JPH0299961U - - Google Patents
Info
- Publication number
- JPH0299961U JPH0299961U JP716389U JP716389U JPH0299961U JP H0299961 U JPH0299961 U JP H0299961U JP 716389 U JP716389 U JP 716389U JP 716389 U JP716389 U JP 716389U JP H0299961 U JPH0299961 U JP H0299961U
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- sample
- thin film
- film
- exposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims 3
- 239000010408 film Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は本考案の実施例の構成を示す縦断面図
、第２図は本考案の他の実施例の構成を示す要部
縦断面図である。
１…成膜用のチヤンバ、５…ヒータ室、６…ヒ
ータ、Ｓ…基板。
FIG. 1 is a vertical cross-sectional view showing the structure of an embodiment of the present invention, and FIG. 2 is a longitudinal cross-sectional view of main parts showing the structure of another embodiment of the present invention. 1... Chamber for film formation, 5... Heater chamber, 6... Heater, S... Substrate.
Claims (1)
により加熱し、その試料表面に成膜材料の粒子を
衝突させることによつて、その試料表面に薄膜を
形成する装置において、外壁面の少なくとも一部
が上記チヤンバ内に露呈し、かつ、そのチヤンバ
内とは気密に仕切られてなる室を設け、この室の
内部空間に上記ヒータを配設するとともに、この
室の上記チヤンバ内に露呈する面に膜を形成すべ
き試料を装着するよう構成したことを特徴とする
、薄膜製造装置。 In an apparatus for forming a thin film on a sample surface by heating the sample with an electric heater in a chamber with a predetermined atmosphere and colliding particles of a film-forming material on the sample surface, at least a portion of the outer wall surface is A chamber is provided that is exposed within the chamber and is airtightly partitioned from the interior of the chamber, and the heater is disposed in the internal space of this chamber, and a film is formed on the surface of this chamber that is exposed within the chamber. 1. A thin film manufacturing apparatus, characterized in that the apparatus is configured to mount a sample on which a thin film is to be formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP716389U JPH0299961U (en) | 1989-01-25 | 1989-01-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP716389U JPH0299961U (en) | 1989-01-25 | 1989-01-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0299961U true JPH0299961U (en) | 1990-08-09 |
Family
ID=31211950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP716389U Pending JPH0299961U (en) | 1989-01-25 | 1989-01-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0299961U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009157228A1 (en) * | 2008-06-26 | 2009-12-30 | キヤノンアネルバ株式会社 | Sputtering apparatus, sputtering method and light emitting element manufacturing method |
| JP2021123749A (en) * | 2020-02-05 | 2021-08-30 | アリオス株式会社 | Reactive sputtering apparatus |
-
1989
- 1989-01-25 JP JP716389U patent/JPH0299961U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009157228A1 (en) * | 2008-06-26 | 2009-12-30 | キヤノンアネルバ株式会社 | Sputtering apparatus, sputtering method and light emitting element manufacturing method |
| JP2021123749A (en) * | 2020-02-05 | 2021-08-30 | アリオス株式会社 | Reactive sputtering apparatus |