TWI874393B - 支撐一光學元件 - Google Patents

支撐一光學元件 Download PDF

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Publication number
TWI874393B
TWI874393B TW109115519A TW109115519A TWI874393B TW I874393 B TWI874393 B TW I874393B TW 109115519 A TW109115519 A TW 109115519A TW 109115519 A TW109115519 A TW 109115519A TW I874393 B TWI874393 B TW I874393B
Authority
TW
Taiwan
Prior art keywords
supporting
holding
circumferential direction
units
interface
Prior art date
Application number
TW109115519A
Other languages
English (en)
Chinese (zh)
Other versions
TW202107213A (zh
Inventor
克里斯欽 康納
克里斯多福 穆勒
尤傑 安賽姆
Original Assignee
德商卡爾蔡司Ｓｍｔ有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 德商卡爾蔡司Ｓｍｔ有限公司 filed Critical 德商卡爾蔡司Ｓｍｔ有限公司
Publication of TW202107213A publication Critical patent/TW202107213A/zh
Application granted granted Critical
Publication of TWI874393B publication Critical patent/TWI874393B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/64—Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
    • G02B27/646—Imaging systems using optical elements for stabilisation of the lateral and angular position of the image compensating for small deviations, e.g. due to vibration or shake
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/026—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using retaining rings or springs
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
TW109115519A 2019-05-10 2020-05-11 支撐一光學元件 TWI874393B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102019112224.4A DE102019112224A1 (de) 2019-05-10 2019-05-10 Abstützung eines optischen Elements
DE102019112224.4 2019-05-10

Publications (2)

Publication Number Publication Date
TW202107213A TW202107213A (zh) 2021-02-16
TWI874393B true TWI874393B (zh) 2025-03-01

Family

ID=70680507

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109115519A TWI874393B (zh) 2019-05-10 2020-05-11 支撐一光學元件

Country Status (8)

Country Link
US (1) US11422469B2 (https=)
EP (1) EP3966635A1 (https=)
JP (1) JP7691935B2 (https=)
KR (1) KR20220007052A (https=)
CN (1) CN113811820B (https=)
DE (1) DE102019112224A1 (https=)
TW (1) TWI874393B (https=)
WO (1) WO2020229345A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025162830A1 (en) 2024-01-29 2025-08-07 Carl Zeiss Smt Gmbh Collector mirror and collector mirror assembly for lithography
DE102024202174A1 (de) * 2024-03-08 2024-12-24 Carl Zeiss Smt Gmbh Optische Vorrichtung

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080204689A1 (en) * 2006-09-14 2008-08-28 Carl Zeiss Smt Ag Optical module with minimized overrun of the optical element
TW200846834A (en) * 2006-12-13 2008-12-01 Asml Netherlands Bv Radiation system and lithographic apparatus

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10186196A (ja) * 1996-12-20 1998-07-14 Canon Inc 光学素子支持装置およびこれを備えた光学機器、露光装置
DE19825716A1 (de) * 1998-06-09 1999-12-16 Zeiss Carl Fa Baugruppe aus optischem Element und Fassung
DE19859634A1 (de) 1998-12-23 2000-06-29 Zeiss Carl Fa Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie
DE19904152A1 (de) * 1999-02-03 2000-08-10 Zeiss Carl Fa Baugruppe aus einem optischen Element und einer Fassung
JP2001284226A (ja) 2000-03-31 2001-10-12 Nikon Corp 光学部材保持装置及び露光装置並びにマイクロデバイスの製造方法。
JP4945845B2 (ja) * 2000-03-31 2012-06-06 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法。
JP3944095B2 (ja) 2003-02-26 2007-07-11 キヤノン株式会社 保持装置
AU2003219097A1 (en) * 2003-03-26 2004-10-18 Carl Zeiss Smt Ag Device for the low-deformation replaceable mounting of an optical element
US7265814B2 (en) * 2003-05-14 2007-09-04 Canon Kabushiki Kaisha Mirror holding method and optical apparatus
JP2004347814A (ja) 2003-05-21 2004-12-09 Canon Inc 保持装置、露光装置及びデバイス製造方法
DE10324477A1 (de) * 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
US7760327B2 (en) 2003-10-02 2010-07-20 Carl Zeiss Smt Ag Reflecting optical element with eccentric optical passageway
DE102004018659A1 (de) * 2004-04-13 2005-11-03 Carl Zeiss Smt Ag Abschlussmodul für eine optische Anordnung
US8400613B2 (en) * 2005-05-02 2013-03-19 Nikon Corporation Optical element driving apparatus, projection optical system, exposure apparatus and device manufacturing method
TWI372271B (en) * 2005-09-13 2012-09-11 Zeiss Carl Smt Gmbh Optical element unit, optical element holder, method of manufacturing an optical element holder, optical element module, optical exposure apparatus, and method of manufacturing a semiconductor device
DE102007044054A1 (de) * 2006-09-14 2008-04-17 Carl Zeiss Smt Ag Optisches Modul mit minimiertem Überlauf des optischen Elements
EP1901101A1 (en) * 2006-09-14 2008-03-19 Carl Zeiss SMT AG Optical element unit and method of supporting an optical element
DE102008041436A1 (de) * 2007-10-02 2009-04-09 Carl Zeiss Smt Ag Optisches Membranelement
KR101508727B1 (ko) * 2008-12-30 2015-04-06 삼성전자 주식회사 가변초점 광학렌즈
DE102010018224A1 (de) 2010-04-23 2012-02-16 Carl Zeiss Smt Gmbh Optisches Modul mit einem verstellbaren optischen Element
JP6253641B2 (ja) * 2012-05-21 2017-12-27 エーエスエムエル ネザーランズ ビー．ブイ． リフレクタ、ペリクル、リソグラフィマスク、膜、スペクトル純度フィルタ、および、装置
DE102015101387B3 (de) * 2015-01-30 2015-12-17 Jenoptik Optical Systems Gmbh Optische Fassung mit wenigstens einer Klemmeinheit mit einer Membranfeder
CN112166361B (zh) * 2018-05-24 2022-11-25 珀莱特股份有限公司 具有应力分布支撑结构的光学元件

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080204689A1 (en) * 2006-09-14 2008-08-28 Carl Zeiss Smt Ag Optical module with minimized overrun of the optical element
TW200846834A (en) * 2006-12-13 2008-12-01 Asml Netherlands Bv Radiation system and lithographic apparatus

Also Published As

Publication number Publication date
KR20220007052A (ko) 2022-01-18
WO2020229345A1 (en) 2020-11-19
US11422469B2 (en) 2022-08-23
US20200356010A1 (en) 2020-11-12
DE102019112224A1 (de) 2020-11-12
JP2022532127A (ja) 2022-07-13
CN113811820A (zh) 2021-12-17
EP3966635A1 (en) 2022-03-16
JP7691935B2 (ja) 2025-06-12
CN113811820B (zh) 2025-04-22
TW202107213A (zh) 2021-02-16

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