JPH0559536B2 - - Google Patents

Info

Publication number
JPH0559536B2
JPH0559536B2 JP63045842A JP4584288A JPH0559536B2 JP H0559536 B2 JPH0559536 B2 JP H0559536B2 JP 63045842 A JP63045842 A JP 63045842A JP 4584288 A JP4584288 A JP 4584288A JP H0559536 B2 JPH0559536 B2 JP H0559536B2
Authority
JP
Japan
Prior art keywords
emitter
ion source
switch
extraction electrode
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63045842A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01221847A (ja
Inventor
Ryuzo Aihara
Yoshizo Sakuma
Tadayoshi Nagafune
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP63045842A priority Critical patent/JPH01221847A/ja
Publication of JPH01221847A publication Critical patent/JPH01221847A/ja
Publication of JPH0559536B2 publication Critical patent/JPH0559536B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0807—Gas field ion sources [GFIS]

Landscapes

  • Electron Sources, Ion Sources (AREA)
JP63045842A 1988-03-01 1988-03-01 ガスフェーズイオン源における高圧導入部 Granted JPH01221847A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63045842A JPH01221847A (ja) 1988-03-01 1988-03-01 ガスフェーズイオン源における高圧導入部

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63045842A JPH01221847A (ja) 1988-03-01 1988-03-01 ガスフェーズイオン源における高圧導入部

Publications (2)

Publication Number Publication Date
JPH01221847A JPH01221847A (ja) 1989-09-05
JPH0559536B2 true JPH0559536B2 (en, 2012) 1993-08-31

Family

ID=12730474

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63045842A Granted JPH01221847A (ja) 1988-03-01 1988-03-01 ガスフェーズイオン源における高圧導入部

Country Status (1)

Country Link
JP (1) JPH01221847A (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07168750A (ja) * 1993-12-15 1995-07-04 Nec Corp 情報処理装置

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8110814B2 (en) 2003-10-16 2012-02-07 Alis Corporation Ion sources, systems and methods
WO2007067296A2 (en) * 2005-12-02 2007-06-14 Alis Corporation Ion sources, systems and methods
JP5086105B2 (ja) 2008-01-07 2012-11-28 株式会社日立ハイテクノロジーズ ガス電界電離イオン源
WO2009147894A1 (ja) * 2008-06-05 2009-12-10 株式会社日立ハイテクノロジーズ イオンビーム装置
JP5194133B2 (ja) * 2009-01-15 2013-05-08 株式会社日立ハイテクノロジーズ イオンビーム装置
JP5033844B2 (ja) 2009-06-30 2012-09-26 株式会社日立ハイテクノロジーズ イオン顕微鏡

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07168750A (ja) * 1993-12-15 1995-07-04 Nec Corp 情報処理装置

Also Published As

Publication number Publication date
JPH01221847A (ja) 1989-09-05

Similar Documents

Publication Publication Date Title
US4713585A (en) Ion source
US6060836A (en) Plasma generating apparatus and ion source using the same
JP3414398B2 (ja) イオンビームガン
US3839182A (en) Triode device for sputtering material by means of a low voltage discharge
JPH0559536B2 (en, 2012)
JP3017631B2 (ja) 低温処理装置の制御方法
EP0095311B1 (en) Ion source apparatus
JP3518320B2 (ja) イオン源およびそのフィラメント交換方法
Hackam et al. ac (50 Hz) and dc electrical breakdown of vacuum gaps and with variation of air pressure in the range 10− 9− 10− 2 Torr using OFHC copper, nickel, aluminum, and niobium parallel planar electrodes
US5164952A (en) Electrically pumped gas laser suitable for high input power
JP3454384B2 (ja) イオンビーム発生装置及び方法
CN112908818B (zh) 直流阴极中和器
JPH0746586B2 (ja) イオン源
US3973158A (en) Device comprising an ion source in which the ions are accelerated in a direction perpendicular to a magnetic field of high intensity
US3286021A (en) Cable terminal for use with electron gun apparatus
JPH0353403Y2 (en, 2012)
JPH0423372B2 (en, 2012)
US3446927A (en) Disk contacts and flat annular shield arrangement in gas filled switch
US3226542A (en) Mass spectrometer arc-type ion source having electrode cooling means
JP3349642B2 (ja) イオンビーム加工装置の点検方法
US2714165A (en) Isotope separating apparatus
JPS61225748A (ja) ガスフエ−ズイオン源
JPS6155848A (ja) 誘導結合プラズマをイオン源とした質量分析装置
GB953524A (en) Plasma switching electric discharge tube
JPS63216247A (ja) ガスフエ−ズイオン源

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term