JPH01102153U - - Google Patents

Info

Publication number
JPH01102153U
JPH01102153U JP19912587U JP19912587U JPH01102153U JP H01102153 U JPH01102153 U JP H01102153U JP 19912587 U JP19912587 U JP 19912587U JP 19912587 U JP19912587 U JP 19912587U JP H01102153 U JPH01102153 U JP H01102153U
Authority
JP
Japan
Prior art keywords
substrate holder
plasma cvd
cvd apparatus
area
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19912587U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP19912587U priority Critical patent/JPH01102153U/ja
Publication of JPH01102153U publication Critical patent/JPH01102153U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図〜第3図は本考案の一実施例を示す。第
1図は基板ホルダの正面図、第2図は同縦断面図
であり、第3図はホルダ本体に対する分割桟部の
分解斜視図である。第4図はプラズマCVD装置
の概要を示す断面略図である。 1……基板ホルダ、2……ホルダ本体、2a…
…表面、3……桟部、3a,3b,3c……分割
桟部、4……基板、5……チエンバ、6……RF
電極、7……RF電源、P……プラズマ。
1 to 3 show an embodiment of the present invention. FIG. 1 is a front view of the substrate holder, FIG. 2 is a longitudinal cross-sectional view thereof, and FIG. 3 is an exploded perspective view of a dividing bar with respect to the holder main body. FIG. 4 is a schematic cross-sectional view showing the outline of the plasma CVD apparatus. 1... Board holder, 2... Holder body, 2a...
...Surface, 3... Crosspiece, 3a, 3b, 3c... Divided crosspiece, 4... Board, 5... Chamber, 6... RF
Electrode, 7...RF power supply, P...plasma.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 大面積のRF電極と基板ホルダに複数枚保持さ
せた小面積の基板とを対向させて、これら複数枚
の基板を同時に成膜するプラズマCVD装置にお
いて、前記基板ホルダの桟部を絶縁材で形成した
ことを特徴とするプラズマCVD装置の基板ホル
ダ。
In a plasma CVD apparatus that simultaneously forms films on a plurality of substrates by opposing a large-area RF electrode and a plurality of small-area substrates held in a substrate holder, the crosspiece of the substrate holder is formed of an insulating material. A substrate holder for a plasma CVD apparatus characterized by:
JP19912587U 1987-12-28 1987-12-28 Pending JPH01102153U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19912587U JPH01102153U (en) 1987-12-28 1987-12-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19912587U JPH01102153U (en) 1987-12-28 1987-12-28

Publications (1)

Publication Number Publication Date
JPH01102153U true JPH01102153U (en) 1989-07-10

Family

ID=31489594

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19912587U Pending JPH01102153U (en) 1987-12-28 1987-12-28

Country Status (1)

Country Link
JP (1) JPH01102153U (en)

Similar Documents

Publication Publication Date Title
JPH01102153U (en)
JPH01174922U (en)
JPH0214754U (en)
JPH01106453U (en)
JPS645431U (en)
JPS6237919U (en)
JPH0380364U (en)
JPH01168551U (en)
JPH0281427U (en)
JPS63187326U (en)
JPS63188041U (en)
JPS63121428U (en)
JPH01106564U (en)
JPH0378062U (en)
JPS61144637U (en)
JPH0417850U (en)
JPS6340955U (en)
JPH0378057U (en)
JPS63127384U (en)
JPS62106669U (en)
JPS61149994U (en)
JPS63117553U (en)
JPS63150098U (en)
JPS63143569U (en)
JPS61133557U (en)