SG107133A1 - System and method for using a two part cover for protecting a reticle - Google Patents

System and method for using a two part cover for protecting a reticle

Info

Publication number
SG107133A1
SG107133A1 SG200301191A SG200301191A SG107133A1 SG 107133 A1 SG107133 A1 SG 107133A1 SG 200301191 A SG200301191 A SG 200301191A SG 200301191 A SG200301191 A SG 200301191A SG 107133 A1 SG107133 A1 SG 107133A1
Authority
SG
Singapore
Prior art keywords
reticle
protecting
part cover
cover
Prior art date
Application number
SG200301191A
Inventor
Del Puerto Santiago
Massar Andrew
Alikhan Abdullah
H Feroce Jonathan
R Loopstar Eric
P Kish Duana
J Olson Woodrow
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Priority to SG200301191A priority Critical patent/SG107133A1/en
Publication of SG107133A1 publication Critical patent/SG107133A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
SG200301191A 2002-02-22 2003-03-06 System and method for using a two part cover for protecting a reticle SG107133A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SG200301191A SG107133A1 (en) 2002-02-22 2003-03-06 System and method for using a two part cover for protecting a reticle

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US35835402P 2002-02-22 2002-02-22
SG200301191A SG107133A1 (en) 2002-02-22 2003-03-06 System and method for using a two part cover for protecting a reticle

Publications (1)

Publication Number Publication Date
SG107133A1 true SG107133A1 (en) 2004-11-29

Family

ID=34635773

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200301191A SG107133A1 (en) 2002-02-22 2003-03-06 System and method for using a two part cover for protecting a reticle

Country Status (1)

Country Link
SG (1) SG107133A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4248508A (en) * 1979-08-03 1981-02-03 The Perkin-Elmer Corporation Projection mask storage and carrier system
US20020021781A1 (en) * 1996-05-17 2002-02-21 Keiko Chiba X-ray mask, and exposure method and apparatus using the same
EP1341042A2 (en) * 2002-02-22 2003-09-03 ASML Netherlands B.V. System and method for using a two part cover for protecting a reticle

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4248508A (en) * 1979-08-03 1981-02-03 The Perkin-Elmer Corporation Projection mask storage and carrier system
US20020021781A1 (en) * 1996-05-17 2002-02-21 Keiko Chiba X-ray mask, and exposure method and apparatus using the same
EP1341042A2 (en) * 2002-02-22 2003-09-03 ASML Netherlands B.V. System and method for using a two part cover for protecting a reticle

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