DE102019112224A1 - Abstützung eines optischen Elements - Google Patents

Abstützung eines optischen Elements Download PDF

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Publication number
DE102019112224A1
DE102019112224A1 DE102019112224.4A DE102019112224A DE102019112224A1 DE 102019112224 A1 DE102019112224 A1 DE 102019112224A1 DE 102019112224 A DE102019112224 A DE 102019112224A DE 102019112224 A1 DE102019112224 A1 DE 102019112224A1
Authority
DE
Germany
Prior art keywords
holding
support
units
optical element
membrane element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE102019112224.4A
Other languages
German (de)
English (en)
Inventor
Christian Körner
Christoph Müller
Eugen Anselm
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102019112224.4A priority Critical patent/DE102019112224A1/de
Priority to EP20725156.2A priority patent/EP3966635A1/en
Priority to PCT/EP2020/062866 priority patent/WO2020229345A1/en
Priority to CN202080034662.4A priority patent/CN113811820B/zh
Priority to US16/869,941 priority patent/US11422469B2/en
Priority to KR1020217036276A priority patent/KR20220007052A/ko
Priority to JP2021566249A priority patent/JP7691935B2/ja
Priority to TW109115519A priority patent/TWI874393B/zh
Publication of DE102019112224A1 publication Critical patent/DE102019112224A1/de
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/64—Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
    • G02B27/646—Imaging systems using optical elements for stabilisation of the lateral and angular position of the image compensating for small deviations, e.g. due to vibration or shake
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/026—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using retaining rings or springs
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
DE102019112224.4A 2019-05-10 2019-05-10 Abstützung eines optischen Elements Pending DE102019112224A1 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
DE102019112224.4A DE102019112224A1 (de) 2019-05-10 2019-05-10 Abstützung eines optischen Elements
EP20725156.2A EP3966635A1 (en) 2019-05-10 2020-05-08 Supporting an optical element
PCT/EP2020/062866 WO2020229345A1 (en) 2019-05-10 2020-05-08 Supporting an optical element
CN202080034662.4A CN113811820B (zh) 2019-05-10 2020-05-08 支撑光学元件
US16/869,941 US11422469B2 (en) 2019-05-10 2020-05-08 Supporting an optical element
KR1020217036276A KR20220007052A (ko) 2019-05-10 2020-05-08 광학 요소 지지
JP2021566249A JP7691935B2 (ja) 2019-05-10 2020-05-08 光学素子の支持
TW109115519A TWI874393B (zh) 2019-05-10 2020-05-11 支撐一光學元件

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102019112224.4A DE102019112224A1 (de) 2019-05-10 2019-05-10 Abstützung eines optischen Elements

Publications (1)

Publication Number Publication Date
DE102019112224A1 true DE102019112224A1 (de) 2020-11-12

Family

ID=70680507

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102019112224.4A Pending DE102019112224A1 (de) 2019-05-10 2019-05-10 Abstützung eines optischen Elements

Country Status (8)

Country Link
US (1) US11422469B2 (https=)
EP (1) EP3966635A1 (https=)
JP (1) JP7691935B2 (https=)
KR (1) KR20220007052A (https=)
CN (1) CN113811820B (https=)
DE (1) DE102019112224A1 (https=)
TW (1) TWI874393B (https=)
WO (1) WO2020229345A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102024202174A1 (de) * 2024-03-08 2024-12-24 Carl Zeiss Smt Gmbh Optische Vorrichtung
WO2025162830A1 (en) 2024-01-29 2025-08-07 Carl Zeiss Smt Gmbh Collector mirror and collector mirror assembly for lithography

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040228018A1 (en) * 2003-05-14 2004-11-18 Hisashi Namba Mirror holding method and optical apparatus
DE102007044054A1 (de) * 2006-09-14 2008-04-17 Carl Zeiss Smt Ag Optisches Modul mit minimiertem Überlauf des optischen Elements
US20080218721A1 (en) * 2005-09-13 2008-09-11 Carl Zeiss Smt Ag Optical element unit
US20090051889A1 (en) * 2005-05-02 2009-02-26 Nikon Corporation Optical element driving apparatus, projection optical system, exposure apparatus and device manufacturing method

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10186196A (ja) * 1996-12-20 1998-07-14 Canon Inc 光学素子支持装置およびこれを備えた光学機器、露光装置
DE19825716A1 (de) * 1998-06-09 1999-12-16 Zeiss Carl Fa Baugruppe aus optischem Element und Fassung
DE19859634A1 (de) 1998-12-23 2000-06-29 Zeiss Carl Fa Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie
DE19904152A1 (de) * 1999-02-03 2000-08-10 Zeiss Carl Fa Baugruppe aus einem optischen Element und einer Fassung
JP2001284226A (ja) 2000-03-31 2001-10-12 Nikon Corp 光学部材保持装置及び露光装置並びにマイクロデバイスの製造方法。
JP4945845B2 (ja) * 2000-03-31 2012-06-06 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。
JP3944095B2 (ja) 2003-02-26 2007-07-11 キヤノン株式会社 保持装置
AU2003219097A1 (en) * 2003-03-26 2004-10-18 Carl Zeiss Smt Ag Device for the low-deformation replaceable mounting of an optical element
JP2004347814A (ja) 2003-05-21 2004-12-09 Canon Inc 保持装置、露光装置及びデバイス製造方法
DE10324477A1 (de) * 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
US7760327B2 (en) 2003-10-02 2010-07-20 Carl Zeiss Smt Ag Reflecting optical element with eccentric optical passageway
DE102004018659A1 (de) * 2004-04-13 2005-11-03 Carl Zeiss Smt Ag Abschlussmodul für eine optische Anordnung
US8441747B2 (en) * 2006-09-14 2013-05-14 Carl Zeiss Smt Gmbh Optical module with minimized overrun of the optical element
EP1901101A1 (en) * 2006-09-14 2008-03-19 Carl Zeiss SMT AG Optical element unit and method of supporting an optical element
US7696492B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
DE102008041436A1 (de) * 2007-10-02 2009-04-09 Carl Zeiss Smt Ag Optisches Membranelement
KR101508727B1 (ko) * 2008-12-30 2015-04-06 삼성전자 주식회사 가변초점 광학렌즈
DE102010018224A1 (de) 2010-04-23 2012-02-16 Carl Zeiss Smt Gmbh Optisches Modul mit einem verstellbaren optischen Element
JP6253641B2 (ja) * 2012-05-21 2017-12-27 エーエスエムエル ネザーランズ ビー．ブイ． リフレクタ、ペリクル、リソグラフィマスク、膜、スペクトル純度フィルタ、および、装置
DE102015101387B3 (de) * 2015-01-30 2015-12-17 Jenoptik Optical Systems Gmbh Optische Fassung mit wenigstens einer Klemmeinheit mit einer Membranfeder
CN112166361B (zh) * 2018-05-24 2022-11-25 珀莱特股份有限公司 具有应力分布支撑结构的光学元件

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040228018A1 (en) * 2003-05-14 2004-11-18 Hisashi Namba Mirror holding method and optical apparatus
US20090051889A1 (en) * 2005-05-02 2009-02-26 Nikon Corporation Optical element driving apparatus, projection optical system, exposure apparatus and device manufacturing method
US20080218721A1 (en) * 2005-09-13 2008-09-11 Carl Zeiss Smt Ag Optical element unit
DE102007044054A1 (de) * 2006-09-14 2008-04-17 Carl Zeiss Smt Ag Optisches Modul mit minimiertem Überlauf des optischen Elements

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025162830A1 (en) 2024-01-29 2025-08-07 Carl Zeiss Smt Gmbh Collector mirror and collector mirror assembly for lithography
DE102024202174A1 (de) * 2024-03-08 2024-12-24 Carl Zeiss Smt Gmbh Optische Vorrichtung

Also Published As

Publication number Publication date
KR20220007052A (ko) 2022-01-18
WO2020229345A1 (en) 2020-11-19
US11422469B2 (en) 2022-08-23
US20200356010A1 (en) 2020-11-12
JP2022532127A (ja) 2022-07-13
CN113811820A (zh) 2021-12-17
TWI874393B (zh) 2025-03-01
EP3966635A1 (en) 2022-03-16
JP7691935B2 (ja) 2025-06-12
CN113811820B (zh) 2025-04-22
TW202107213A (zh) 2021-02-16

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