JPH0124297B2 - - Google Patents

Info

Publication number
JPH0124297B2
JPH0124297B2 JP10647780A JP10647780A JPH0124297B2 JP H0124297 B2 JPH0124297 B2 JP H0124297B2 JP 10647780 A JP10647780 A JP 10647780A JP 10647780 A JP10647780 A JP 10647780A JP H0124297 B2 JPH0124297 B2 JP H0124297B2
Authority
JP
Japan
Prior art keywords
cover
mask
cassette
projection
covers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10647780A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5624335A (en
Inventor
Watokin Seodoa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Publication of JPS5624335A publication Critical patent/JPS5624335A/ja
Publication of JPH0124297B2 publication Critical patent/JPH0124297B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B23/00—Devices for changing pictures in viewing apparatus or projectors
    • G03B23/14—Carriers operable to move pictures into, and out of, the projection or viewing position and carrying one or two pictures only in a removable manner also other devices not provided with a stock, e.g. chutes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection Apparatus (AREA)
  • Projection-Type Copiers In General (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP10647780A 1979-08-03 1980-08-04 Cassette for protecting projecting mask used for projector and method and device for inserting and discharging same cassette into and from projector Granted JPS5624335A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/063,494 US4248508A (en) 1979-08-03 1979-08-03 Projection mask storage and carrier system

Publications (2)

Publication Number Publication Date
JPS5624335A JPS5624335A (en) 1981-03-07
JPH0124297B2 true JPH0124297B2 (enExample) 1989-05-11

Family

ID=22049589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10647780A Granted JPS5624335A (en) 1979-08-03 1980-08-04 Cassette for protecting projecting mask used for projector and method and device for inserting and discharging same cassette into and from projector

Country Status (3)

Country Link
US (1) US4248508A (enExample)
JP (1) JPS5624335A (enExample)
DE (1) DE3025829A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4592081A (en) * 1984-02-10 1986-05-27 Varian Associates, Inc. Adaptive X-ray lithography mask
JPH07104596B2 (ja) * 1986-11-21 1995-11-13 キヤノン株式会社 原版収納カセツト
JPH01162378U (enExample) * 1988-04-28 1989-11-13
JP3347528B2 (ja) * 1995-05-23 2002-11-20 キヤノン株式会社 半導体製造装置
DE60219844T2 (de) * 2001-03-01 2008-01-17 Asml Netherlands B.V. Verfahren zur Übernahme einer lithographischen Maske
SG107133A1 (en) * 2002-02-22 2004-11-29 Asml Holding Nv System and method for using a two part cover for protecting a reticle
CN101650528B (zh) * 2002-02-22 2012-09-26 Asml控股股份有限公司 使用两件式盖子保护模版的系统和方法
US6906783B2 (en) * 2002-02-22 2005-06-14 Asml Holding N.V. System for using a two part cover for protecting a reticle
SG155813A1 (en) * 2003-03-06 2009-10-29 Asml Holding N V Nl System and method for using a two part cover for protecting a reticle
CN1297854C (zh) * 2003-04-15 2007-01-31 力晶半导体股份有限公司 光掩模传送方法
TWI288305B (en) 2003-10-27 2007-10-11 Asml Netherlands Bv Assembly of a reticle holder and a reticle

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4006980A (en) * 1974-12-16 1977-02-08 Bell & Howell Company Microfiche carrier
US3997256A (en) * 1974-12-16 1976-12-14 Bell & Howell Company Microfiche cartridge
US4053215A (en) * 1974-12-26 1977-10-11 Microform Data Systems, Inc. Film strip handling apparatus and method

Also Published As

Publication number Publication date
JPS5624335A (en) 1981-03-07
US4248508A (en) 1981-02-03
DE3025829A1 (de) 1981-02-19

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