP2005308145A (ja) | 防振装置及び露光装置 | |
JPWO2008093617A1 (ja) | ステージ装置および露光装置 | |
JPS5823740B2 (ja) | 電子ビ−ム露光方法 | |
JPWO2005085671A1 (ja) | 防振装置、露光装置、及び防振方法 | |
JPH0628776Y2 (ja) | 試料ステージ | |
JP2005026264A (ja) | 露光装置 | |
JP4287781B2 (ja) | 測定システム用基準フレームを有する位置決め装置 | |
KR100434618B1 (ko) | 측정시스템용기준프레임을가진위치설정장치 | |
JP2006070928A (ja) | 防振装置の制御方法及び露光方法 | |
JP4186945B2 (ja) | 露光装置 | |
CN1050204C (zh) | 微米、亚微米电子束曝光机工作台的吊装系统 | |
GB2333606A (en) | Exposure apparatus for printing a pattern from a mask on a substrate |