JPH01106428A - マスクとウエハのプリアライメント方法 - Google Patents

マスクとウエハのプリアライメント方法

Info

Publication number
JPH01106428A
JPH01106428A JP62264601A JP26460187A JPH01106428A JP H01106428 A JPH01106428 A JP H01106428A JP 62264601 A JP62264601 A JP 62264601A JP 26460187 A JP26460187 A JP 26460187A JP H01106428 A JPH01106428 A JP H01106428A
Authority
JP
Japan
Prior art keywords
mask
wafer
stage
chuck
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62264601A
Other languages
English (en)
Japanese (ja)
Other versions
JPH055369B2 (enrdf_load_stackoverflow
Inventor
Ryoji Tanaka
良治 田中
Hidekazu Kono
英一 河野
Joji Iwata
岩田　穣治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62264601A priority Critical patent/JPH01106428A/ja
Publication of JPH01106428A publication Critical patent/JPH01106428A/ja
Publication of JPH055369B2 publication Critical patent/JPH055369B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP62264601A 1987-10-19 1987-10-19 マスクとウエハのプリアライメント方法 Granted JPH01106428A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62264601A JPH01106428A (ja) 1987-10-19 1987-10-19 マスクとウエハのプリアライメント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62264601A JPH01106428A (ja) 1987-10-19 1987-10-19 マスクとウエハのプリアライメント方法

Publications (2)

Publication Number Publication Date
JPH01106428A true JPH01106428A (ja) 1989-04-24
JPH055369B2 JPH055369B2 (enrdf_load_stackoverflow) 1993-01-22

Family

ID=17405581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62264601A Granted JPH01106428A (ja) 1987-10-19 1987-10-19 マスクとウエハのプリアライメント方法

Country Status (1)

Country Link
JP (1) JPH01106428A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007225727A (ja) * 2006-02-21 2007-09-06 Orc Mfg Co Ltd 基板露光装置および基板露光方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007225727A (ja) * 2006-02-21 2007-09-06 Orc Mfg Co Ltd 基板露光装置および基板露光方法

Also Published As

Publication number Publication date
JPH055369B2 (enrdf_load_stackoverflow) 1993-01-22

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