JPH0118579B2 - - Google Patents

Info

Publication number
JPH0118579B2
JPH0118579B2 JP58108785A JP10878583A JPH0118579B2 JP H0118579 B2 JPH0118579 B2 JP H0118579B2 JP 58108785 A JP58108785 A JP 58108785A JP 10878583 A JP10878583 A JP 10878583A JP H0118579 B2 JPH0118579 B2 JP H0118579B2
Authority
JP
Japan
Prior art keywords
film
etching
resist
insulating film
insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58108785A
Other languages
English (en)
Japanese (ja)
Other versions
JPS601711A (ja
Inventor
Mitsuhisa Hatajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP10878583A priority Critical patent/JPS601711A/ja
Publication of JPS601711A publication Critical patent/JPS601711A/ja
Publication of JPH0118579B2 publication Critical patent/JPH0118579B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)
  • Weting (AREA)
JP10878583A 1983-06-17 1983-06-17 絶縁膜の形成方法 Granted JPS601711A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10878583A JPS601711A (ja) 1983-06-17 1983-06-17 絶縁膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10878583A JPS601711A (ja) 1983-06-17 1983-06-17 絶縁膜の形成方法

Publications (2)

Publication Number Publication Date
JPS601711A JPS601711A (ja) 1985-01-07
JPH0118579B2 true JPH0118579B2 (enrdf_load_stackoverflow) 1989-04-06

Family

ID=14493415

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10878583A Granted JPS601711A (ja) 1983-06-17 1983-06-17 絶縁膜の形成方法

Country Status (1)

Country Link
JP (1) JPS601711A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2625453B2 (ja) * 1987-12-09 1997-07-02 セントラル硝子 株式会社 パターン膜形成法
JP2001302227A (ja) * 2000-04-26 2001-10-31 Ube Nitto Kasei Co Ltd シリカ粒子の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57191219A (en) * 1981-05-20 1982-11-25 Tokyo Denshi Kagaku Kabushiki Formation of silica coating pattern

Also Published As

Publication number Publication date
JPS601711A (ja) 1985-01-07

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