JPH0126186B2 - - Google Patents
Info
- Publication number
- JPH0126186B2 JPH0126186B2 JP56135155A JP13515581A JPH0126186B2 JP H0126186 B2 JPH0126186 B2 JP H0126186B2 JP 56135155 A JP56135155 A JP 56135155A JP 13515581 A JP13515581 A JP 13515581A JP H0126186 B2 JPH0126186 B2 JP H0126186B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- base
- emitter
- electrode
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56135155A JPS5835971A (ja) | 1981-08-28 | 1981-08-28 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56135155A JPS5835971A (ja) | 1981-08-28 | 1981-08-28 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5835971A JPS5835971A (ja) | 1983-03-02 |
JPH0126186B2 true JPH0126186B2 (en, 2012) | 1989-05-22 |
Family
ID=15145095
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56135155A Granted JPS5835971A (ja) | 1981-08-28 | 1981-08-28 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5835971A (en, 2012) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6076166A (ja) * | 1983-10-03 | 1985-04-30 | Rohm Co Ltd | 半導体装置およびその製造方法 |
JPS60160164A (ja) * | 1983-10-15 | 1985-08-21 | Rohm Co Ltd | 半導体装置およびその製造方法 |
JPS61117870A (ja) * | 1984-11-14 | 1986-06-05 | Oki Electric Ind Co Ltd | 半導体集積回路装置の製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6035818B2 (ja) * | 1976-09-22 | 1985-08-16 | 日本電気株式会社 | 半導体装置の製造方法 |
JPS5942987B2 (ja) * | 1978-09-26 | 1984-10-18 | 沖電気工業株式会社 | 半導体装置の製造方法 |
DE2946963A1 (de) * | 1979-11-21 | 1981-06-04 | Siemens AG, 1000 Berlin und 8000 München | Schnelle bipolare transistoren |
-
1981
- 1981-08-28 JP JP56135155A patent/JPS5835971A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5835971A (ja) | 1983-03-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0139371B1 (en) | Process for manufacturing a mos integrated circuit employing a method of forming refractory metal silicide areas | |
CA1050667A (en) | Method of manufacturing semiconductor devices | |
JPS5928992B2 (ja) | Mosトランジスタおよびその製造方法 | |
JPH0640582B2 (ja) | 絶縁ゲ−ト電界効果トランジスタの製造方法 | |
JPH0628266B2 (ja) | 半導体装置の製造方法 | |
EP0033495B1 (en) | Process for fabricating a high speed bipolar transistor | |
JPS62203380A (ja) | 半導体素子の製造方法 | |
JPS60149150A (ja) | 集積回路及びその製造方法 | |
EP0076106A2 (en) | Method for producing a bipolar transistor | |
JPS6133253B2 (en, 2012) | ||
JPH0126186B2 (en, 2012) | ||
JPH0581051B2 (en, 2012) | ||
JPH0243336B2 (en, 2012) | ||
JPH0648690B2 (ja) | 半導体装置の製造方法 | |
JPS6155250B2 (en, 2012) | ||
JP2707536B2 (ja) | 半導体装置の製造方法 | |
JP3173048B2 (ja) | 半導体装置 | |
TW432673B (en) | Using single polysilicon process to fabricate low junction capacitance bipolar junction transistor | |
JP2685448B2 (ja) | 半導体装置の製造方法 | |
JPH0239091B2 (en, 2012) | ||
JP2557840B2 (ja) | 半導体装置の製造法 | |
JPH0155585B2 (en, 2012) | ||
JPH0778833A (ja) | バイポーラトランジスタとその製造方法 | |
JP2792094B2 (ja) | 半導体装置の製造方法 | |
JPH0126185B2 (en, 2012) |