JPH01164084A - Semiconductor laser device - Google Patents
Semiconductor laser deviceInfo
- Publication number
- JPH01164084A JPH01164084A JP32157787A JP32157787A JPH01164084A JP H01164084 A JPH01164084 A JP H01164084A JP 32157787 A JP32157787 A JP 32157787A JP 32157787 A JP32157787 A JP 32157787A JP H01164084 A JPH01164084 A JP H01164084A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- support body
- laser element
- resin
- thermal conductivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 34
- 239000000615 nonconductor Substances 0.000 claims abstract description 8
- 239000011347 resin Substances 0.000 claims abstract description 8
- 229920005989 resin Polymers 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 abstract description 13
- 229910052751 metal Inorganic materials 0.000 abstract description 13
- 239000000853 adhesive Substances 0.000 abstract description 5
- 230000001070 adhesive effect Effects 0.000 abstract description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052802 copper Inorganic materials 0.000 abstract description 3
- 239000010949 copper Substances 0.000 abstract description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052737 gold Inorganic materials 0.000 abstract description 3
- 239000010931 gold Substances 0.000 abstract description 3
- 229910000679 solder Inorganic materials 0.000 abstract description 3
- 239000000919 ceramic Substances 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 abstract description 2
- 229910010271 silicon carbide Inorganic materials 0.000 abstract description 2
- 239000006185 dispersion Substances 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000004634 thermosetting polymer Substances 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 238000009429 electrical wiring Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は、複数個の活性層(ストライブ)を同一チップ
内に有する半導体レーザー装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a semiconductor laser device having a plurality of active layers (strives) within the same chip.
[従来の技術]
複数のストライプを有するモノリシック半導体レーザー
素子(チップ)を具備する半導体レーザー装置において
、ダイボンディングおよび電気的配線は下記補遺のもの
が一般的である。すなわち、支持体上のチップダイボン
ディング面には、通常のフォトリソグラフィー技術を用
いて金あるいは銅の配線体のパターンが形成されている
。この配線体のパターンは、半導体レーザー素子の配列
ピッチに対応した寸法で、並列パターンが一般的である
。この金属配線体と半導体レーザーチップの電極とは、
半10等の導電性接着材を介して熱圧着により接続され
ている。[Prior Art] In a semiconductor laser device including a monolithic semiconductor laser element (chip) having a plurality of stripes, die bonding and electrical wiring are generally as described in the appendix below. That is, a pattern of gold or copper wiring bodies is formed on the chip die bonding surface of the support using ordinary photolithography technology. The pattern of this wiring body has dimensions corresponding to the arrangement pitch of the semiconductor laser elements, and is generally a parallel pattern. This metal wiring body and the electrodes of the semiconductor laser chip are
They are connected by thermocompression bonding via a conductive adhesive such as half-10.
[発明が解決しようとする問題点]
上述した従来の半導体レーザー装置は、半導体レーザー
素子上に互いに分離されて設けられた蒸着電極と、支持
体上に設けられた金属配線体とを半田等の導電性接着材
を介して熱圧着したものであり、接続部の静的な強度は
ワイヤボンディングよりも大きい。しかし寸法的にゆと
りのない接続構造であるため、素子チップと支持体との
熱膨張係数が異なる場合には、冷熱サイクルによって金
属配線体の断線等の信頼性上の問題が発生したり、素子
チップの放熱が不充分で各ストライプの特性にバラツキ
が生じる等の欠点があった。[Problems to be Solved by the Invention] In the conventional semiconductor laser device described above, the vapor-deposited electrodes provided separately on the semiconductor laser element and the metal wiring body provided on the support are bonded using solder or the like. It is bonded by thermocompression using a conductive adhesive, and the static strength of the connection is greater than that of wire bonding. However, because the connection structure is dimensionally tight, if the coefficients of thermal expansion of the element chip and the support are different, reliability problems such as disconnection of the metal wiring body may occur during cooling and heating cycles, and the element There were drawbacks such as insufficient heat dissipation from the chip and variations in the characteristics of each stripe.
[問題点を解決するための手段]
本発明の半導体レーザー装置は、半導体レーザー素子と
支持体との隙間に、熱伝導性良好な電気的絶縁体(例え
ば樹脂)が充填されている。[Means for Solving the Problems] In the semiconductor laser device of the present invention, the gap between the semiconductor laser element and the support is filled with an electrical insulator (for example, resin) having good thermal conductivity.
[作用]
半導体レーザー素子と支持体との隙間に設けられた熱伝
導性良好な電気的絶縁体を介して、半導体レーザー素子
から発生する熱が逃げるために熱放散性が向上し、これ
により、各ストライプの発光特性のバラツキが低減し、
また、熱サイクルによる局部的応力集中が緩和されるこ
とにより、金属配線体の断線等を防止できる。[Function] Heat generated from the semiconductor laser element escapes through the electrical insulator with good thermal conductivity provided in the gap between the semiconductor laser element and the support, improving heat dissipation. Variations in the light emitting characteristics of each stripe are reduced,
Further, by relaxing local stress concentration caused by thermal cycles, it is possible to prevent disconnection of the metal wiring body.
[実施例コ
次に、本発明の実施例について図面を参照して説明する
。[Embodiments] Next, embodiments of the present invention will be described with reference to the drawings.
実施例1
第1図は本発明の半導体レーザー装置の第1の実施例の
正面図、第2図は第1図に示される本実施例の斜視図で
ある。Embodiment 1 FIG. 1 is a front view of a first embodiment of the semiconductor laser device of the present invention, and FIG. 2 is a perspective view of the embodiment shown in FIG.
本実施例は、所定間隔をおいて一列に配列された複数の
ストライプ2a〜2dを有する半導体レーザー素子1の
レーザー電極8(各ストライプに対応して分離されて設
けられている)を支持体3上に設けられた金属配線体7
(7,〜7d)と対向させ、これらを半田等の導電性接
着材6を介して熱圧着して電気的導通をとるとともに、
物理的に固定し、さらに、半導体レーザー素子1と支持
体3との間に樹脂9を介在させたものである。In this embodiment, a laser electrode 8 (provided separately corresponding to each stripe) of a semiconductor laser device 1 having a plurality of stripes 2a to 2d arranged in a line at predetermined intervals is attached to a support 3. Metal wiring body 7 provided above
(7, to 7d) and thermocompression-bond them through a conductive adhesive 6 such as solder to establish electrical continuity.
In addition to physically fixing the semiconductor laser element 1 and the support 3, a resin 9 is interposed between the semiconductor laser element 1 and the support 3.
支持体3は熱伝導性良好なセラミック、シリコンカーバ
イド等からなり、金属配線体7(7a〜7d)は金、銅
等からなる。また、樹脂9は、半導体レーザー素子1と
支持体3とを固定後において、例えば、熱伝導性の良い
熱硬化性樹脂を注射針で注入、充填し、硬化させること
により設けられる。なお、レーザー電極8の厚さは!μ
以下であり、金属配線体7の厚さは2μ程度である。The support body 3 is made of ceramic, silicon carbide, etc. with good thermal conductivity, and the metal wiring body 7 (7a to 7d) is made of gold, copper, etc. Further, the resin 9 is provided by, for example, injecting a thermosetting resin with good thermal conductivity with a syringe needle, filling it, and curing it after fixing the semiconductor laser element 1 and the support body 3. In addition, what is the thickness of the laser electrode 8? μ
The thickness of the metal wiring body 7 is approximately 2 μm.
実施例2
第3図は本発明の半導体レーザー装置の第2の実施例の
正面図である。Embodiment 2 FIG. 3 is a front view of a second embodiment of the semiconductor laser device of the present invention.
本実施例は、第1の実施例における支持体3を、金属ブ
ロック(あるいは厚板10)に熱伝導性良好な電気的絶
縁体11を貼り合せた構造のものに置換したものである
。絶縁体が高価な場合には、本実施例のように大部分を
金属ブロック10とすることによりコストを低下できる
。In this embodiment, the support 3 in the first embodiment is replaced with a structure in which an electrical insulator 11 with good thermal conductivity is bonded to a metal block (or thick plate 10). If the insulator is expensive, the cost can be reduced by making most of it the metal block 10 as in this embodiment.
[発明の効果]
以上説明したように本発明は、チップと支持体間に熱伝
導性良好な電気的絶縁体を設けることにより、温度変化
による繰返し応力を低減し、信頼性の向上、素子寿命の
延長が図れ、また、各ストライプの発光特性のバラツキ
を低減できる効果がある。[Effects of the Invention] As explained above, the present invention provides an electrical insulator with good thermal conductivity between the chip and the support, thereby reducing repetitive stress due to temperature changes, improving reliability, and extending the life of the element. This also has the effect of reducing variations in the light emitting characteristics of each stripe.
第1図は本発明の半導体レーザー装置の第1の実施例の
正面図、
第2図は第1の実施例の斜視図、
第3図は本発明の半導体レーザー装置の第2の実施例の
正面図である。
1・・・半導体レーザー素子、
2(2a〜2d)・・・ストライプ、
3・・・支持体、
6・・・導電性接着材、
7(7a〜7.)・・・金属配線体、
8・・・レーザー電極、
9・・・樹脂、
i o−・・金属ブロック、
11・・・絶縁体。FIG. 1 is a front view of a first embodiment of a semiconductor laser device of the present invention, FIG. 2 is a perspective view of the first embodiment, and FIG. 3 is a front view of a second embodiment of a semiconductor laser device of the present invention. It is a front view. DESCRIPTION OF SYMBOLS 1... Semiconductor laser element, 2 (2a-2d)... Stripe, 3... Support body, 6... Conductive adhesive material, 7 (7a-7.)... Metal wiring body, 8 ...Laser electrode, 9...Resin, io-...Metal block, 11...Insulator.
Claims (1)
ーザー光出射領域それぞれに対応して個別的にレーザー
電極が配置されているモノリシック半導体レーザー素子
と、 前記モノリシック半導体レーザー素子に電流を供給する
ための配線体が主面上に形成され、該モノリシック半導
体レーザー素子を支持するための支持体とを有し、 前記モノリシック半導体レーザー素子のレーザー電極と
これと対向する前記配線体とが電気的に接続され、モノ
リシック半導体レーザー素子と支持体との間には、熱伝
導性が良好な電気的絶縁体が介在している半導体レーザ
ー装置。 2、前記支持体は、少なくとも前記配線が形成されてい
る主面近傍部分が熱伝導性良好な電気的絶縁体となって
おり、前記モノリシック半導体レーザー素子と支持体と
の間に介在する熱伝導性が良好な電気的絶縁体は樹脂か
らなっている特許請求の範囲第1項記載の半導体レーザ
ー装置。[Scope of Claims] 1. A monolithic semiconductor laser element provided with a plurality of laser light emitting regions and in which a laser electrode is individually arranged corresponding to each of the plurality of laser light emitting regions; and the monolithic semiconductor laser. A wiring body for supplying current to the element is formed on the main surface and has a support body for supporting the monolithic semiconductor laser element, and a laser electrode of the monolithic semiconductor laser element and the wiring opposite thereto. A semiconductor laser device that is electrically connected to a support body, and has an electrical insulator with good thermal conductivity interposed between the monolithic semiconductor laser element and the support body. 2. The support is an electrical insulator with good thermal conductivity at least in the vicinity of the main surface where the wiring is formed, and the heat conduction between the monolithic semiconductor laser element and the support is 2. The semiconductor laser device according to claim 1, wherein the electrical insulator with good properties is made of resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32157787A JPH01164084A (en) | 1987-12-21 | 1987-12-21 | Semiconductor laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32157787A JPH01164084A (en) | 1987-12-21 | 1987-12-21 | Semiconductor laser device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01164084A true JPH01164084A (en) | 1989-06-28 |
Family
ID=18134115
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32157787A Pending JPH01164084A (en) | 1987-12-21 | 1987-12-21 | Semiconductor laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01164084A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5786634A (en) * | 1996-09-02 | 1998-07-28 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device |
JP2006135177A (en) * | 2004-11-08 | 2006-05-25 | Sony Corp | Semiconductor laser apparatus |
JP2009009991A (en) * | 2007-06-26 | 2009-01-15 | Seiko Epson Corp | Light source device, projector, and monitor device |
JP2010258467A (en) * | 2010-06-25 | 2010-11-11 | Sanyo Electric Co Ltd | Semiconductor laser device and optical pickup device |
US9278444B2 (en) | 2010-05-21 | 2016-03-08 | Makita Corporation | Handheld work machine |
US11962122B2 (en) | 2018-07-30 | 2024-04-16 | Panasonic Holdings Corporation | Semiconductor light emitting device and external resonance type laser device |
-
1987
- 1987-12-21 JP JP32157787A patent/JPH01164084A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5786634A (en) * | 1996-09-02 | 1998-07-28 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device |
JP2006135177A (en) * | 2004-11-08 | 2006-05-25 | Sony Corp | Semiconductor laser apparatus |
JP4609700B2 (en) * | 2004-11-08 | 2011-01-12 | ソニー株式会社 | Semiconductor laser device |
JP2009009991A (en) * | 2007-06-26 | 2009-01-15 | Seiko Epson Corp | Light source device, projector, and monitor device |
US9278444B2 (en) | 2010-05-21 | 2016-03-08 | Makita Corporation | Handheld work machine |
JP2010258467A (en) * | 2010-06-25 | 2010-11-11 | Sanyo Electric Co Ltd | Semiconductor laser device and optical pickup device |
US11962122B2 (en) | 2018-07-30 | 2024-04-16 | Panasonic Holdings Corporation | Semiconductor light emitting device and external resonance type laser device |
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