JP7691935B2 - 光学素子の支持 - Google Patents

光学素子の支持 Download PDF

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Publication number
JP7691935B2
JP7691935B2 JP2021566249A JP2021566249A JP7691935B2 JP 7691935 B2 JP7691935 B2 JP 7691935B2 JP 2021566249 A JP2021566249 A JP 2021566249A JP 2021566249 A JP2021566249 A JP 2021566249A JP 7691935 B2 JP7691935 B2 JP 7691935B2
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Japan
Prior art keywords
holding
units
boundary
membrane element
support
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Japanese (ja)
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JP2022532127A (ja
JP2022532127A5 (https=
Inventor
コエルナー クリスチャン
ミューラー クリストフ
アンセルム ユーゲン
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/64—Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
    • G02B27/646—Imaging systems using optical elements for stabilisation of the lateral and angular position of the image compensating for small deviations, e.g. due to vibration or shake
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/026—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using retaining rings or springs
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2021566249A 2019-05-10 2020-05-08 光学素子の支持 Active JP7691935B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102019112224.4A DE102019112224A1 (de) 2019-05-10 2019-05-10 Abstützung eines optischen Elements
DE102019112224.4 2019-05-10
PCT/EP2020/062866 WO2020229345A1 (en) 2019-05-10 2020-05-08 Supporting an optical element

Publications (3)

Publication Number Publication Date
JP2022532127A JP2022532127A (ja) 2022-07-13
JP2022532127A5 JP2022532127A5 (https=) 2024-10-30
JP7691935B2 true JP7691935B2 (ja) 2025-06-12

Family

ID=70680507

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021566249A Active JP7691935B2 (ja) 2019-05-10 2020-05-08 光学素子の支持

Country Status (8)

Country Link
US (1) US11422469B2 (https=)
EP (1) EP3966635A1 (https=)
JP (1) JP7691935B2 (https=)
KR (1) KR20220007052A (https=)
CN (1) CN113811820B (https=)
DE (1) DE102019112224A1 (https=)
TW (1) TWI874393B (https=)
WO (1) WO2020229345A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025162830A1 (en) 2024-01-29 2025-08-07 Carl Zeiss Smt Gmbh Collector mirror and collector mirror assembly for lithography
DE102024202174A1 (de) * 2024-03-08 2024-12-24 Carl Zeiss Smt Gmbh Optische Vorrichtung

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000028886A (ja) 1998-06-09 2000-01-28 Carl Zeiss:Fa 光学要素とマウントからなるアセンブリ
JP2001284226A (ja) 2000-03-31 2001-10-12 Nikon Corp 光学部材保持装置及び露光装置並びにマイクロデバイスの製造方法。
JP2004258273A (ja) 2003-02-26 2004-09-16 Canon Inc 保持装置
JP2004347814A (ja) 2003-05-21 2004-12-09 Canon Inc 保持装置、露光装置及びデバイス製造方法
US20080204689A1 (en) 2006-09-14 2008-08-28 Carl Zeiss Smt Ag Optical module with minimized overrun of the optical element
US20110261341A1 (en) 2010-04-23 2011-10-27 Carl Zeiss Smt Gmbh Optical module with an adjustable optical element

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10186196A (ja) * 1996-12-20 1998-07-14 Canon Inc 光学素子支持装置およびこれを備えた光学機器、露光装置
DE19859634A1 (de) 1998-12-23 2000-06-29 Zeiss Carl Fa Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie
DE19904152A1 (de) * 1999-02-03 2000-08-10 Zeiss Carl Fa Baugruppe aus einem optischen Element und einer Fassung
JP4945845B2 (ja) * 2000-03-31 2012-06-06 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。
AU2003219097A1 (en) * 2003-03-26 2004-10-18 Carl Zeiss Smt Ag Device for the low-deformation replaceable mounting of an optical element
US7265814B2 (en) * 2003-05-14 2007-09-04 Canon Kabushiki Kaisha Mirror holding method and optical apparatus
DE10324477A1 (de) * 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
US7760327B2 (en) 2003-10-02 2010-07-20 Carl Zeiss Smt Ag Reflecting optical element with eccentric optical passageway
DE102004018659A1 (de) * 2004-04-13 2005-11-03 Carl Zeiss Smt Ag Abschlussmodul für eine optische Anordnung
US8400613B2 (en) * 2005-05-02 2013-03-19 Nikon Corporation Optical element driving apparatus, projection optical system, exposure apparatus and device manufacturing method
TWI372271B (en) * 2005-09-13 2012-09-11 Zeiss Carl Smt Gmbh Optical element unit, optical element holder, method of manufacturing an optical element holder, optical element module, optical exposure apparatus, and method of manufacturing a semiconductor device
DE102007044054A1 (de) * 2006-09-14 2008-04-17 Carl Zeiss Smt Ag Optisches Modul mit minimiertem Überlauf des optischen Elements
EP1901101A1 (en) * 2006-09-14 2008-03-19 Carl Zeiss SMT AG Optical element unit and method of supporting an optical element
US7696492B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
DE102008041436A1 (de) * 2007-10-02 2009-04-09 Carl Zeiss Smt Ag Optisches Membranelement
KR101508727B1 (ko) * 2008-12-30 2015-04-06 삼성전자 주식회사 가변초점 광학렌즈
JP6253641B2 (ja) * 2012-05-21 2017-12-27 エーエスエムエル ネザーランズ ビー．ブイ． リフレクタ、ペリクル、リソグラフィマスク、膜、スペクトル純度フィルタ、および、装置
DE102015101387B3 (de) * 2015-01-30 2015-12-17 Jenoptik Optical Systems Gmbh Optische Fassung mit wenigstens einer Klemmeinheit mit einer Membranfeder
CN112166361B (zh) * 2018-05-24 2022-11-25 珀莱特股份有限公司 具有应力分布支撑结构的光学元件

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000028886A (ja) 1998-06-09 2000-01-28 Carl Zeiss:Fa 光学要素とマウントからなるアセンブリ
JP2001284226A (ja) 2000-03-31 2001-10-12 Nikon Corp 光学部材保持装置及び露光装置並びにマイクロデバイスの製造方法。
JP2004258273A (ja) 2003-02-26 2004-09-16 Canon Inc 保持装置
JP2004347814A (ja) 2003-05-21 2004-12-09 Canon Inc 保持装置、露光装置及びデバイス製造方法
US20080204689A1 (en) 2006-09-14 2008-08-28 Carl Zeiss Smt Ag Optical module with minimized overrun of the optical element
US20110261341A1 (en) 2010-04-23 2011-10-27 Carl Zeiss Smt Gmbh Optical module with an adjustable optical element
JP2011232751A (ja) 2010-04-23 2011-11-17 Carl Zeiss Smt Gmbh 調整可能な光学素子を有する光学モジュール

Also Published As

Publication number Publication date
KR20220007052A (ko) 2022-01-18
WO2020229345A1 (en) 2020-11-19
US11422469B2 (en) 2022-08-23
US20200356010A1 (en) 2020-11-12
DE102019112224A1 (de) 2020-11-12
JP2022532127A (ja) 2022-07-13
CN113811820A (zh) 2021-12-17
TWI874393B (zh) 2025-03-01
EP3966635A1 (en) 2022-03-16
CN113811820B (zh) 2025-04-22
TW202107213A (zh) 2021-02-16

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