JPH01106564U - - Google Patents

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Publication number
JPH01106564U
JPH01106564U JP49188U JP49188U JPH01106564U JP H01106564 U JPH01106564 U JP H01106564U JP 49188 U JP49188 U JP 49188U JP 49188 U JP49188 U JP 49188U JP H01106564 U JPH01106564 U JP H01106564U
Authority
JP
Japan
Prior art keywords
substrate
gas
electrode
ejected
cvd apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49188U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP49188U priority Critical patent/JPH01106564U/ja
Publication of JPH01106564U publication Critical patent/JPH01106564U/ja
Pending legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの考案の第一の実施例を示す縦断側
面図、第2図はこの考案の第二の実施例を示す縦
断側面図、第3図はこの考案の第三の実施例を示
す縦断側面図、第4図は従来例を示す縦断側面図
である。 4…電極、5…板、6…孔、11…基板、17
…ガス衝突壁。
Fig. 1 is a vertical side view showing the first embodiment of this invention, Fig. 2 is a longitudinal side view showing the second embodiment of this invention, and Fig. 3 is a longitudinal side view showing the third embodiment of this invention. FIG. 4 is a vertical side view showing a conventional example. 4... Electrode, 5... Plate, 6... Hole, 11... Substrate, 17
...Gas collision wall.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 電極に取付けられた板に形成された多数個の微
小な孔からガスを噴出し、その噴出されたガスを
プラズマ放電により分解、イオン化し、生成した
ラジカル、イオン種を前記板に対向する位置に配
設された基板の表面で反応を起こさせることによ
りその基板に膜を形成させるプラズマCVD装置
において、前記基板と前記電極との間のプラズマ
放電領域の周囲を取り囲むように高温に加熱され
たガス衝突壁を設けたことを特徴とするプラズマ
CVD装置。
Gas is ejected from a large number of minute holes formed in a plate attached to the electrode, and the ejected gas is decomposed and ionized by plasma discharge, and the generated radicals and ionic species are placed in a position facing the plate. In a plasma CVD apparatus that forms a film on a substrate by causing a reaction on the surface of the substrate, a gas heated to a high temperature surrounds a plasma discharge region between the substrate and the electrode. A plasma CVD apparatus characterized by being provided with a collision wall.
JP49188U 1988-01-06 1988-01-06 Pending JPH01106564U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP49188U JPH01106564U (en) 1988-01-06 1988-01-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49188U JPH01106564U (en) 1988-01-06 1988-01-06

Publications (1)

Publication Number Publication Date
JPH01106564U true JPH01106564U (en) 1989-07-18

Family

ID=31199565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49188U Pending JPH01106564U (en) 1988-01-06 1988-01-06

Country Status (1)

Country Link
JP (1) JPH01106564U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014078468A (en) * 2012-10-12 2014-05-01 Toyota Motor Corp Fuel cell separator manufacturing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014078468A (en) * 2012-10-12 2014-05-01 Toyota Motor Corp Fuel cell separator manufacturing device

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