JPH0186229U - - Google Patents

Info

Publication number
JPH0186229U
JPH0186229U JP18312487U JP18312487U JPH0186229U JP H0186229 U JPH0186229 U JP H0186229U JP 18312487 U JP18312487 U JP 18312487U JP 18312487 U JP18312487 U JP 18312487U JP H0186229 U JPH0186229 U JP H0186229U
Authority
JP
Japan
Prior art keywords
workpiece
plasma cvd
cvd apparatus
vacuum chamber
preheating heater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18312487U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP18312487U priority Critical patent/JPH0186229U/ja
Publication of JPH0186229U publication Critical patent/JPH0186229U/ja
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の実施例の構成を示す概略断面
図、第2図はローデイング室の構成を示す図、第
3図は別の実施例の構成を示す概略断面図、第4
図は予備加熱ヒータが設置される反応室の構成を
示す図である。 2…ローデイング室、3,4,5…反応室、2
0,60…予備加熱ヒータ、21,22,23…
基板加熱ヒータ、26,27,28…カソード電
極、40…基板、41…基板カート、42…搬送
ローラ、50,61…熱反射板。
FIG. 1 is a schematic sectional view showing the configuration of an embodiment of the present invention, FIG. 2 is a diagram showing the configuration of a loading chamber, FIG. 3 is a schematic sectional view showing the configuration of another embodiment, and FIG.
The figure is a diagram showing the configuration of a reaction chamber in which a preheating heater is installed. 2... Loading chamber, 3, 4, 5... Reaction chamber, 2
0, 60... Preheating heater, 21, 22, 23...
Substrate heater, 26, 27, 28... cathode electrode, 40... substrate, 41... substrate cart, 42... conveyance roller, 50, 61... heat reflecting plate.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 複数の真空室が設置され、基板等のワークを各
真空室へ順次搬送しながらその表面に薄膜形成処
理を行なうインライン式のプラズマCVD装置に
おいて、ワークを予備加熱する予備加熱ヒータと
真空室内壁間に該予備加熱ヒータに対向して熱反
射板を設けたことを特徴とするプラズマCVD装
置。
In an in-line plasma CVD apparatus in which multiple vacuum chambers are installed and a workpiece such as a substrate is sequentially transferred to each vacuum chamber and a thin film is formed on the surface of the workpiece, the space between the preheating heater that preheats the workpiece and the wall of the vacuum chamber is A plasma CVD apparatus characterized in that a heat reflecting plate is provided opposite to the preheating heater.
JP18312487U 1987-11-30 1987-11-30 Pending JPH0186229U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18312487U JPH0186229U (en) 1987-11-30 1987-11-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18312487U JPH0186229U (en) 1987-11-30 1987-11-30

Publications (1)

Publication Number Publication Date
JPH0186229U true JPH0186229U (en) 1989-06-07

Family

ID=31474556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18312487U Pending JPH0186229U (en) 1987-11-30 1987-11-30

Country Status (1)

Country Link
JP (1) JPH0186229U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62131523A (en) * 1985-12-03 1987-06-13 Hitachi Electronics Eng Co Ltd Cvd thin film forming device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62131523A (en) * 1985-12-03 1987-06-13 Hitachi Electronics Eng Co Ltd Cvd thin film forming device

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