JPH0186229U - - Google Patents
Info
- Publication number
- JPH0186229U JPH0186229U JP18312487U JP18312487U JPH0186229U JP H0186229 U JPH0186229 U JP H0186229U JP 18312487 U JP18312487 U JP 18312487U JP 18312487 U JP18312487 U JP 18312487U JP H0186229 U JPH0186229 U JP H0186229U
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- plasma cvd
- cvd apparatus
- vacuum chamber
- preheating heater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Description
第1図は本考案の実施例の構成を示す概略断面
図、第2図はローデイング室の構成を示す図、第
3図は別の実施例の構成を示す概略断面図、第4
図は予備加熱ヒータが設置される反応室の構成を
示す図である。
2…ローデイング室、3,4,5…反応室、2
0,60…予備加熱ヒータ、21,22,23…
基板加熱ヒータ、26,27,28…カソード電
極、40…基板、41…基板カート、42…搬送
ローラ、50,61…熱反射板。
FIG. 1 is a schematic sectional view showing the configuration of an embodiment of the present invention, FIG. 2 is a diagram showing the configuration of a loading chamber, FIG. 3 is a schematic sectional view showing the configuration of another embodiment, and FIG.
The figure is a diagram showing the configuration of a reaction chamber in which a preheating heater is installed. 2... Loading chamber, 3, 4, 5... Reaction chamber, 2
0, 60... Preheating heater, 21, 22, 23...
Substrate heater, 26, 27, 28... cathode electrode, 40... substrate, 41... substrate cart, 42... conveyance roller, 50, 61... heat reflecting plate.
Claims (1)
真空室へ順次搬送しながらその表面に薄膜形成処
理を行なうインライン式のプラズマCVD装置に
おいて、ワークを予備加熱する予備加熱ヒータと
真空室内壁間に該予備加熱ヒータに対向して熱反
射板を設けたことを特徴とするプラズマCVD装
置。 In an in-line plasma CVD apparatus in which multiple vacuum chambers are installed and a workpiece such as a substrate is sequentially transferred to each vacuum chamber and a thin film is formed on the surface of the workpiece, the space between the preheating heater that preheats the workpiece and the wall of the vacuum chamber is A plasma CVD apparatus characterized in that a heat reflecting plate is provided opposite to the preheating heater.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18312487U JPH0186229U (en) | 1987-11-30 | 1987-11-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18312487U JPH0186229U (en) | 1987-11-30 | 1987-11-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0186229U true JPH0186229U (en) | 1989-06-07 |
Family
ID=31474556
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18312487U Pending JPH0186229U (en) | 1987-11-30 | 1987-11-30 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0186229U (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62131523A (en) * | 1985-12-03 | 1987-06-13 | Hitachi Electronics Eng Co Ltd | Cvd thin film forming device |
-
1987
- 1987-11-30 JP JP18312487U patent/JPH0186229U/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62131523A (en) * | 1985-12-03 | 1987-06-13 | Hitachi Electronics Eng Co Ltd | Cvd thin film forming device |