JPH0127574B2 - - Google Patents
Info
- Publication number
- JPH0127574B2 JPH0127574B2 JP59132700A JP13270084A JPH0127574B2 JP H0127574 B2 JPH0127574 B2 JP H0127574B2 JP 59132700 A JP59132700 A JP 59132700A JP 13270084 A JP13270084 A JP 13270084A JP H0127574 B2 JPH0127574 B2 JP H0127574B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- film
- treatment liquid
- silicon oxide
- silicon substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P14/60—
Landscapes
- Silicon Compounds (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59132700A JPS6112034A (ja) | 1984-06-27 | 1984-06-27 | シリコン基材表面に酸化珪素被膜を形成させる方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59132700A JPS6112034A (ja) | 1984-06-27 | 1984-06-27 | シリコン基材表面に酸化珪素被膜を形成させる方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6112034A JPS6112034A (ja) | 1986-01-20 |
| JPH0127574B2 true JPH0127574B2 (enExample) | 1989-05-30 |
Family
ID=15087506
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59132700A Granted JPS6112034A (ja) | 1984-06-27 | 1984-06-27 | シリコン基材表面に酸化珪素被膜を形成させる方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6112034A (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5278104A (en) * | 1989-07-25 | 1994-01-11 | Kabushiki Kaisha Toshiba | Semiconductor wafer carrier having a dust cover |
| JP2515042B2 (ja) * | 1990-07-05 | 1996-07-10 | 株式会社東芝 | Ｅ▲上２▼ｐｒｏｍ装置 |
| JPH05259154A (ja) * | 1992-03-04 | 1993-10-08 | Nec Corp | 半導体装置の製造方法 |
| JP2600600B2 (ja) * | 1993-12-21 | 1997-04-16 | 日本電気株式会社 | 研磨剤とその製法及びそれを用いた半導体装置の製造方法 |
| JP4753080B2 (ja) * | 2005-12-21 | 2011-08-17 | 独立行政法人産業技術総合研究所 | レーザ加工用シリカガラス |
| CN113321216B (zh) * | 2021-06-22 | 2023-09-22 | 中国地质科学院郑州矿产综合利用研究所 | 一种利用石英脉型钨废石制备高纯石英的方法 |
-
1984
- 1984-06-27 JP JP59132700A patent/JPS6112034A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6112034A (ja) | 1986-01-20 |
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