JPH01221847A - ガスフェーズイオン源における高圧導入部 - Google Patents

ガスフェーズイオン源における高圧導入部

Info

Publication number
JPH01221847A
JPH01221847A JP63045842A JP4584288A JPH01221847A JP H01221847 A JPH01221847 A JP H01221847A JP 63045842 A JP63045842 A JP 63045842A JP 4584288 A JP4584288 A JP 4584288A JP H01221847 A JPH01221847 A JP H01221847A
Authority
JP
Japan
Prior art keywords
emitter
ion source
voltage
switch
extraction electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63045842A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0559536B2 (en, 2012
Inventor
Ryuzo Aihara
相原　龍三
Yoshizo Sakuma
佐久間　美三
Tadayoshi Nagafune
忠義 長船
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP63045842A priority Critical patent/JPH01221847A/ja
Publication of JPH01221847A publication Critical patent/JPH01221847A/ja
Publication of JPH0559536B2 publication Critical patent/JPH0559536B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0807—Gas field ion sources [GFIS]

Landscapes

  • Electron Sources, Ion Sources (AREA)
JP63045842A 1988-03-01 1988-03-01 ガスフェーズイオン源における高圧導入部 Granted JPH01221847A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63045842A JPH01221847A (ja) 1988-03-01 1988-03-01 ガスフェーズイオン源における高圧導入部

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63045842A JPH01221847A (ja) 1988-03-01 1988-03-01 ガスフェーズイオン源における高圧導入部

Publications (2)

Publication Number Publication Date
JPH01221847A true JPH01221847A (ja) 1989-09-05
JPH0559536B2 JPH0559536B2 (en, 2012) 1993-08-31

Family

ID=12730474

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63045842A Granted JPH01221847A (ja) 1988-03-01 1988-03-01 ガスフェーズイオン源における高圧導入部

Country Status (1)

Country Link
JP (1) JPH01221847A (en, 2012)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009147894A1 (ja) * 2008-06-05 2009-12-10 株式会社日立ハイテクノロジーズ イオンビーム装置
US8115184B2 (en) 2008-01-07 2012-02-14 Hitachi High-Technologies Corporation Gas field ion source, charged particle microscope, and apparatus
JP2012142292A (ja) * 2005-12-02 2012-07-26 Arisu Corporation:Kk イオン源、システム及び方法
DE112010002774T5 (de) 2009-06-30 2012-10-18 Hitachi High-Technologies Corporation Ionenmikroskop
JP2014135291A (ja) * 2009-01-15 2014-07-24 Hitachi High-Technologies Corp イオンビーム装置
US9012867B2 (en) 2003-10-16 2015-04-21 Carl Zeiss Microscopy, Llc Ion sources, systems and methods

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07168750A (ja) * 1993-12-15 1995-07-04 Nec Corp 情報処理装置

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9012867B2 (en) 2003-10-16 2015-04-21 Carl Zeiss Microscopy, Llc Ion sources, systems and methods
US9236225B2 (en) 2003-10-16 2016-01-12 Carl Zeiss Microscopy, Llc Ion sources, systems and methods
JP2012142292A (ja) * 2005-12-02 2012-07-26 Arisu Corporation:Kk イオン源、システム及び方法
US8530865B2 (en) 2008-01-07 2013-09-10 Hitachi High-Technologies Corporation Gas field ion source, charged particle microscope, and apparatus
US8115184B2 (en) 2008-01-07 2012-02-14 Hitachi High-Technologies Corporation Gas field ion source, charged particle microscope, and apparatus
JP5097823B2 (ja) * 2008-06-05 2012-12-12 株式会社日立ハイテクノロジーズ イオンビーム装置
WO2009147894A1 (ja) * 2008-06-05 2009-12-10 株式会社日立ハイテクノロジーズ イオンビーム装置
US8779380B2 (en) 2008-06-05 2014-07-15 Hitachi High-Technologies Corporation Ion beam device
US9508521B2 (en) 2008-06-05 2016-11-29 Hitachi High-Technologies Corporation Ion beam device
JP2014135291A (ja) * 2009-01-15 2014-07-24 Hitachi High-Technologies Corp イオンビーム装置
US8455841B2 (en) 2009-06-30 2013-06-04 Hitachi High-Technologies Corporation Ion microscope
DE112010002774T5 (de) 2009-06-30 2012-10-18 Hitachi High-Technologies Corporation Ionenmikroskop
DE112010002774B4 (de) 2009-06-30 2019-12-05 Hitachi High-Technologies Corporation Ionenmikroskop

Also Published As

Publication number Publication date
JPH0559536B2 (en, 2012) 1993-08-31

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term