CN116194495B - 中空颗粒 - Google Patents

中空颗粒 Download PDF

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Publication number
CN116194495B
CN116194495B CN202180064583.2A CN202180064583A CN116194495B CN 116194495 B CN116194495 B CN 116194495B CN 202180064583 A CN202180064583 A CN 202180064583A CN 116194495 B CN116194495 B CN 116194495B
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CN
China
Prior art keywords
mass
hollow particles
hollow
monomer
parts
Prior art date
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CN202180064583.2A
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English (en)
Chinese (zh)
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CN116194495A (zh
Inventor
渡边真司
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Zeon Corp
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Zeon Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/12—Polymerisation in non-solvents
    • C08F2/16—Aqueous medium
    • C08F2/18—Suspension polymerisation
    • C08F2/20—Suspension polymerisation with the aid of macromolecular dispersing agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/10—Esters
    • C08F22/1006—Esters of polyhydric alcohols or polyhydric phenols, e.g. ethylene glycol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/20—Esters of polyhydric alcohols or polyhydric phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/02—Making microcapsules or microballoons
    • B01J13/06—Making microcapsules or microballoons by phase separation
    • B01J13/14—Polymerisation; cross-linking
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/34—Monomers containing two or more unsaturated aliphatic radicals
    • C08F12/36—Divinylbenzene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/12—Polymerisation in non-solvents
    • C08F2/16—Aqueous medium
    • C08F2/18—Suspension polymerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/104—Esters of polyhydric alcohols or polyhydric phenols of tetraalcohols, e.g. pentaerythritol tetra(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2207/00—Properties characterising the ingredient of the composition
    • C08L2207/53—Core-shell polymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Dispersion Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
CN202180064583.2A 2020-09-30 2021-09-28 中空颗粒 Active CN116194495B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020165173 2020-09-30
JP2020-165173 2020-09-30
PCT/JP2021/035537 WO2022071275A1 (ja) 2020-09-30 2021-09-28 中空粒子

Publications (2)

Publication Number Publication Date
CN116194495A CN116194495A (zh) 2023-05-30
CN116194495B true CN116194495B (zh) 2024-06-28

Family

ID=80949105

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180064583.2A Active CN116194495B (zh) 2020-09-30 2021-09-28 中空颗粒

Country Status (6)

Country Link
US (1) US20230365727A1 (https=)
EP (1) EP4223801A4 (https=)
JP (1) JP7715160B2 (https=)
KR (1) KR20230075427A (https=)
CN (1) CN116194495B (https=)
WO (1) WO2022071275A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230098157A (ko) 2020-10-30 2023-07-03 니폰 제온 가부시키가이샤 중공 입자의 제조 방법 및 중공 입자
KR20230098160A (ko) * 2020-10-30 2023-07-03 니폰 제온 가부시키가이샤 중공 입자의 제조 방법 및 중공 입자
US12570812B2 (en) 2021-02-26 2026-03-10 Zeon Corporation Fiber-reinforced molded body and method for producing fiber-reinforced molded body
EP4299640A4 (en) * 2021-02-26 2025-04-30 Zeon Corporation Thermal conductivity regulating agent and molded body
CN116848161B (zh) * 2021-02-26 2025-10-28 日本瑞翁株式会社 中空颗粒
WO2023074651A1 (ja) * 2021-10-29 2023-05-04 日本ゼオン株式会社 中空粒子、中空粒子の製造方法、樹脂組成物、及び成形体
WO2023106322A1 (ja) * 2021-12-10 2023-06-15 日本ゼオン株式会社 中空粒子、中空粒子の製造方法、及び樹脂組成物

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101113183A (zh) * 2007-04-03 2008-01-30 南开大学 单分散的纳米/微米聚合物空心微球树脂及其合成方法
CN101652395A (zh) * 2007-03-30 2010-02-17 综研化学株式会社 丙烯酸类中空粒子、丙烯酸类中空粒子的制造方法及含有该粒子的化妆品

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1303437C (en) * 1988-02-29 1992-06-16 Nobuo Kawahashi Hollow polymer particles, process for production thereof, and use thereof as pigment
CA2251479C (en) * 1997-11-07 2003-04-01 Rohm And Haas Company Particles and a process for preparing the same
US6624272B2 (en) * 1999-12-20 2003-09-23 Jsr Corporation Hollow crosslinked cationic polymer particles, method of producing said particles, and paint composition, cationic electrodeposition paint composition, resin composition, filled paper, paper coating composition, and coated paper
JP4448930B2 (ja) 2000-09-04 2010-04-14 財団法人新産業創造研究機構 中空高分子微粒子及びその製造法
JP4936264B2 (ja) * 2001-07-03 2012-05-23 公益財団法人新産業創造研究機構 磁性体保持微粒子及びその製造方法
CN1938384B (zh) * 2004-01-26 2010-05-26 Jsr株式会社 含中空颗粒的液体状组合物、其制备方法以及光学物品
AU2008213911A1 (en) * 2007-02-09 2008-08-14 Newsouth Innovations Pty Limited Hollow microparticles
JP2008266504A (ja) * 2007-04-24 2008-11-06 Konica Minolta Business Technologies Inc 中空粒子の製造方法
JP5439102B2 (ja) * 2009-09-25 2014-03-12 積水化成品工業株式会社 中空粒子、その製造法及びその用途
JP5401553B2 (ja) * 2009-09-29 2014-01-29 積水化成品工業株式会社 光拡散用単中空粒子
JP6468780B2 (ja) 2014-09-30 2019-02-13 積水化成品工業株式会社 中空樹脂粒子及びその製造方法
JP6460884B2 (ja) 2015-03-31 2019-01-30 積水化成品工業株式会社 中空樹脂粒子の製造方法
CN112739455A (zh) * 2018-09-28 2021-04-30 日本瑞翁株式会社 中空颗粒及其制造方法、以及包含该中空颗粒的水分散液
EP3922650A4 (en) * 2019-02-06 2022-10-26 Zeon Corporation PROCESS FOR MANUFACTURING HOLLOW RESIN PARTICLES
JP7342376B2 (ja) * 2019-02-25 2023-09-12 日本ゼオン株式会社 中空樹脂粒子の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101652395A (zh) * 2007-03-30 2010-02-17 综研化学株式会社 丙烯酸类中空粒子、丙烯酸类中空粒子的制造方法及含有该粒子的化妆品
CN101113183A (zh) * 2007-04-03 2008-01-30 南开大学 单分散的纳米/微米聚合物空心微球树脂及其合成方法

Also Published As

Publication number Publication date
WO2022071275A1 (ja) 2022-04-07
CN116194495A (zh) 2023-05-30
JP7715160B2 (ja) 2025-07-30
JPWO2022071275A1 (https=) 2022-04-07
US20230365727A1 (en) 2023-11-16
KR20230075427A (ko) 2023-05-31
EP4223801A1 (en) 2023-08-09
EP4223801A4 (en) 2024-12-25

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