JP7819635B2 - 液状組成物の製造方法及び組成物 - Google Patents

液状組成物の製造方法及び組成物

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Publication number
JP7819635B2
JP7819635B2 JP2022575562A JP2022575562A JP7819635B2 JP 7819635 B2 JP7819635 B2 JP 7819635B2 JP 2022575562 A JP2022575562 A JP 2022575562A JP 2022575562 A JP2022575562 A JP 2022575562A JP 7819635 B2 JP7819635 B2 JP 7819635B2
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particles
composition
polymer
tetrafluoroethylene
mass
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JP2022575562A
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Japanese (ja)
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JPWO2022153931A1 (https=
Inventor
敦美 光永
剛 長谷川
満 関
創太 結城
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AGC Inc
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Asahi Glass Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/20—Compounding polymers with additives, e.g. colouring
    • C08J3/205—Compounding polymers with additives, e.g. colouring in the presence of a continuous liquid phase
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/38—Boron-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C08L27/18—Homopolymers or copolymers or tetrafluoroethene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
    • C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
    • C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C08J2327/18—Homopolymers or copolymers of tetrafluoroethylene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2479/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2461/00 - C08J2477/00
    • C08J2479/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2479/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/38—Boron-containing compounds
    • C08K2003/382—Boron-containing compounds and nitrogen
    • C08K2003/385—Binary compounds of nitrogen with boron

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
JP2022575562A 2021-01-13 2022-01-07 液状組成物の製造方法及び組成物 Active JP7819635B2 (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP2021003198 2021-01-13
JP2021003198 2021-01-13
JP2021053569 2021-03-26
JP2021053568 2021-03-26
JP2021053569 2021-03-26
JP2021053568 2021-03-26
JP2021153688 2021-09-21
JP2021153688 2021-09-21
PCT/JP2022/000323 WO2022153931A1 (ja) 2021-01-13 2022-01-07 液状組成物の製造方法及び組成物

Publications (2)

Publication Number Publication Date
JPWO2022153931A1 JPWO2022153931A1 (https=) 2022-07-21
JP7819635B2 true JP7819635B2 (ja) 2026-02-25

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JP2022575562A Active JP7819635B2 (ja) 2021-01-13 2022-01-07 液状組成物の製造方法及び組成物

Country Status (4)

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JP (1) JP7819635B2 (https=)
KR (1) KR20230132449A (https=)
TW (1) TW202237710A (https=)
WO (1) WO2022153931A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024075609A1 (ja) * 2022-10-03 2024-04-11 Ａｇｃ株式会社 水性分散液
JP2025179272A (ja) * 2022-10-03 2025-12-10 Ａｇｃ株式会社 水性分散液、及び水性分散液を用いた積層体の製造方法

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005142572A (ja) 2003-11-05 2005-06-02 E I Du Pont De Nemours & Co （微細粉末）フルオロポリマーから部分的に誘導され、電子基板として有用なポリイミドをベースとした組成物、およびそれに関連する方法と組成物
JP2010090304A (ja) 2008-10-09 2010-04-22 Teijin Ltd スラリーの製造方法、製造システム、およびスラリー成形物
JP2015138656A (ja) 2014-01-22 2015-07-30 アイシン化工株式会社 マイクロポーラス層形成用ペースト組成物及びその製造方法
JP2016060775A (ja) 2014-09-16 2016-04-25 国立大学法人九州工業大学 固体絶縁物及びその製造方法
WO2016159061A1 (ja) 2015-03-31 2016-10-06 株式会社カネカ ポリイミドフィルムの製造方法及びその利用
WO2017022229A1 (ja) 2015-07-31 2017-02-09 日本ゼオン株式会社 複合樹脂材料、スラリー、複合樹脂材料成形体、及びスラリーの製造方法
WO2017135168A1 (ja) 2016-02-02 2017-08-10 三菱瓦斯化学株式会社 樹脂組成物、プリプレグ、金属箔張積層板、樹脂シート、プリント配線板及び半導体装置
JP2017197727A (ja) 2015-10-01 2017-11-02 三菱鉛筆株式会社 フッ素系樹脂含有熱硬化樹脂組成物とその硬化物、および回路基板用接着剤組成物
JP2018048233A (ja) 2016-09-20 2018-03-29 住友電気工業株式会社 接着性塗料及び多孔質複合体の製造方法
JP2020037661A (ja) 2018-09-05 2020-03-12 Ａｇｃ株式会社 フッ素樹脂膜、分散液の製造方法およびフッ素樹脂膜付基材の製造方法
WO2020137879A1 (ja) 2018-12-27 2020-07-02 Ａｇｃ株式会社 パウダー分散液、積層体及びプリント基板
WO2021221038A1 (ja) 2020-04-30 2021-11-04 Ａｇｃ株式会社 分散液の製造方法、ペーストおよび練粉

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6534848B2 (ja) 2015-04-01 2019-06-26 三菱鉛筆株式会社 ポリテトラフルオロエチレンの非水系分散体
JP6722721B2 (ja) 2018-06-20 2020-07-15 三井・ケマーズ フロロプロダクツ株式会社 水性フッ素樹脂塗料組成物

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005142572A (ja) 2003-11-05 2005-06-02 E I Du Pont De Nemours & Co （微細粉末）フルオロポリマーから部分的に誘導され、電子基板として有用なポリイミドをベースとした組成物、およびそれに関連する方法と組成物
JP2010090304A (ja) 2008-10-09 2010-04-22 Teijin Ltd スラリーの製造方法、製造システム、およびスラリー成形物
JP2015138656A (ja) 2014-01-22 2015-07-30 アイシン化工株式会社 マイクロポーラス層形成用ペースト組成物及びその製造方法
JP2016060775A (ja) 2014-09-16 2016-04-25 国立大学法人九州工業大学 固体絶縁物及びその製造方法
WO2016159061A1 (ja) 2015-03-31 2016-10-06 株式会社カネカ ポリイミドフィルムの製造方法及びその利用
WO2017022229A1 (ja) 2015-07-31 2017-02-09 日本ゼオン株式会社 複合樹脂材料、スラリー、複合樹脂材料成形体、及びスラリーの製造方法
JP2017197727A (ja) 2015-10-01 2017-11-02 三菱鉛筆株式会社 フッ素系樹脂含有熱硬化樹脂組成物とその硬化物、および回路基板用接着剤組成物
WO2017135168A1 (ja) 2016-02-02 2017-08-10 三菱瓦斯化学株式会社 樹脂組成物、プリプレグ、金属箔張積層板、樹脂シート、プリント配線板及び半導体装置
JP2018048233A (ja) 2016-09-20 2018-03-29 住友電気工業株式会社 接着性塗料及び多孔質複合体の製造方法
JP2020037661A (ja) 2018-09-05 2020-03-12 Ａｇｃ株式会社 フッ素樹脂膜、分散液の製造方法およびフッ素樹脂膜付基材の製造方法
WO2020137879A1 (ja) 2018-12-27 2020-07-02 Ａｇｃ株式会社 パウダー分散液、積層体及びプリント基板
WO2021221038A1 (ja) 2020-04-30 2021-11-04 Ａｇｃ株式会社 分散液の製造方法、ペーストおよび練粉

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KR20230132449A (ko) 2023-09-15
TW202237710A (zh) 2022-10-01
JPWO2022153931A1 (https=) 2022-07-21
WO2022153931A1 (ja) 2022-07-21

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