JPH01125356U - - Google Patents
Info
- Publication number
- JPH01125356U JPH01125356U JP2167288U JP2167288U JPH01125356U JP H01125356 U JPH01125356 U JP H01125356U JP 2167288 U JP2167288 U JP 2167288U JP 2167288 U JP2167288 U JP 2167288U JP H01125356 U JPH01125356 U JP H01125356U
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- thin film
- forming apparatus
- wall
- film forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims 3
- 238000001816 cooling Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は本考案の一実施例のスパツタ装置の説
明図、第２図は従来の同装置の説明図、第３図は
基板ホルダの斜視図である。
１……基板ホルダ、２……基板、３……チヤン
バ、４……スパツタリングターゲツト、５……ヒ
ータコイル、６……円筒、１０……チヤンバ、１
０ａ……内側円筒部、１０ｂ……外側円筒部。
FIG. 1 is an explanatory diagram of a sputtering apparatus according to an embodiment of the present invention, FIG. 2 is an explanatory diagram of a conventional sputtering apparatus, and FIG. 3 is a perspective view of a substrate holder. DESCRIPTION OF SYMBOLS 1...Substrate holder, 2...Substrate, 3...Chamber, 4...Sputtering target, 5...Heater coil, 6...Cylinder, 10...Chamber, 1
0a... Inner cylindrical part, 10b... Outer cylindrical part.
Claims (1)
おいて、上記基板ホルダの内側がチヤンバ内壁と
なるようにチヤンバを形成したことを特徴とする
薄膜形成装置。 (2) 上記チヤンバ内壁にヒータを装填したこと
を特徴とする実用新案登録請求の範囲第１項記載
の薄膜形成装置。 (3) 上記チヤンバ内壁に対応する外側を凹形状
として、そこに冷却パイプを取り付けたことを特
徴とする実用新案登録請求の範囲第１項又は第２
項記載の薄膜形成装置。[Claims for Utility Model Registration] (1) A thin film forming apparatus having a cylindrical substrate holder, characterized in that a chamber is formed such that the inside of the substrate holder is an inner wall of the chamber. (2) The thin film forming apparatus according to claim 1, characterized in that a heater is mounted on the inner wall of the chamber. (3) Utility model registration claim 1 or 2, characterized in that the outer side corresponding to the inner wall of the chamber is formed into a concave shape, and a cooling pipe is attached thereto.
Thin film forming apparatus as described in .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2167288U JPH01125356U (en) | 1988-02-20 | 1988-02-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2167288U JPH01125356U (en) | 1988-02-20 | 1988-02-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01125356U true JPH01125356U (en) | 1989-08-25 |
Family
ID=31239112
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2167288U Pending JPH01125356U (en) | 1988-02-20 | 1988-02-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01125356U (en) |
-
1988
- 1988-02-20 JP JP2167288U patent/JPH01125356U/ja active Pending