JP7715160B2 - 中空粒子 - Google Patents

中空粒子

Info

Publication number
JP7715160B2
JP7715160B2 JP2022553984A JP2022553984A JP7715160B2 JP 7715160 B2 JP7715160 B2 JP 7715160B2 JP 2022553984 A JP2022553984 A JP 2022553984A JP 2022553984 A JP2022553984 A JP 2022553984A JP 7715160 B2 JP7715160 B2 JP 7715160B2
Authority
JP
Japan
Prior art keywords
mass
crosslinkable monomer
meth
hollow particles
hollow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022553984A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2022071275A1 (https=
Inventor
真司 渡邉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Zeon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeon Corp filed Critical Zeon Corp
Publication of JPWO2022071275A1 publication Critical patent/JPWO2022071275A1/ja
Application granted granted Critical
Publication of JP7715160B2 publication Critical patent/JP7715160B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/12—Polymerisation in non-solvents
    • C08F2/16—Aqueous medium
    • C08F2/18—Suspension polymerisation
    • C08F2/20—Suspension polymerisation with the aid of macromolecular dispersing agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/10—Esters
    • C08F22/1006—Esters of polyhydric alcohols or polyhydric phenols, e.g. ethylene glycol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/20—Esters of polyhydric alcohols or polyhydric phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • B01J13/06—Making microcapsules or microballoons by phase separation
    • B01J13/14—Polymerisation; cross-linking
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/34—Monomers containing two or more unsaturated aliphatic radicals
    • C08F12/36—Divinylbenzene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/12—Polymerisation in non-solvents
    • C08F2/16—Aqueous medium
    • C08F2/18—Suspension polymerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/104—Esters of polyhydric alcohols or polyhydric phenols of tetraalcohols, e.g. pentaerythritol tetra(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2207/00—Properties characterising the ingredient of the composition
    • C08L2207/53—Core-shell polymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Dispersion Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
JP2022553984A 2020-09-30 2021-09-28 中空粒子 Active JP7715160B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020165173 2020-09-30
JP2020165173 2020-09-30
PCT/JP2021/035537 WO2022071275A1 (ja) 2020-09-30 2021-09-28 中空粒子

Publications (2)

Publication Number Publication Date
JPWO2022071275A1 JPWO2022071275A1 (https=) 2022-04-07
JP7715160B2 true JP7715160B2 (ja) 2025-07-30

Family

ID=80949105

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022553984A Active JP7715160B2 (ja) 2020-09-30 2021-09-28 中空粒子

Country Status (6)

Country Link
US (1) US20230365727A1 (https=)
EP (1) EP4223801A4 (https=)
JP (1) JP7715160B2 (https=)
KR (1) KR20230075427A (https=)
CN (1) CN116194495B (https=)
WO (1) WO2022071275A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230098157A (ko) 2020-10-30 2023-07-03 니폰 제온 가부시키가이샤 중공 입자의 제조 방법 및 중공 입자
KR20230098160A (ko) * 2020-10-30 2023-07-03 니폰 제온 가부시키가이샤 중공 입자의 제조 방법 및 중공 입자
US12570812B2 (en) 2021-02-26 2026-03-10 Zeon Corporation Fiber-reinforced molded body and method for producing fiber-reinforced molded body
EP4299640A4 (en) * 2021-02-26 2025-04-30 Zeon Corporation Thermal conductivity regulating agent and molded body
CN116848161B (zh) * 2021-02-26 2025-10-28 日本瑞翁株式会社 中空颗粒
WO2023074651A1 (ja) * 2021-10-29 2023-05-04 日本ゼオン株式会社 中空粒子、中空粒子の製造方法、樹脂組成物、及び成形体
WO2023106322A1 (ja) * 2021-12-10 2023-06-15 日本ゼオン株式会社 中空粒子、中空粒子の製造方法、及び樹脂組成物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003015171A (ja) 2001-07-03 2003-01-15 New Industry Research Organization 磁性体保持微粒子及びその製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1303437C (en) * 1988-02-29 1992-06-16 Nobuo Kawahashi Hollow polymer particles, process for production thereof, and use thereof as pigment
CA2251479C (en) * 1997-11-07 2003-04-01 Rohm And Haas Company Particles and a process for preparing the same
US6624272B2 (en) * 1999-12-20 2003-09-23 Jsr Corporation Hollow crosslinked cationic polymer particles, method of producing said particles, and paint composition, cationic electrodeposition paint composition, resin composition, filled paper, paper coating composition, and coated paper
JP4448930B2 (ja) 2000-09-04 2010-04-14 財団法人新産業創造研究機構 中空高分子微粒子及びその製造法
CN1938384B (zh) * 2004-01-26 2010-05-26 Jsr株式会社 含中空颗粒的液体状组合物、其制备方法以及光学物品
AU2008213911A1 (en) * 2007-02-09 2008-08-14 Newsouth Innovations Pty Limited Hollow microparticles
CN101652395A (zh) * 2007-03-30 2010-02-17 综研化学株式会社 丙烯酸类中空粒子、丙烯酸类中空粒子的制造方法及含有该粒子的化妆品
CN101113183A (zh) * 2007-04-03 2008-01-30 南开大学 单分散的纳米/微米聚合物空心微球树脂及其合成方法
JP2008266504A (ja) * 2007-04-24 2008-11-06 Konica Minolta Business Technologies Inc 中空粒子の製造方法
JP5439102B2 (ja) * 2009-09-25 2014-03-12 積水化成品工業株式会社 中空粒子、その製造法及びその用途
JP5401553B2 (ja) * 2009-09-29 2014-01-29 積水化成品工業株式会社 光拡散用単中空粒子
JP6468780B2 (ja) 2014-09-30 2019-02-13 積水化成品工業株式会社 中空樹脂粒子及びその製造方法
JP6460884B2 (ja) 2015-03-31 2019-01-30 積水化成品工業株式会社 中空樹脂粒子の製造方法
CN112739455A (zh) * 2018-09-28 2021-04-30 日本瑞翁株式会社 中空颗粒及其制造方法、以及包含该中空颗粒的水分散液
EP3922650A4 (en) * 2019-02-06 2022-10-26 Zeon Corporation PROCESS FOR MANUFACTURING HOLLOW RESIN PARTICLES
JP7342376B2 (ja) * 2019-02-25 2023-09-12 日本ゼオン株式会社 中空樹脂粒子の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003015171A (ja) 2001-07-03 2003-01-15 New Industry Research Organization 磁性体保持微粒子及びその製造方法

Also Published As

Publication number Publication date
WO2022071275A1 (ja) 2022-04-07
CN116194495A (zh) 2023-05-30
JPWO2022071275A1 (https=) 2022-04-07
US20230365727A1 (en) 2023-11-16
KR20230075427A (ko) 2023-05-31
EP4223801A1 (en) 2023-08-09
EP4223801A4 (en) 2024-12-25
CN116194495B (zh) 2024-06-28

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