JPH01113341U - - Google Patents
Info
- Publication number
- JPH01113341U JPH01113341U JP839188U JP839188U JPH01113341U JP H01113341 U JPH01113341 U JP H01113341U JP 839188 U JP839188 U JP 839188U JP 839188 U JP839188 U JP 839188U JP H01113341 U JPH01113341 U JP H01113341U
- Authority
- JP
- Japan
- Prior art keywords
- electrostatic chuck
- insulating film
- conductor
- attracted
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004020 conductor Substances 0.000 claims description 4
- 239000000498 cooling water Substances 0.000 claims description 3
- 239000012212 insulator Substances 0.000 description 1
Description
第１図は本考案に係る静電チヤツクの模式的縦
断面図、第２図は本考案に係る静電チヤツクにお
ける被吸着物たる試料と冷却水との間の温度勾配
を示すグラフ、第３図は従来の静電チヤツクの模
式的縦断面図、第４図は従来の静電チヤツクにお
ける被吸着物たる試料と冷却水との間の温度勾配
を示すグラフである。
１……導電体、１ｂ……空洞部、２……絶縁体
膜、３……試料、４……支持体、１３……（放電
防止用）Ｏリング。
FIG. 1 is a schematic vertical cross-sectional view of the electrostatic chuck according to the present invention, FIG. 2 is a graph showing the temperature gradient between the sample as an adsorbed object and cooling water in the electrostatic chuck according to the present invention, and FIG. The figure is a schematic longitudinal sectional view of a conventional electrostatic chuck, and FIG. 4 is a graph showing the temperature gradient between a sample, which is an object to be adsorbed, and cooling water in the conventional electrostatic chuck. DESCRIPTION OF SYMBOLS 1... Conductor, 1b... Cavity, 2... Insulator film, 3... Sample, 4... Support, 13... O-ring (for preventing discharge).
Claims (1)
に支持された導電体と、前記絶縁体膜の表面に接
触する被吸着物との間に電圧を印加し、両者間に
生じる静電力により、前記被吸着物を絶縁体膜上
に吸着、保持する静電チヤツクにおいて、 前記導電体の内部に、前記被吸着物の冷却水が
導入される空洞部を具備することを特徴とする静
電チヤツク。 ２ 前記導電体と前記支持体との間に、両者間に
生じる放電の防止手段が設けてある請求項１記載
の静電チヤツク。[Claims for Utility Model Registration] 1 A voltage is applied between a conductor whose outer surface is covered with an insulating film and is supported on a support and an object to be attracted that is in contact with the surface of the insulating film. In the electrostatic chuck that attracts and holds the object on an insulating film by the electrostatic force generated between the two, a cavity portion into which cooling water for the object to be attracted is introduced into the inside of the conductor. An electrostatic chuck characterized by comprising: 2. The electrostatic chuck according to claim 1, further comprising means for preventing discharge occurring between the conductor and the support.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP839188U JPH01113341U (en) | 1988-01-26 | 1988-01-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP839188U JPH01113341U (en) | 1988-01-26 | 1988-01-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01113341U true JPH01113341U (en) | 1989-07-31 |
Family
ID=31214226
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP839188U Pending JPH01113341U (en) | 1988-01-26 | 1988-01-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01113341U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010084650A1 (en) * | 2009-01-26 | 2010-07-29 | 三菱重工業株式会社 | Substrate support stage of plasma processing apparatus |
-
1988
- 1988-01-26 JP JP839188U patent/JPH01113341U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010084650A1 (en) * | 2009-01-26 | 2010-07-29 | 三菱重工業株式会社 | Substrate support stage of plasma processing apparatus |
| KR101310414B1 (en) * | 2009-01-26 | 2013-09-24 | 미츠비시 쥬고교 가부시키가이샤 | Substrate support stage of plasma processing apparatus |
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