JPH0117564B2 - - Google Patents

Info

Publication number
JPH0117564B2
JPH0117564B2 JP57001958A JP195882A JPH0117564B2 JP H0117564 B2 JPH0117564 B2 JP H0117564B2 JP 57001958 A JP57001958 A JP 57001958A JP 195882 A JP195882 A JP 195882A JP H0117564 B2 JPH0117564 B2 JP H0117564B2
Authority
JP
Japan
Prior art keywords
acid
resin
photosensitive
resorcinol
formaldehyde resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57001958A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58134631A (ja
Inventor
Masabumi Uehara
Atsuo Yamazaki
Kazuhiro Shimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP57001958A priority Critical patent/JPS58134631A/ja
Priority to EP83300055A priority patent/EP0083971B1/en
Priority to DE8383300055T priority patent/DE3370700D1/de
Priority to US06/456,442 priority patent/US4536465A/en
Publication of JPS58134631A publication Critical patent/JPS58134631A/ja
Publication of JPH0117564B2 publication Critical patent/JPH0117564B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP57001958A 1982-01-08 1982-01-08 感光性組成物 Granted JPS58134631A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP57001958A JPS58134631A (ja) 1982-01-08 1982-01-08 感光性組成物
EP83300055A EP0083971B1 (en) 1982-01-08 1983-01-06 Photosensitive composition
DE8383300055T DE3370700D1 (en) 1982-01-08 1983-01-06 Photosensitive composition
US06/456,442 US4536465A (en) 1982-01-08 1983-01-07 Positive-working photosensitive composition with o-quinone diazide and admixture of resins

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57001958A JPS58134631A (ja) 1982-01-08 1982-01-08 感光性組成物

Publications (2)

Publication Number Publication Date
JPS58134631A JPS58134631A (ja) 1983-08-10
JPH0117564B2 true JPH0117564B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-03-31

Family

ID=11516097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57001958A Granted JPS58134631A (ja) 1982-01-08 1982-01-08 感光性組成物

Country Status (4)

Country Link
US (1) US4536465A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0083971B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS58134631A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3370700D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59182444A (ja) * 1983-04-01 1984-10-17 Sumitomo Chem Co Ltd ポジ型フオトレジストの改良現像液
DE3344202A1 (de) * 1983-12-07 1985-06-20 Merck Patent Gmbh, 6100 Darmstadt Positiv-fotoresistzusammensetzungen
DE3421448A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende polymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
GB8430377D0 (en) * 1984-12-01 1985-01-09 Ciba Geigy Ag Modified phenolic resins
GB8505402D0 (en) * 1985-03-02 1985-04-03 Ciba Geigy Ag Modified phenolic resins
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
EP0662636A3 (en) * 1986-10-23 1995-11-22 Ciba Geigy Ag Imaging processes.
WO1988005928A1 (en) * 1987-02-02 1988-08-11 Nippon Paint Co., Ltd. Positive photosensitive resin composition and process for its production
NO891063L (no) * 1988-03-31 1989-10-02 Thiokol Morton Inc Novolakharpikser av blandede aldehyder og positive fotoresistmaterialer fremstilt fra slike harpikser.
US4920028A (en) * 1988-03-31 1990-04-24 Morton Thiokol, Inc. High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone
US4997734A (en) * 1988-08-02 1991-03-05 Morton International, Inc. Method of forming a thermally stable mixed aldehyde novolak resin containing resist pattern and that pattern on a substrate
US5130409A (en) * 1988-04-22 1992-07-14 Morton International, Inc. Mixed aldehyde novolak resins useful as high contrast high thermal stability positive photoresists
US5861229A (en) * 1988-07-07 1999-01-19 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
US5456995A (en) * 1988-07-07 1995-10-10 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition
DE69129955T2 (de) * 1990-05-02 1998-12-24 Mitsubishi Chemical Corp., Tokio/Tokyo Photolackzusammensetzung
JP2646289B2 (ja) * 1990-06-01 1997-08-27 富士写真フイルム株式会社 レジスト組成物
JP2720224B2 (ja) * 1990-06-15 1998-03-04 富士写真フイルム株式会社 感光性平版印刷版
US5372909A (en) * 1991-09-24 1994-12-13 Mitsubishi Kasei Corporation Photosensitive resin composition comprising an alkali-soluble resin made from a phenolic compound and at least 2 different aldehydes
US5306594A (en) * 1991-11-04 1994-04-26 Ocg Microelectronic Materials, Inc. Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol
GB9208653D0 (en) * 1992-04-22 1992-06-10 Unilever Plc Cosmetic composition and process for making it
JP3094652B2 (ja) * 1992-05-18 2000-10-03 住友化学工業株式会社 ポジ型レジスト組成物
ATE318705T1 (de) * 1998-08-24 2006-03-15 Fuji Photo Film Co Ltd Lichtempfindliche harzzusammensetzung und flachdruckplatte
KR100620439B1 (ko) 2005-01-17 2006-09-11 삼성전자주식회사 감광성 폴리머, 이를 포함하는 포토레지스트 조성물 및이를 이용한 포토레지스트 패턴 형성 방법
JP4588551B2 (ja) * 2005-06-16 2010-12-01 富士通株式会社 レジスト組成物、レジストパターンの形成方法、半導体装置及びその製造方法
US7582407B2 (en) * 2007-07-09 2009-09-01 Eastman Kodak Company Imageable elements with low pH developer solubility
US9482944B2 (en) 2009-09-15 2016-11-01 Mylan Group Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates
HUE031461T2 (en) * 2009-10-29 2017-07-28 Mylan Group Gallotannin compounds for coating compositions on lithographic printing plates
EP2566900B1 (en) 2010-09-14 2016-02-17 Mylan Group Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates
EP3395845A4 (en) * 2015-12-25 2019-08-14 Mitsubishi Gas Chemical Company, Inc. COMPOUND, RESIN, COMPOSITION, METHOD FOR FORMING A RESIST PATTERN, AND METHOD FOR FORMING A SWITCH PATTERN

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4910841B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1965-12-18 1974-03-13
US3802885A (en) * 1967-08-15 1974-04-09 Algraphy Ltd Photosensitive lithographic naphthoquinone diazide printing plate with aluminum base
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
JPS508658B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1970-06-19 1975-04-05
JPS508658A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1973-05-30 1975-01-29
US4123279A (en) * 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
US4174222A (en) * 1975-05-24 1979-11-13 Tokyo Ohka Kogyo Kabushiki Kaisha Positive-type O-quinone diazide containing photoresist compositions
DE2547905C2 (de) * 1975-10-25 1985-11-21 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
US4460674A (en) * 1981-01-16 1984-07-17 Konishiroku Photo Industry Co., Ltd. Posi-type quinone diazide photosensitive composition with sensitizer therefor

Also Published As

Publication number Publication date
EP0083971A2 (en) 1983-07-20
DE3370700D1 (en) 1987-05-07
JPS58134631A (ja) 1983-08-10
EP0083971B1 (en) 1987-04-01
US4536465A (en) 1985-08-20
EP0083971A3 (en) 1984-05-30

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